IP Library Granted Patent US 10,615,157
Granted Patent B2
US 10,615,157 · App. 15/997,351 · Granted Apr 7, 2020

Decoupling capacitor circuit

Inventor: Wan Chul Kong (Seoul, KR)
Assignee: MagnaChip Semiconductor, Ltd.
H01L27/0288H01L27/0207H01L27/0805H01L27/092H01L29/94
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Quick Facts
Patent No.
US 10,615,157
App. No.
15/997,351
Granted
Apr 7, 2020
Kind
B2
Abstract

A decoupling capacitor includes a first p-type metal-oxide-semiconductor (PMOS) transistor connected to a power rail in a standard cell library, a first n-type metal-oxide-semiconductor (NMOS) transistor connected to a ground rail in the standard cell library, a second PMOS transistor connected between the first NMOS transistor and the power rail, and a second NMOS transistor connected between the first PMOS transistor and the ground rail, wherein a gate of the second PMOS transistor is connected to a gate of the second NMOS transistor.

Claims (34)

1. A decoupling capacitor, comprising:

a first p-type metal-oxide-semiconductor (PMOS) transistor connected to a power rail in a standard cell library;

a first n-type metal-oxide-semiconductor (NMOS) transistor connected to a ground rail in the standard cell library;

a second PMOS transistor connected between the first NMOS transistor and the power rail; and

a second NMOS transistor connected between the first PMOS transistor and the ground rail,

wherein a gate of the second PMOS transistor is connected to a gate of the second NMOS transistor,

wherein a drain of the second NMOS transistor is connected to a gate of the first PMOS transistor, and a source of the second NMOS transistor is connected to the ground rail, and

wherein a drain of the second PMOS transistor is directly connected to a gate of the first NMOS transistor.

2. The decoupling capacitor of claim 1 , wherein a source and a drain of the first PMOS transistor are connected to the power rail, along with an N-well region of the first PMOS transistor.

3. The decoupling capacitor of claim 1 , wherein a source and a drain of the first NMOS transistor are connected to the ground rail, along with a bulk region of the first NMOS transistor.

4. The decoupling capacitor of claim 1 , wherein a source of the second PMOS transistor is connected to the power rail.

5. The decoupling capacitor of claim 4 , wherein the first PMOS transistor, the first NMOS transistor, the second PMOS transistor, and the second NMOS transistor have dimensions determined such that in response to a supply voltage being applied from the power rail, a voltage level at the gate of the second PMOS transistor has a level that is 40 to 60 percent of a voltage level of the supply voltage.

6. The decoupling capacitor of claim 1 , wherein the first PMOS transistor and the second PMOS transistor are formed in a P-type active region.

7. The decoupling capacitor of claim 1 , wherein the drain region of the first PMOS transistor is connected to the power rail by a metal wiring layer through a contact.

8. The decoupling capacitor of claim 1 wherein the first PMOS transistor and the second PMOS transistor share a first shared source region.

9. The decoupling capacitor of claim 8 , wherein the first shared source region is connected to the power rail by a metal wiring layer through a contact.

10. The decoupling capacitor of claim 1 , wherein the first NMOS transistor and the second NMOS transistor are formed in an N-type active region.

11. The decoupling capacitor of claim 1 , wherein the drain region of the first NMOS transistor is connected to the ground rail by a metal wiring layer through a contact.

12. The decoupling capacitor of claim 1 , wherein the first NMOS transistor and the second NMOS transistor share a second shared source region.

13. The decoupling capacitor of claim 12 , wherein the second shared source region is connected to the ground rail by a metal wiring layer through a contact.

14. A decoupling capacitor, comprising:

a first p-type metal-oxide-semiconductor (PMOS) transistor connected to a power rail in a standard cell library;

a first n-type metal-oxide-semiconductor (NMOS) transistor connected to a ground rail in the standard cell library;

a second PMOS transistor connected between the first NMOS transistor and the power rail; and

a second NMOS transistor connected between the first PMOS transistor and the ground rail,

wherein a gate of the second PMOS transistor is connected to a gate of the second NMOS transistor, and

wherein the first NMOS transistor and the second NMOS transistor share a shared source region.

15. A decoupling capacitor, comprising:

a first p-type metal-oxide-semiconductor (PMOS) transistor connected to a power rail in a standard cell library;

a first n-type metal-oxide-semiconductor (NMOS) transistor connected to a ground rail in the standard cell library;

a second PMOS transistor connected between the first NMOS transistor and the power rail; and

a second NMOS transistor connected between the first PMOS transistor and the ground rail,

wherein a gate of the second PMOS transistor is connected to a gate of the second NMOS transistor,

wherein the first PMOS transistor and the second PMOS transistor share a shared source region.

Assignments (3)
CHANGE OF NAME Recorded Mar 12, 2024
From: KEY FOUNDRY CO., LTD.
To: SK KEYFOUNDRY INC.
Reel/Frame 066794/0290 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 3, 2020
From: MAGNACHIP SEMICONDUCTOR, LTD.
To: KEY FOUNDRY CO., LTD.
Reel/Frame 053703/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 4, 2018
From: KONG, WAN CHUL
To: MAGNACHIP SEMICONDUCTOR, LTD.
Reel/Frame 045982/0698 →
Priority Claims (1)
KR 10-2017-0117098 · Sep 13, 2017 · national
Continuity (1)
Related Publication 20190081038A1 · Mar 14, 2019