IP Library › Granted Patent US 10,615,008
Granted Patent B2
US 10,615,008 · App. 16/140,745 · Granted Apr 7, 2020

Temperature control method

Inventor: Jun Young Chung (Gyeonggi-do, KR)
Assignee: Tokyo Electron Limited
H01J37/32522H01J37/32449H01J37/32834H01L21/3065H01L21/31138H01L21/67069H01L21/67109H01L21/67248H01L21/67253H01L21/6831H01L21/6833H01J2237/3341
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Quick Facts
Patent No.
US 10,615,008
App. No.
16/140,745
Granted
Apr 7, 2020
Kind
B2
Abstract

A temperature control method of controlling a temperature of an object to be processed includes supplying a heat-transfer gas between an object to be processed and a mounting stage from a gas port from among a plurality of gas ports provided in a mounting stage, exhausting the heat-transfer gas from another gas port different from the gas port, detecting pressure of the gas port supplying the heat-transfer gas and the another gas port exhausting the heat-transfer gas, and adjusting the pressure.

Claims (23)

1. A temperature control method of controlling a temperature of an object to be processed, the temperature control method comprising:

supplying a heat-transfer gas between an object to be processed and a mounting stage from a gas port from among a plurality of gas ports provided in a mounting stage;

exhausting the heat-transfer gas from another gas port different from the gas port;

detecting a pressure of the gas port supplying the heat-transfer gas and another pressure of the another gas port exhausting the heat-transfer gas; and

adjusting the pressure and the another pressure.

2. The temperature control method according to claim 1 ,

wherein the plurality of gas ports are arranged to have a shape of a concentric circle, a sector, or a combination of the concentric circle and the sector.

3. The temperature control method according to claim 1 ,

wherein each of the plurality of gas ports is connected with a heat-transfer gas supply source and an exhaust device,

wherein a first control valve for controlling a flow rate of the heat-transfer gas supplied to the gas port is interposed between the heat-transfer gas supply source and the gas port, and

wherein a second control valve for controlling a flow rate of the heat-transfer gas exhausted from the another gas port is interposed between the exhaust device and the another gas port.

4. The temperature control method according to claim 3 ,

wherein adjusting the pressure is performed by controlling both the first control valve and the second control valve.

5. The temperature control method according to claim 1 ,

wherein each of the plurality of gas ports is connected with a heat-transfer gas supply source and an exhaust device,

wherein a first control valve for controlling a flow rate of the heat-transfer gas supplied to the gas port is interposed between the heat-transfer gas supply source and the gas port, and

wherein a choke mechanism is interposed between the exhaust device and the another gas port.

6. The temperature control method according to claim 5 ,

wherein adjusting the pressure is performed by controlling the first control valve.

7. A temperature control method of controlling a temperature of an object to be processed mounted on a mounting stage, the temperature control method comprising:

forming a flow of a heat-transfer gas in a horizontal direction between the object to be processed and the mounting stage;

detecting a pressure of the heat-transfer gas on an upstream side and another pressure of the heat-transfer gas of a downstream side; and

adjusting the pressure and the another pressure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 25, 2018
From: CHUNG, JUN YOUNG
To: TOKYO ELECTRON LIMITED
Reel/Frame 046959/0531 →
Priority Claims (1)
JP 2017-189621 · Sep 29, 2017 · national
Continuity (1)
Related Publication 20190103255A1 · Apr 4, 2019