Pellicle and pellicle assembly

Inventors: David Ferdinand Vles (Eindhoven, NL); Erik Achilles Abegg (Eindhoven, NL); Aage Bendiksen (Fairfield, CT); Derk Servatius Gertruda Brouns (Herentals, BE); Pradeep K. Govil (Norwalk, CT); Paul Janssen (Eindhoven, NL); Maxim Aleksandrovich Nasalevich (Eindhoven, NL); Arnoud Willem Notenboom (Rosmalen, NL); Mária Péter (Eindhoven, NL); Marcus Adrianus Van De Kerkhof (Helmond, NL); Willem Joan Van Der Zande (Bussum, NL); Pieter-Jan Van Zwol (Eindhoven, NL); Johannes Petrus Martinus Bernardus Vermeulen (Leende, NL); Willem-Pieter Voorthuijzen ('s-Hertogenbosch, NL); James Norman Wiley (Menlo Park, CA)

Assignees: ASML NETHERLANDS B.V.; ASML HOLDING N.V.

G03F1/64 G03F1/22 G03F1/62 G03F7/7085 G03F7/70916 G03F7/70983

View Patent ↗

Loading inventors, assignments & file history…

Monitor This Case

Get email alerts when status or documents change.

Order Certified Copies

Most orders are placed with the USPTO same day — all within 24 business hours.

Order via The Patent Place →

Pre-filled with this patent's details

Quick Facts

Patent No.: US 10,466,585
App. No.: 16/062,017
Granted: Nov 5, 2019
Kind: B2

External Links

USPTO Patent Center↗ Full Patent PDF↗

Abstract

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.

Claims (34)

1. A pellicle suitable for use with a patterning device for a lithographic apparatus, the pellicle comprising at least one breakage region, located in a portion of the pellicle transmissive of ultraviolet radiation or radiation selected from the range of 4 to 20 nm, which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of one or more remaining regions of the pellicle that is transmissive of ultraviolet radiation or radiation selected from the range of 4 to 20 nm.

2. The pellicle of claim 1 , wherein the at least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to one or more surrounding regions of the pellicle.

3. The pellicle of claim 1 , wherein the at least one breakage region comprises a region of the pellicle which has been exposed to radiation so as to structurally weaken that region when compared to the one or more remaining regions of the pellicle.

4. The pellicle of claim 1 , wherein the at least one breakage region comprises a region of the pellicle in which one or more holes and/or cracks are formed.

5. The pellicle of claim 1 , wherein the at least one breakage region comprises a region of the pellicle which has been exposed to a substance configured to structurally weaken that region when compared to the one or more remaining regions of the pellicle.

6. The pellicle of claim 1 , further comprising a reinforced region positioned adjacent a breakage region, wherein the reinforced region has an increased thickness when compared to the one or more remaining regions of the pellicle.

7. The pellicle of claim 6 , wherein the reinforced region traces out a curved shape on the pellicle.

8. The pellicle of claim 1 , wherein the at least one breakage region comprises a fracture line which is configured to preferentially break prior to breakage of one or more remaining regions of the pellicle so as to form a crack in the pellicle along the fracture line.

9. The pellicle of claim 1 , further comprising a sensor configured to monitor the at least one breakage region and detect breakage of the at least one breakage region.

10. A pellicle assembly comprising:

the pellicle of claim 1 ; and

a frame configured to support the pellicle,

wherein the pellicle comprises a perimeter portion supported by the frame and comprises an unsupported portion enclosed by the perimeter portion.

11. The pellicle assembly of claim 10 , wherein the at least one breakage region of the pellicle comprises a fracture line configured to preferentially break prior to breakage of one or more remaining regions of the pellicle so as to form a crack in the pellicle along the fracture line and wherein the fracture line extends between sections of the perimeter portion of the pellicle which is supported by the frame.

12. The pellicle assembly of claim 10 , further comprising a reinforced region of the pellicle positioned adjacent a breakage region, wherein the reinforced region has an increased thickness when compared to the one or more remaining regions of the pellicle and wherein part of the reinforced portion contacts the frame.

13. The pellicle assembly of claim 10 , wherein the at least one breakage region forms part of the perimeter portion of the pellicle which is supported by the frame.

14. The pellicle assembly of claim 13 , wherein the pellicle further comprises at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle, the at least one breakage region being positioned such that breakage of the pellicle at the at least one breakage region ensures that the pellicle rolls up.

15. A pellicle assembly suitable for use with a patterning device for a lithographic apparatus, the pellicle assembly comprising:

a frame configured to support a pellicle; and

a pellicle attached to the frame,

wherein the pellicle comprises at least a first layer having a first tension and a second layer having a second tension,

wherein the first tension is higher than the second tension such that in the event of breakage of the pellicle the difference between the first and second tensions causes the pellicle to roll up.

16. A debris mitigation apparatus comprising:

a debris steering device arranged close to a pellicle for a lithographic apparatus, the debris steering device configured to direct debris resulting from breakage of the pellicle in a preferred direction; and

a sensor configured to monitor a pellicle and detect breakage of the pellicle,

wherein the debris steering device is configured to react to a detection of breakage of the pellicle and direct debris resulting from breakage of the pellicle in the preferred direction.

17. The debris mitigation apparatus of claim 16 , wherein the debris steering device comprises:

an enclosed chamber positioned close to the pellicle wherein the inside of the chamber is held at a pressure which is lower than the pressure at which the pellicle is held; and

an actuator configured to open the chamber in reaction to a detection of breakage of the pellicle to enable the debris resulting from the broken pellicle to be sucked into the chamber.

18. The debris mitigation apparatus of claim 16 , wherein the debris steering device comprises:

an enclosed chamber positioned close to the pellicle wherein the inside of the chamber is held at a pressure which is higher than the pressure at which the pellicle is held; and

an actuator configured to open the chamber in reaction to a detection of breakage of the pellicle to enable the debris resulting from the broken pellicle to be blown away from the chamber and in a preferential direction.

19. The debris mitigation apparatus of claim 16 , wherein the debris steering device comprises an electrically charged surface positioned close to the pellicle such that in the event of breakage of the pellicle debris from the pellicle is directed towards the electrically charged surface by electrostatic attraction.

20. The debris mitigation apparatus of claim 16 , wherein the sensor is configured to direct a non-normal beam of radiation at the pellicle and a detector configured to detect the radiation redirected by the pellicle.

Assignments (6)