IP Library Granted Patent US 10,832,934
Granted Patent B2
US 10,832,934 · App. 16/008,945 · Granted Nov 10, 2020

Multi-layer tethers for micro-transfer printing

Inventors: António José Marques Trindade (Cork, IE); Christopher Andrew Bower (Raleigh, NC)
Assignee: X Display Company Technology Limited
H01L21/6835B41F16/0046H01L21/561H01L24/97H01L2221/68322H01L2221/68363H01L2221/68381H01L2224/95001
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Quick Facts
Patent No.
US 10,832,934
App. No.
16/008,945
Granted
Nov 10, 2020
Kind
B2
Abstract

A micro-device structure comprises a source substrate comprising sacrificial portions laterally spaced apart by anchors. Each sacrificial portion is exposed through an opening. A micro-device is disposed on each sacrificial portion and laterally attached to an anchor by a multi-layer tether. In certain embodiments, a micro-device structure is constructed by providing the source substrate, disposing micro-devices on each sacrificial portion, depositing a first tether layer over at least a portion of the source substrate and the micro-device, depositing a second tether layer over the first tether layer, and patterning the first tether layer and the second tether layer to form (i) a multi-layer tether for each of the micro-devices such that the multi-layer tether laterally attaches the micro-device to one of the anchors, and (ii) an opening exposing each of the sacrificial portions.

Claims (48)

1. A micro-device structure, comprising:

a source substrate comprising sacrificial portions laterally spaced apart by anchors, wherein at least a portion of each of the sacrificial portions is exposed through an opening; and

a micro-device disposed exclusively in direct contact with each of the sacrificial portions and laterally attached to one of the anchors by a multi-layer tether,

wherein the multi-layer tether comprises a first tether layer adjacent to the source substrate and a second tether layer on a side of the first tether layer opposite the source substrate, wherein (i) the first tether layer extends over at least a portion of the micro-device, (ii) the second tether layer extends over at least a portion of the micro-device, or (iii) the first tether layer extends over at least a first portion of the micro-device and the second tether layer extends over at least a second portion of the micro-device, and

wherein the first tether layer is thicker than the second tether layer.

2. The micro-device structure of claim 1 , wherein the multi-layer tether is a bilayer tether consisting essentially of two tether layers.

3. The micro-device structure of claim 1 , wherein the multi-layer tether comprises an oxide, a nitride, or both an oxide and a nitride.

4. The micro-device structure of claim 3 , wherein the multi-layer tether comprises a first tether layer comprising silicon dioxide and a second tether layer comprising silicon nitride.

5. The micro-device structure of claim 4 , wherein the first tether layer of silicon dioxide is disposed between the second tether layer of silicon nitride and the sacrificial portion.

6. The micro-device structure of claim 1 , wherein the first tether layer, the second tether layer, or both the first tether layer and the second tether layer encapsulate the micro-device.

7. The micro-device structure of claim 1 , wherein the micro-device comprises one or more contact pads and the first tether layer encapsulates the micro-device except for the one or more contact pads and the second tether layer encapsulates the micro-device including the one or more contact pads.

8. The micro-device structure of claim 1 , wherein the first tether layer is 1.5 to 3 times as thick as the second tether layer.

9. The micro-device structure of claim 1 , wherein the sacrificial portions comprise a sacrificial material that is the same material as a material of the source substrate, and wherein the sacrificial material is an anisotropically etchable material.

10. The micro-device structure of claim 1 , wherein the sacrificial portions comprise a sacrificial material that is a different material from a material of the source substrate, and wherein the sacrificial material is differentially etchable from the material of the source substrate.

11. The micro-device structure of claim 1 , wherein the micro-device has a thickness greater than or equal to 5 μm.

12. The micro-device structure of claim 1 , wherein the micro-device has one or more of a length greater than or equal to 250 μm and a width greater than or equal to 250 μm.

13. The micro-device structure of claim 1 , wherein the micro-device has at least one of a length and a width that is two to four times a length of the multi-layer tether.

14. The micro-device structure of claim 1 , wherein the micro-device is laterally attached to the one of the anchors only by the multi-layer tether.

15. The micro-device structure of claim 1 , wherein the micro-device is laterally attached to a second one of the anchors by a second tether.

16. A micro-device structure, comprising:

a source substrate comprising anchors that are spaced apart and recessed portions between the anchors; and

a micro-device disposed exclusively over each of the recessed portions and laterally attached to one of the anchors by a multi-layer tether, thereby defining a gap between the micro-device and the source substrate, wherein the gap is exposed through an opening,

wherein the micro-device has at least one of a length greater than or equal to 250 μm, a width greater than or equal to 250 μm, and a thickness greater than or equal to 5 μm.

17. The micro-device structure of claim 16 , wherein the multi-layer tether comprises a first tether layer comprising silicon dioxide and a second tether layer comprising silicon nitride.

18. The micro-device structure of claim 16 , wherein the multi-layer tether comprises a first tether layer adjacent to the source substrate and a second tether layer on a side of the first tether layer opposite the source substrate, wherein the first tether layer extends over at least a portion of the micro-device, wherein the second tether layer extends over at least a portion of the micro-device, or wherein the first tether layer extends over at least a first portion of the micro-device and the second tether layer extends over at least a second portion of the micro-device.

19. The micro-device structure of claim 18 , wherein the micro-device comprises one or more contact pads and the first tether layer encapsulates the micro-device except for the one or more contact pads and the second tether layer encapsulates the micro-device including the one or more contact pads.

20. A micro-device structure, comprising:

a source substrate comprising sacrificial portions laterally spaced apart by anchors, wherein at least a portion of each of the sacrificial portions is exposed through an opening; and

a micro-device disposed exclusively in direct contact with each of the sacrificial portions and laterally attached to one of the anchors by a multi-layer tether,

wherein the multi-layer tether comprises a first tether layer adjacent to the source substrate and a second tether layer on a side of the first tether layer opposite the source substrate, and

wherein the first tether layer extends over at least a portion of the micro-device, wherein the second tether layer extends over at least a portion of the micro-device, or wherein the first tether layer extends over at least a first portion of the micro-device and the second tether layer extends over at least a second portion of the micro-device.

21. A micro-device structure, comprising:

a source substrate comprising sacrificial portions laterally spaced apart by anchors, wherein at least a portion of each of the sacrificial portions is exposed through an opening; and

a micro-device disposed exclusively in direct contact with each of the sacrificial portions and laterally attached to one of the anchors by a multi-layer tether,

wherein the micro-device has a thickness greater than or equal to 5 μm.

22. A micro-device structure, comprising:

a source substrate comprising sacrificial portions laterally spaced apart by anchors, wherein at least a portion of each of the sacrificial portions is exposed through an opening; and

a micro-device disposed exclusively in direct contact with each of the sacrificial portions and laterally attached to one of the anchors by a multi-layer tether,

wherein the micro-device has one or more of a length greater than or equal to 250 μm and a width greater than or equal to 250 μm.

23. A micro-device structure, comprising:

a source substrate comprising sacrificial portions laterally spaced apart by anchors, wherein at least a portion of each of the sacrificial portions is exposed through an opening; and

a micro-device disposed exclusively in direct contact with each of the sacrificial portions and laterally attached to one of the anchors by a multi-layer tether,

wherein the micro-device has at least one of a length and a width that is two to four times a length of the multi-layer tether.

24. A micro-device structure, comprising:

a source substrate comprising anchors that are spaced apart and recessed portions between the anchors; and

a micro-device disposed exclusively over each of the recessed portions and laterally attached to one of the anchors by a multi-layer tether, thereby defining a gap between the micro-device and the source substrate, wherein the gap is exposed through an opening,

wherein the multi-layer tether comprises a first tether layer adjacent to the source substrate and a second tether layer on a side of the first tether layer opposite the source substrate, wherein the first tether layer extends over at least a portion of the micro-device, wherein the second tether layer extends over at least a portion of the micro-device, or wherein the first tether layer extends over at least a first portion of the micro-device and the second tether layer extends over at least a second portion of the micro-device, and

wherein the micro-device comprises one or more contact pads and the first tether layer encapsulates the micro-device except for the one or more contact pads and the second tether layer encapsulates the micro-device including the one or more contact pads.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 28, 2026
From: X DISPLAY COMPANY TECHNOLOGY LIMITED
To: DAKTRONICS, INC.
Reel/Frame 075482/0209 →
CHANGE OF NAME Recorded Sep 16, 2021
From: X-CELEPRINT LIMITED
To: X DISPLAY COMPANY TECHNOLOGY LIMITED
Reel/Frame 057499/0314 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2020
From: BOWER, CHRISTOPHER ANDREW
To: X DISPLAY COMPANY TECHNOLOGY LIMITED
Reel/Frame 053163/0669 →
CHANGE OF NAME Recorded May 11, 2020
From: X-CELEPRINT LIMITED
To: X DISPLAY COMPANY TECHNOLOGY LIMITED
Reel/Frame 052631/0800 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 6, 2018
From: TRINDADE, ANTÓNIO JOSÉ MARQUES
To: X-CELEPRINT LIMITED
Reel/Frame 046281/0861 →