Silicon germanium imager with photodiode in trench
An optical apparatus that includes: a semiconductor substrate formed from a first material, the semiconductor substrate including a first n-doped region; and a photodiode supported by the semiconductor substrate, the photodiode including an absorption region configured to absorb photons and to generate photo-carriers from the absorbed photons, the absorption region being formed from a second material different than the first material and including: a first p-doped region; and a second n-doped region coupled to the first n-doped region, wherein a second doping concentration of the second n-doped region is less than or substantially equal to a first doping concentration of the first n-doped region.
1. An optical apparatus comprising:
a semiconductor substrate formed from a first material, the semiconductor substrate comprising a first n-doped region;
a photodiode supported by the semiconductor substrate, the photodiode comprising an absorption region configured to absorb photons and to generate photo-carriers from the absorbed photons, the absorption region being formed from a second material different than the first material and comprising:
a first p-doped region; and
a second n-doped region coupled to the first n-doped region,
wherein a second doping concentration of the second n-doped region is less than or equal to a first doping concentration of the first n-doped region;
one or more readout regions coupled to one or more readout circuits, the one or more readout regions configured to provide the photo-carriers generated by the photodiode to the one or more readout circuits; and
one or more gates coupled to one or more control signals that control carrier transports between the photodiode and the one or more readout regions;
wherein the one or more readout regions further comprise one or more floating-diffusion capacitors.
2. The optical apparatus of claim 1 , wherein the semiconductor substrate is formed by bonding a first semiconductor layer and a second semiconductor layer.
3. The optical apparatus of claim 1 , wherein the first material is silicon and the second material comprises germanium.
4. The optical apparatus of claim 3 , wherein the first doping concentration of the first n-doped region is equal to 16 times the second doping concentration of the second n-doped region.
5. The optical apparatus of claim 1 , wherein the first and second doping concentrations are set such that a first Fermi level of the first n-doped region and a second Fermi level of the second n-doped region are equal.
6. The optical apparatus of claim 1 , wherein the first p-doped region is arranged on a first surface of the absorption region, and the second n-doped region is arranged on a second surface opposing the first surface.
7. The optical apparatus of claim 1 , wherein the first p-doped region and the second n-doped region are arranged on a first surface of the absorption region.
8. The optical apparatus of claim 1 , wherein the semiconductor substrate further comprises a recess, and at least a portion of the absorption region is embedded in the recess.
9. The optical apparatus of claim 8 , wherein the recess comprises a sidewall spacer.
10. The optical apparatus of claim 8 , wherein the first n-doped region surrounds at least a portion of the recess.
11. The optical apparatus of claim 1 , wherein the first n-doped region and the second n-doped region are adjacent.
12. The optical apparatus of claim 1 , further comprising a first metallic interconnect coupled to the first n-doped region and the second n-doped region.
13. The optical apparatus of claim 1 , wherein the one or more readout regions and the one or more gates are supported by the semiconductor substrate.
14. The optical apparatus of claim 1 , further comprising:
a lens supported by the semiconductor substrate.
15. The optical apparatus of claim 14 , wherein the lens is integrally formed on the semiconductor substrate.
16. The optical apparatus of claim 14 , further comprising:
a spacer layer supported by the semiconductor substrate,
wherein, in a direction normal to a substrate surface, the spacer layer is arranged between the absorption region and the lens.
17. The optical apparatus of claim 16 , wherein the spacer layer has a thickness corresponding to a focal length of the lens.
18. The optical apparatus of claim 14 , further comprising:
an anti-reflection layer supported by the semiconductor substrate and arranged between the semiconductor substrate and the lens.
19. An optical apparatus comprising:
a semiconductor substrate formed from a first material composition and comprising a recess and a bottom surface separated from the recess; and
a photodiode supported by the semiconductor substrate, the photodiode comprising an absorption region configured to absorb photons and to generate photo-carriers from the absorbed photons, wherein the absorption region is formed from a second material composition different than the first material composition and at least a portion of the absorption region is embedded in the recess, and wherein the absorption region comprises:
a first surface;
a second surface between the first surface and the bottom surface of the semiconductor substrate;
a first p-doped region;
a first n-doped region;
a second n-doped region coupled to a readout circuit, the second n-doped region configured to provide the photo-carriers generated by the photodiode to the readout circuit, wherein the second n-doped region further comprises a floating-diffusion capacitor; and
a first gate coupled to a first control signal and configured to control a carrier transport between the first n-doped region and the second n-doped region,
wherein a first doping concentration of the first n-doped region is less than or equal to a second doping concentration of the second n-doped region, and the first p-doped region and the second n-doped region are arranged laterally on the first surface of the absorption region.