IP Library Granted Patent US 10,925,985
Granted Patent B2
US 10,925,985 · App. 16/204,567 · Granted Feb 23, 2021

Systems and methods for sterilization using nonthermal plasma generation

Inventors: Mark Edward Hogsett (Wilmington, NC); Steven Bernard Heymann (Los Gatos, CA); Carl Newberg (Tuscon, AZ)
Assignee: Illinois Tool Works Inc.
A61L2/14A61L2/24A61L2/26A61L9/22H01T23/00A61L2202/11A61L2202/14A61L2202/25A61L2209/111H05H2245/1225
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Quick Facts
Patent No.
US 10,925,985
App. No.
16/204,567
Granted
Feb 23, 2021
Kind
B2
Abstract

Systems and methods for sterilization using nonthermal plasma (NTP) ionization are disclosed. An example method for inactivation of viable microorganisms includes: inactivating viable microorganisms in a predetermined volume by: installing a plurality of ceiling mounted direct current (DC) or alternating current (AC), bipolar or steady-state, ion emitter modules based on a geometry of the predetermined volume; and producing, using the plurality of ceiling mounted ion emitter modules, a DC or AC, bipolar or steady-state, nonthermal plasma (NTP), each of the ceiling mounted ion emitter modules comprising a high voltage power supply (HVPS).

Claims (15)

1. A method for inactivation of viable microorganisms, the method comprising:

inactivating viable microorganisms in a predetermined volume by:

installing a plurality of ceiling mounted direct current (DC) or alternating current (AC), bipolar or steady-state, ion emitter modules based on a geometry of the predetermined volume, wherein the installing of the plurality of ceiling mounted ion emitter modules comprises arranging the plurality of ceiling mounted ion emitter modules to have a module density in the predetermined volume based on a target ion density;

producing, using the plurality of ceiling mounted ion emitter modules, a DC or AC, bipolar or steady-state, nonthermal plasma (NTP), each of the ceiling mounted ion emitter modules comprising a high voltage power supply (HVPS);

connecting the plurality of ceiling mounted ion emitter modules to a controller module; and

controlling the plurality of ceiling mounted ion emitter modules using the controller module.

2. The method as defined in claim 1 , wherein the target ion density corresponds to a subvolume within the predetermined volume.

3. The method as defined in claim 1 , wherein the producing of the nonthermal plasma comprises controlling at least a portion of the plurality of ceiling mounted ion emitter modules to generate the nonthermal plasma in at least one of a pulsed DC mode, a steady-state DC mode, or an AC mode.

4. The method as defined in claim 1 , wherein the installing of the plurality of ceiling mounted ion emitter modules comprises providing the ceiling mounted ion emitter modules with stainless steel shrouds to protect emitters of the ceiling mounted ion emitter modules.

5. The method as defined in claim 1 , wherein the producing of the nonthermal plasma comprises generating a nonthermal plasma having an alternating polarity.

6. The method as defined in claim 5 , wherein the producing of the nonthermal plasma comprises generating the nonthermal plasma at different plasma densities using different ones of the plurality of ceiling mounted ion emitter modules.

7. The method as defined in claim 1 , wherein the producing of the nonthermal plasma further comprises causing the nonthermal plasma to traverse the predetermined volume.

8. The method as defined in claim 1 , wherein the producing of the nonthermal plasma comprises deactivating of bacteria, spores, fungi, and viruses present in the predetermined space in at least respective threshold fractions of the bacteria, spores, fungi, and viruses.

9. The method as defined in claim 1 , wherein the producing of the nonthermal plasma comprises producing a neutral net charge.

10. The method as defined in claim 1 , wherein the installing of the plurality of ceiling mounted ion emitter modules comprises arranging the plurality of ceiling mounted ion emitter modules based on a first target ion density for a first subvolume of the predetermined volume and a second target ion density for a second subvolume of the predetermined volume, the second target ion density being different than the first target ion density.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 19, 2020
From: HOGSETT, MARK EDWARD; HEYMANN, STEVEN BERNARD; NEWBERG, CARL
To: ILLINOIS TOOL WORKS INC.
Reel/Frame 051969/0029 →
Continuity (2)
Provisional Application 62592785 · Nov 30, 2017
Related Publication 20190160191A1 · May 30, 2019
Cited By (2)
US 12,268,791 US 12,643,668