Rheology modifiers for encapsulating quantum dots
A polymer resin comprising: (a) quantum dots, (b) a compound of formula (I) (I) wherein R 1 is hydrogen or methyl and R 2 is a C 6 -C 20 aliphatic polycyclic substituent, and (c) a block or graft copolymer having Mn from 50,000 to 400,000 and comprising from 10 to 100 wt % polymerized units of styrene and from 0 to 90 wt % of a non-styrene block; wherein the non-styrene block has a van Krevelen solubility parameter from 15.0 to 17.5 (J/cm 3 ) 1/2 .
1. A polymer resin comprising:
(a) quantum dots,
(b) a compound of formula (I)
wherein R 1 is hydrogen or methyl and R 2 is a C 6 -C 20 aliphatic polycyclic substituent, and
(c) a block or graft copolymer having M n from 50,000 to 400,000 and comprising from 10 to 100 wt % polymerized units of styrene and from 0 to 90 wt % of a non-styrene block; wherein the non-styrene block has a van Krevelen solubility parameter from 15.0 to 17.5 (J/cm 3 ) 1/2 .
2. The polymer resin of claim 1 in which R 2 is a C 7 -C 17 bridged polycyclic substituent.
3. The polymer resin of claim 2 in which the block or graft copolymer is a hydrocarbon polymer which comprises at least 20 wt % polymerized units of styrene and at least 20% polymerized units of alkenes, dienes or a combination thereof.
4. The polymer resin of claim 3 comprising from 70 to 95 wt % of the compound of formula (I), from 1 to 20 wt % of the block or graft copolymer, 0.01 to 5 wt % of quantum dots and from 0.3 to 5 wt % curing agents.
5. The polymer resin of claim 4 in which R 2 has a bicyclo[2,2,1]alkane or tricyclodecane ring system.
6. The polymer resin of claim 5 in which the block or graft copolymer has M n from 60,000 to 300,000.
7. The polymer resin of claim 6 in which the block or graft copolymer has at least 20% polymerized units of styrene and no more than 80 wt % polymerized units of monomers selected from the group consisting of C 2 -C 8 alkenes and C 2 -C 8 dienes.
8. The polymer resin of claim 7 in which the C 2 -C 8 alkenes and dienes are selected from the group consisting of ethylene, propylene, butylene, isoprene and butadiene.
9. The polymer resin of claim 8 in which the hydrocarbon polymer has M n from 70,000 to 250,000.
10. A polymer resin comprising:
(a) quantum dots,
(b) a compound of formula (I)
wherein R 1 is hydrogen or methyl and R 2 is a C 6 -C 20 aliphatic polycyclic substituent, and
(c) a homopolymer or random copolymer with M n greater than polymer critical molecular weight, M c and with a van Krevelen solubility parameter from 16.5 to 20.0 (J/cm 3 ) 1/2 .