Method for forming replacement air gap
A method of forming transistor devices with an air gap in the replacement gate structure is disclosed including forming a placeholder gate structure above a semiconductor material region, forming a sidewall spacer adjacent the placeholder gate structure, removing the placeholder gate structure to define a gate cavity bounded by the sidewall spacer, forming a gate insulation layer in the gate cavity, the gate insulation layer including a first portion having a first thickness and a second portion having a second thickness greater than the first thickness, forming a gate electrode in the gate cavity above the gate insulation layer, removing at least a portion of the second portion of the gate insulation layer to define an air gap cavity adjacent the gate electrode, and forming a first gate cap layer above the gate electrode, wherein the first gate cap layer seals an upper end of the air gap cavity.
1. A method, comprising:
forming a placeholder gate structure above a semiconductor material region;
forming a sidewall spacer adjacent the placeholder gate structure;
removing the placeholder gate structure to define a gate cavity bounded by the sidewall spacer;
forming a gate insulation layer in the gate cavity, wherein the gate insulation layer comprises a first vertical portion positioned in a lower portion of the gate cavity having a first thickness in a horizontal direction and a second vertical portion positioned in an upper portion of the gate cavity having a second thickness in the horizontal direction greater than the first thickness;
forming a gate electrode in the gate cavity above the gate insulation layer;
removing at least a portion of the second vertical portion of the gate insulation layer to define an air gap cavity adjacent the gate electrode; and
forming a first gate cap layer above the gate electrode, wherein the first gate cap layer seals an upper end of the air gap cavity.
2. The method of claim 1 , wherein forming the gate insulation layer comprises:
forming an inner spacer on the upper portion of the gate cavity; and
forming a first insulating layer above the inner spacer and in the lower portion of the gate cavity, wherein the inner spacer and the first insulating layer define the gate insulation layer.
3. The method of claim 2 , wherein forming the inner spacer comprises:
forming a mask layer in the lower portion of the gate cavity;
forming a second insulating layer above the mask layer;
etching the second insulating layer to define the inner spacer; and
removing the mask layer.
4. The method of claim 2 , wherein the inner spacer and the first layer of insulating material comprise a same material.
5. The method of claim 4 , wherein the inner spacer and the first layer of insulating material comprise a high-k dielectric material.
6. The method of claim 2 , wherein removing at least a portion of the second vertical portion of the gate insulation layer comprises removing the inner spacer and portions of the first insulating layer adjacent the inner spacer.
7. The method of claim 1 , wherein removing at least a portion of the second vertical portion of the gate insulation layer comprises removing an entirety of the second vertical portion.
8. The method of claim 1 , further comprising recessing the sidewall spacer prior to removing at least a portion of the second vertical portion of the gate insulation layer.
9. The method of claim 1 , wherein forming the gate electrode in the gate cavity comprises:
forming the gate electrode to fill the gate cavity; and
recessing the gate electrode prior to removing at least a portion of the second vertical portion of the gate insulation layer.
10. The method of claim 1 , wherein a second gate cap layer is positioned above the placeholder gate structure, and the method further comprises:
forming a dielectric layer above the placeholder gate structure; and
planarizing the dielectric layer, the sidewall spacer and the second gate cap layer to expose the placeholder gate structure.
11. A method, comprising:
forming a placeholder gate structure above a semiconductor material region;
forming a sidewall spacer adjacent the placeholder gate structure;
removing the placeholder gate structure to define a gate cavity bounded by the sidewall spacer;
forming a mask layer in a lower portion of the gate cavity;
forming a first gate insulation layer in the gate cavity and above the mask layer;
etching the first gate insulation layer to define an inner spacer;
removing the mask layer;
forming a second gate insulation layer in the gate cavity and above the inner spacer;
forming a gate electrode in the gate cavity above the second gate insulation layer;
removing at least portions of the inner spacer and the second gate insulation layer in an upper portion of the gate cavity to define an air gap cavity adjacent the gate electrode; and
forming a first gate cap layer above the gate electrode, wherein the first gate cap layer seals an upper end of the air gap cavity.
12. The method of claim 11 , wherein the first and second gate insulation layers comprise a same material.
13. The method of claim 12 , wherein the first and second gate insulation layers comprise a high-k dielectric material.
14. The method of claim 11 , wherein removing at least portions of the inner spacer and the second gate insulation layer comprises removing overlapping portions of the inner spacer and the second gate insulation layer.
15. The method of claim 11 , further comprising recessing the sidewall spacer prior to removing portions of the inner spacer and the second gate insulation layer.
16. The method of claim 11 , wherein forming the gate electrode in the gate cavity comprises:
forming the gate electrode to fill the gate cavity; and
recessing the gate electrode prior to removing portions of the inner spacer and the second gate insulation layer.
17. The method of claim 11 , wherein a second gate cap layer is positioned above the placeholder gate structure, and the method further comprises:
forming a dielectric layer above the placeholder gate structure; and
planarizing the dielectric layer, the sidewall spacer and the second gate cap layer to expose the placeholder gate structure.
18. A method, comprising:
forming a placeholder gate structure above a semiconductor material region;
forming a sidewall spacer adjacent the placeholder gate structure;
removing the placeholder gate structure to define a gate cavity bounded by the sidewall spacer;
forming a gate insulation layer in the gate cavity, wherein the gate insulation layer comprises a first portion positioned in a lower portion of the gate cavity having a first thickness and a second portion positioned in an upper portion of the gate cavity having a second thickness greater than the first thickness;
forming a gate electrode in the gate cavity above the gate insulation layer;
recessing the sidewall spacer;
removing a portion of the second portion of the gate insulation layer after recessing the sidewall spacer to define an air gap cavity adjacent the gate electrode; and
forming a first gate cap layer above the gate electrode, wherein the first gate cap layer seals an upper end of the air gap cavity.
19. The method of claim 18 , wherein forming the gate electrode in the gate cavity comprises:
forming the gate electrode to fill the gate cavity; and
recessing the gate electrode prior to removing at least a portion of the second portion of the gate insulation layer.
20. The method of claim 18 , wherein a second gate cap layer is positioned above the placeholder gate structure, and the method further comprises:
forming a dielectric layer above the placeholder gate structure; and
planarizing the dielectric layer, the sidewall spacer and the second gate cap layer to expose the placeholder gate structure.