Optical device structure using GaN substrates and growth structures for laser applications
Optical devices having a structured active region configured for selected wavelengths of light emissions are disclosed.
1. An optical device comprising:
a gallium nitride substrate member having a semipolar or nonpolar crystalline surface region;
an n-type gallium nitride region overlying the surface region;
an n-side SCH layer comprising InGaN overlying the n-type gallium nitride region;
an active region overlying the n-side SCH layer, the active region comprising multiple quantum wells each having InGaN;
a p-side SCH layer comprising InGaN overlying the active region;
a laser stripe region formed overlying the p-side SCH layer, the laser stripe region characterized by a cavity orientation substantially parallel to a first-direction, the laser stripe region having a first end and a second end, the laser stripe region comprising a p-type gallium nitride region;
an n-type metal region overlying a backside of the gallium nitride substrate member;
an overlying p-type metal region overlying an upper portion of the laser stripe region;
a first cleaved m-face facet provided on the first end of the laser stripe region; and
a second cleaved m-face facet provided on the second end of the laser stripe region, wherein the first cleaved m-face facet is substantially parallel with the second cleaved m-face facet.
2. The device of claim 1 wherein the first cleaved m-face facet comprises a first mirror surface.
3. The device of claim 2 wherein the second cleaved m-face facet comprises a second mirror surface.
4. The device of claim 1 wherein the n-type gallium nitride region comprises a silicon entity.
5. The device of claim 1 wherein the p-type gallium nitride region comprises a magnesium entity.
6. The device of claim 1 wherein the multiple quantum wells comprise one or more barrier layers.
7. The device of claim 1 further comprising an electron blocking layer comprising aluminum disposed between the active region and the p-type gallium nitride region.
8. The device of claim 1 further comprising a spontaneously emitted light characterized by a wavelength ranging 390 nm to 420 nm, 420 nm to 440 nm, 440 nm to 470 nm, 470 nm to 490 nm, 490 nm to 510 nm, and 510 nm to 530 nm.
9. The device of claim 1 wherein the laser stripe region is provided by an etching process selected from dry etching or wet etching.
10. The device of claim 1 wherein the laser stripe region comprises an overlying dielectric layer exposing an upper portion of the laser stripe region.
11. The device of claim 1 wherein the p-type metal region comprises gallium nitride comprising magnesium entities.
12. An optical device comprising:
a gallium nitride substrate member having a semipolar or nonpolar crystalline surface region;
an n-type GaN cladding layer overlying the surface region;
an n-side SCH layer overlying the n-type GaN cladding layer, the n-side SCH layer comprised of InGaN;
a multiple quantum well active region overlying the n-side SCH layer, the multiple quantum well active region comprised of InGaN quantum wells separated by GaN barriers;
a p-side SCH layer overlying the multiple quantum well active region, the p-side SCH layer comprised of InGaN;
an electron blocking layer overlying the p-side SCH layer, the electron blocking layer comprised of AlGaN doped with magnesium;
a p-type GaN cladding layer overlying the electronic blocking layer, the p-type GaN cladding layer having a magnesium doping;
a p++-type GaN contact layer with a magnesium doping;
a laser stripe region having a first end and a second end;
a first cleaved m-face facet provided on the first end of the laser stripe region; and
a second cleaved m-face facet provided on the second end of the laser stripe region.
13. The device of claim 12 wherein the first cleaved m-face facet and the second cleaved m-face facet comprise mirror surfaces.
14. The device of claim 12 wherein the n-type GaN cladding layer comprises a silicon doping.
15. The device of claim 12 wherein the laser stripe region comprises an overlying dielectric layer exposing an upper portion of the laser stripe region.