Silicon-nitride-containing thermal chemical vapor deposition coating
Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.
1. An article, comprising:
a silicon-nitride-containing coating on a surface;
wherein the surface has at least one concealed portion that is obstructed from view;
wherein the surface includes an interior surface and an exterior surface, the interior surface and the exterior surface having the silicon-nitride-containing coating.
2. The article of claim 1 , wherein the silicon-nitride-containing coating includes silicon nitride oxide.
3. The article of claim 1 , wherein the silicon-nitride-containing coating includes a functionalized layer.
4. The article of claim 1 , further comprising an additional silicon-nitride-containing coating, the additional silicon nitride coating having a smaller thickness than the silicon-nitride-containing coating.
5. The article of claim 1 , further comprising an additional silicon-nitride-containing coating, the additional silicon nitride coating having a greater thickness than the silicon-nitride-containing coating.
6. The article of claim 1 , further comprising an additional silicon-nitride-containing coating, the additional silicon nitride coating having a thickness of between 50 nm and 500 nm.
7. The article of claim 1 , wherein the article includes an oxidized layer.
8. The article of claim 1 , wherein the article is a non-planar structure.
9. The article of claim 1 , wherein the article is a complex geometry structure.
10. The article of claim 1 , wherein the article is a metallic structure.
11. The article of claim 1 , wherein the article is a metal structure.
12. The article of claim 1 , wherein the article is a ceramic structure.
13. The article of claim 1 , wherein the article is a union, a connector, an adaptor, a ferrule, a valve, a spring, a regulator, a flow-controller, an injection port, a sample probe, or a combination thereof.
14. The article of claim 1 , wherein the article is a sample cylinder.
15. The article of claim 1 , wherein the article is an in-line filter.
16. The article of claim 1 , wherein the article is a spool.
17. The article of claim 1 , wherein the article is a structure with only one opening.
18. The article of claim 1 , wherein the article is a forged structure, a molded structure, or an additively-produced structure.
19. An article, comprising:
a silicon-nitride-containing coating on a surface of the article;
wherein the surface has at least a concealed portion that is obstructed from view;
wherein the article includes an oxidized layer;
wherein the oxidized layer has a thickness of between 100 nm and 10,000 nm.
20. An article, comprising:
a silicon-nitride-containing coating on an interior surface and an exterior surface of the article,
wherein the article is a tube.