X-ray fluorescence apparatus for contamination monitoring
An apparatus for X-ray measurement, includes an X-ray source, an X-ray detector, an optical inclinometer, and a processor. The X-ray source is configured to generate and direct an X-ray beam to be incident at a grazing angle on a surface of a sample. The X-ray detector is configured to measure X-ray fluorescence emitted from the surface of the sample in response to being excited by the X-ray beam. The optical inclinometer is configured to measure an inclination of the surface of the sample. The processor is configured to calibrate the grazing angle of the X-ray beam based on the measured inclination, and to further fine-tune the grazing angle based on the X-ray fluorescence measured by the X-ray detector.
1. An apparatus for X-ray measurement, comprising:
an X-ray source, which is configured to generate and direct an X-ray beam to be incident at a grazing angle on a surface of a sample;
an X-ray detector, which is configured to measure X-ray fluorescence emitted from the surface of the sample in response to being excited by the X-ray beam;
an optical inclinometer, which is configured to measure an inclination of the surface of the sample; and
a processor, which is configured to calibrate the grazing angle of the X-ray beam based on the measured inclination, and to further fine-tune the grazing angle based on the X-ray fluorescence measured by the X-ray detector.
2. The apparatus according to claim 1 , wherein the processor is further configured to detect contaminants on the sample based on the measured X-ray fluorescence.
3. The apparatus according to claim 1 , wherein the processor is further configured to store in a memory a resulting calibration lookup table for the grazing angle.
4. The apparatus according to claim 1 , wherein the processor is configured to fine-tune the grazing angle based on a measured X-ray fluorescence intensity of a given spectral line.
5. The apparatus according to claim 4 , wherein the given spectral line is a fluorescence line of a chemical element that the sample comprises.
6. The apparatus according to claim 4 , wherein the sample comprises a silicon substrate, and wherein the given spectral line is a SiKα line.
7. The apparatus according to claim 4 , wherein the processor is configured to determine the grazing angle from a stored calibration lookup table comprising fluorescence intensity of the given spectral line as a function of angle of incidence.
8. The apparatus according to claim 1 , wherein the X-ray source comprises multiple X-ray sources configured to excite X-ray fluorescence at multiple different X-ray energy bands, and wherein the X-ray detector comprises multiple X-ray detectors configured to detect the X-ray fluorescence at respective multiple different X-ray energy bands.
9. The apparatus according to claim 1 , and comprising an additional X-ray detector, which is configured to measure X-rays that are specularly reflected by the sample at the grazing angle.
10. The apparatus according to claim 1 , wherein the processor is further configured to recalibrate a zero-angle reference for the optical inclinometer based on the fine-tuning, and to store the calibrated zero-angle reference for later use at subsequent measurement sites on the sample or for use with subsequent samples.
11. The apparatus according to claim 1 , and comprising a multi-layer shield, which comprises multiple layers, each layer configured to attenuate stray X-ray fluorescence radiation of progressively-increasing wavelength emitted toward the X-ray detector from a previous layer of the multi-layer shield.
12. An apparatus for X-ray measurement, comprising:
an X-ray source, which is configured to generate and direct an X-ray beam to a surface of a sample;
an X-ray detector, configured to detect X-ray fluorescence radiation emitted from the sample in response to being excited by the X-ray beam; and
a multi-layer shield, which comprises multiple layers, each layer configured to attenuate stray X-ray fluorescence radiation of progressively-increasing wavelength emitted toward the X-ray detector from a previous layer of the multi-layer shield.
13. The apparatus according to claim 12 , wherein a first layer of the multiple layers traversed by the X-ray beam is made of a light-weight metal, a second layer traversed by the X-ray beam is made of a heavy-weight metal, a third layer traversed by the X-ray beam is made of a medium-weight metal, and a fourth layer traversed by the X-ray beam is made of a light-weight metal.
14. The apparatus according to claim 12 , wherein the multi-layer shield comprises a plate mounted in front of a snout of the X-ray detector.
15. The apparatus according to claim 12 , wherein the multi-layer shield protrudes below a lowest point of a snout of the X-ray detector.
16. The apparatus according to claim 12 , and comprising:
an optical inclinometer, which is configured to measure an inclination of the surface of the sample; and
a processor, which is configured to calibrate the grazing angle of the X-ray beam based on the measured inclination, and to further fine-tune the grazing angle based on the X-ray fluorescence measured by the X-ray detector.
17. A method for X-ray measurement, the method comprising:
generating and directing an X-ray beam to be incident at a grazing angle on a surface of a sample;
measuring X-ray fluorescence emitted from the surface of the sample in response to being excited by the X-ray beam;
measuring an inclination of the surface of the sample; and
based on the measured inclination, calibrating the grazing angle, and, based on the measured X-ray fluorescence, further fine-tuning the grazing angle.
18. The method according to claim 17 , and comprising detecting contaminants on the sample based on the measured X-ray fluorescence.
19. The method according to claim 17 , and comprising storing in a memory a resulting calibration lookup table for the grazing angle.
20. The method according to claim 17 , wherein fine-tuning the grazing angle comprises fine-tuning the grazing angle based on a measured intensity of a given spectral line.
21. The method according to claim 20 , wherein fine-tuning the grazing angle comprises fine-tuning the grazing angle based on a measured intensity of a fluorescence line of a chemical element that the sample comprises.
22. The method according to claim 20 , wherein the sample comprises a silicon substrate, and wherein fine-tuning the grazing angle comprises fine-tuning the grazing angle based on a measured intensity of a SiKα fluorescence line.
23. The method according to claim 21 , and comprising determining the grazing angle from a stored calibration lookup table comprising the fluorescence intensity of the given spectral line as a function of angle of incidence.
24. The method according to claim 17 , and comprising exciting X-ray fluorescence at multiple different X-ray energy bands, and detecting the X-ray fluorescence at respective multiple different X-ray energy bands.
25. The method according to claim 17 , and comprising measuring X-rays that are specularly reflected by the sample at the grazing angle.
26. The method according to claim 17 , and comprising recalibrating a zero-angle reference for the optical inclinometer based on the fine-tuning, and storing the calibrated zero-angle reference for later use at subsequent measurement sites on the sample or for use with subsequent samples.
27. The method according to claim 17 , and comprising attenuating X-ray fluorescence radiation of progressively-increasing wavelengths emitted from a previous layer of a multi-layer shield comprising multiple layers.
28. A method for X-ray measurement, the method comprising:
generating and directing an X-ray beam to a surface of a sample;
measuring X-ray fluorescence radiation emitted from the sample in response to being excited by the X-ray beam; and
attenuating stray X-ray fluorescence radiation of progressively-increasing wavelengths emitted from a previous layer using a multi-layer shield comprising multiple layers.
29. The method according to claim 28 , wherein attenuating the stray X-ray fluorescence comprises attenuating the X-ray fluorescence with a first layer of the multiple layers traversed by the X-ray beam, which is made of a light-weight metal, attenuating with a second layer traversed by the X-ray beam, which is made of a heavy-weight metal, attenuating with a third layer traversed by the X-ray beam, which is made of a medium-weight metal, and attenuating with a fourth layer traversed by the X-ray beam, which is made of a light-weight metal.
30. The method according to claim 28 , wherein attenuating the stray X-ray fluorescence comprises mounting a plate comprising the multiple layers in front of a snout of an X-ray detector.
31. The method according to claim 28 , wherein attenuating the stray X-ray fluorescence comprises protruding the multi-layer shield below a lowest point of a snout of the X-ray detector.
32. The method according to claim 28 , and comprising:
measuring an inclination of the surface of the sample; and
based on the measured inclination, calibrating the grazing angle, and, based on the measured X-ray fluorescence, further fine-tuning the grazing angle.