IP Library Granted Patent US 10,141,262
Granted Patent B2
US 10,141,262 · App. 15/975,429 · Granted Nov 27, 2018

Electrically conductive laminate structures

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Quick Facts
Patent No.
US 10,141,262
App. No.
15/975,429
Granted
Nov 27, 2018
Kind
B2
Abstract

Some embodiments include electrical interconnects. The interconnects may contain laminate structures having a graphene region sandwiched between non-graphene regions. In some embodiments the graphene and non-graphene regions may be nested within one another. In some embodiments an electrically insulative material may be over an upper surface of the laminate structure, and an opening may extend through the insulative material to a portion of the laminate structure. Electrically conductive material may be within the opening and in electrical contact with at least one of the non-graphene regions of the laminate structure. Some embodiments include methods of forming electrical interconnects in which non-graphene material and graphene are alternately formed within a trench to form nested non-graphene and graphene regions.

Claims (16)

1. An electrical interconnect, comprising:

an electrically conductive laminate structure; the laminate structure comprising multiple regions nested within one another; one of said nested regions being a graphene region and others of the nested regions being non-graphene regions; the graphene region being sandwiched between a pair of non-graphene regions; the laminate structure comprising an uppermost surface that contains segments of the graphene region and of the non-graphene regions; at least one of the non-graphene regions being electrically conductive;

an electrically insulative material over the upper surface of the laminate structure, and having an opening extending therethrough to a portion of the laminate structure; said portion differing from other portions of the laminate structure by having space between the pair of non-graphene regions instead of having graphene between the non-graphene regions; and

electrically conductive material within the opening and within the space.

2. The electrical interconnect of claim 1 wherein said at least one of the non-graphene regions comprises one or both of copper and nickel.

3. The electrical interconnect of claim 1 the electrically conductive material comprises at least one metal.

4. A method of forming an electrical interconnect, comprising:

forming an electrically conductive laminate structure; the laminate structure comprising multiple regions nested within one another; one of said nested regions being a graphene region and others of the nested regions being non-graphene regions; the graphene region being sandwiched between a pair of non-graphene regions; the laminate structure comprising an uppermost surface that contains segments of the graphene region and of the non-graphene regions; at least one of the non-graphene regions being electrically conductive;

forming an electrically insulative material over the upper surface of the laminate structure;

forming an opening extending through the insulative material to the upper surface of the laminate structure;

extending the opening at least partially through the laminate structure; and

forming electrically conductive material within the opening.

5. The method of claim 4 wherein opening is extended entirely through the laminate structure.

6. The method of claim 4 wherein opening is extended only partially through the laminate structure.

7. The method of claim 4 wherein both of said non-graphene regions are electrically conductive.

8. The method of claim 4 wherein only one of said non-graphene regions is electrically conductive.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 11, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050713/0001 →
SUPPLEMENT NO. 9 TO PATENT SECURITY AGREEMENT Recorded Aug 9, 2018
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 047282/0463 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →