Via support structure under pad areas for BSI bondability improvement
The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a substrate and a first interconnect wire arranged within a dielectric structure on the substrate. A bond pad contacts the first interconnect wire. A via support structure has one or more vias arranged within the dielectric structure at a location separated from the substrate by the first interconnect wire, The via support structure has a metal pattern density that is greater than or equal to approximately 19% and that is configured to mitigate damage caused by a force of a bonding process on the bond pad.
1. An integrated chip, comprising:
a substrate;
a first interconnect wire arranged within a dielectric structure on the substrate;
a bond pad contacting the first interconnect wire; and
a via support structure comprising one or more vias arranged within the dielectric structure at a location separated from the bond pad by the first interconnect wire, wherein the via support structure has a pattern density that is greater than or equal to approximately 19% and that is configured to mitigate damage caused by a force of a bonding process on the bond pad.
2. The integrated chip of claim 1 , further comprising:
a second interconnect wire arranged within the dielectric structure and vertically separated from the substrate by the first interconnect wire, wherein the via support structure is arranged between the first interconnect wire and the second interconnect wire.
3. The integrated chip of claim 2 , wherein the via support structure comprises a plurality of vias separated from one another by substantially equal distances.
4. The integrated chip of claim 1 , wherein the first interconnect wire has a surface facing the substrate, the surface continuously extending from directly under the bond pad to laterally outside of the bond pad.
5. The integrated chip of claim 1 , wherein the one or more vias comprise a plurality of support vias laterally extending from directly under the bond pad to laterally outside of the bond pad.
6. The integrated chip of claim 1 , further comprising:
a dielectric isolation layer arranged vertically between the bond pad and the first interconnect wire, wherein the dielectric isolation layer has sidewalls contacting both sidewalls of the bond pad and sidewalls of the substrate.
7. The integrated chip of claim 1 , further comprising:
a plurality of additional vias separated from the one or more vias along a horizontal plane that is parallel to a surface of the substrate facing the first interconnect wire, wherein the one or more vias respectively have a larger size than respective ones of the plurality of additional vias.
8. The integrated chip of claim 7 , wherein the one or more vias comprise a plurality of vias that are separated along a first direction and along a second direction that is perpendicular to the first direction.
9. The integrated chip of claim 1 , wherein the via support structure laterally extends between outermost sidewalls of the bond pad.
10. The integrated chip of claim 1 , wherein the via support structure comprises a plurality of vias that are separated along a first direction by a distance that is smaller than a width of respective ones of the plurality of vias along the first direction.
11. An integrated chip, comprising:
a first interconnect wire arranged within a dielectric structure disposed on a front-side of a substrate;
a bond pad contacting the first interconnect wire; and
a via support structure comprising a via arranged within the dielectric structure at a location between the first interconnect wire and a second interconnect wire within the dielectric structure, wherein the via comprises sidewalls continuously surrounding one or more openings extending through the via.
12. The integrated chip of claim 11 , wherein the one or more openings comprise a plurality of openings that are separated by conductive material along a first direction and along a second direction that is perpendicular to the first direction.
13. The integrated chip of claim 11 , wherein the first interconnect wire has a surface facing the substrate, the surface having a first width that is greater than a second width of the bond pad.
14. The integrated chip of claim 11 , further comprising:
a dielectric material contacting sidewalls of the substrate defining a bond pad opening, wherein the bond pad is arranged within the bond pad opening and wherein the dielectric material laterally separates the bond pad from the substrate.
15. An integrated chip, comprising:
a first interconnect wire disposed within a dielectric structure on a substrate;
a bond pad contacting the first interconnect wire;
a first plurality of support vias between the first interconnect wire and a second interconnect wire disposed within the dielectric structure; and
a first plurality of additional vias disposed within the dielectric structure and having a smaller width than the first plurality of support vias, wherein the first plurality of support vias are laterally offset from the first plurality of additional vias, and wherein the first plurality of support vias laterally extend past outermost sidewalls of the bond pad.
16. The integrated chip of claim 15 , wherein the first plurality of support vias are separated along a first direction and along a second direction that is perpendicular to the first direction.
17. The integrated chip of claim 15 , wherein the first plurality of support vias are separated along a first direction by a distance that is smaller than a width of respective ones of the first plurality of support vias along the first direction.
18. The integrated chip of claim 15 ,
wherein the first plurality of support vias respectively have a first size that is greater than approximately 130% a second size of respective ones of the first plurality of additional vias; and
wherein the first size is configured to provide for a pattern density that mitigates damage caused by a force of a bonding process on the bond pad.
19. The integrated chip of claim 15 , further comprising:
a third interconnect wire arranged within the dielectric structure and vertically separated from the second interconnect wire;
a second plurality of support vias between the second interconnect wire and the third interconnect wire; and
a second plurality of additional vias within the dielectric structure and having a smaller width than the second plurality of support vias, wherein the second plurality of support vias are laterally offset from the second plurality of additional vias.
20. The integrated chip of claim 19 , wherein the first plurality of support vias are directly over a region confined between outermost edges of the second plurality of support vias.