IP Library Granted Patent US 10,828,924
Granted Patent B2
US 10,828,924 · App. 16/004,063 · Granted Nov 10, 2020

Methods of forming a self-assembled block copolymer material

Inventors: Dan B. Millward (Boise, ID); Gurtej S. Sandhu (Boise, ID)
Assignee: Micron Technology, Inc.
B41N1/08B41N3/036B81C99/009B82Y10/00B82Y30/00B82Y40/00G03F7/0002G03F7/0017B05D1/283B81C2201/0149Y02C20/30Y10T428/24802
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,828,924
App. No.
16/004,063
Granted
Nov 10, 2020
Kind
B2
Abstract

Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.

Claims (17)

1. A method of forming a self-assembled block copolymer material, comprising:

contacting a block copolymer material with a stamp comprising hydrophilic regions and hydrophobic regions, each of the hydrophilic regions and each of the hydrophobic regions having a width equal to an inherent pitch value (L o ) of the block copolymer material; and

annealing the block copolymer material to self-assemble the block copolymer material into perpendicular-oriented polymer domains, a first of the perpendicular-oriented polymer domains preferentially wetting the hydrophilic regions of the stamp and a second of the perpendicular-oriented polymer domains preferentially wetting the hydrophilic regions of the stamp.

2. The method of claim 1 , further comprising:

removing the stamp from contact with the perpendicular-oriented polymer domains; and

contacting another block copolymer material with the stamp.

3. The method of claim 1 , further comprising:

removing one of the perpendicular-oriented polymer domains relative to another of the perpendicular-oriented polymer domains to form a mask exhibiting openings extending to and exposing portions of an underlying structure; and

etching the exposed portions of the underlying structure through the openings in the mask.

4. The method of claim 1 , further comprising:

forming a template comprising additional hydrophilic regions and additional hydrophobic regions;

forming an elastomeric polymer material on a surface of the template, the elastomeric polymer material comprising hydrophilic molecules and hydrophobic molecules;

curing the elastomeric polymer material to form the stamp, the hydrophilic regions of the stamp registered to the additional hydrophilic regions of the template and the hydrophobic regions of the stamp registered to the additional hydrophobic regions of the template; and

removing the stamp from the template.

5. The method of claim 4 , further comprising selecting the elastomeric polymer material from the group consisting of a poly(dimethylsiloxane), a silicone, and a polyurethane.

6. The method of claim 4 , further comprising selecting the hydrophobic molecules from the group consisting of perfluorinated alkenes, vinyl esters, and hydrocarbon alkenes.

7. The method of claim 4 , further comprising selecting the hydrophilic molecules from the group consisting of oligo(ethylene glycol) methacrylate, undec-11-enyl hexaethylene glycol monomethyl ether, and vinylic poly(ethylene glycol).

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 11, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050713/0001 →
SUPPLEMENT NO. 9 TO PATENT SECURITY AGREEMENT Recorded Aug 9, 2018
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 047282/0463 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →