Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit
An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.
1. An illumination optical unit for illuminating objects to be examined by a metrology system with illumination light, comprising:
an optical pupil influencing assembly configured to influence an intensity distribution of the illumination light over a pupil of the illumination optical unit,
wherein the pupil influencing assembly is designed such that the illumination light impinges on at least one region of a micromirror array a first time, is reflected from the at least one region of the micromirror array, and the light reflected from the at least one region is subsequently redirected back toward the at least one region of the micromirror array, and impinges on the at least one region of the micromirror array at least a second time in the beam path of the illumination light.
2. The illumination optical unit according to claim 1 , wherein the pupil influencing assembly comprises at least two micromirror array regions which are separated from one another and are arranged one after another in the beam path of the illumination light.
3. The illumination optical unit according to claim 1 , wherein the at least one micromirror array for pupil shaping comprises a diffraction-reflection grating for the illumination light.
4. The illumination optical unit according to claim 1 , wherein the beam path of the illumination light onto the at least one micromirror array is configured in such a way that the illumination light is incident on micromirrors of the micromirror array with an input divergence which is less than a diffraction angle of a first order of diffraction of the diffraction-reflection grating formed by the micromirror array.
5. The illumination optical unit according to claim 1 , wherein the micromirror array comprises micromirrors which are configured to be adjustable continuously within a tilting angle range.
6. The illumination optical unit according to claim 5 , wherein the beam path of the illumination light onto the at least one micromirror array and the at least one micromirror array are configured in such a way
that the illumination light upon a first micromirror impingement is reflected by micromirrors of the micromirror array whose tilting angle driving is effected in a first tilting angle operating point range,
that the illumination light upon a second micromirror impingement is reflected by micromirrors of the micromirror array whose tilting angle driving is effected in a second tilting angle operating point range,
wherein the first tilting angle operating point range differs from the second tilting angle operating point range.
7. The illumination optical unit according to claim 6 , wherein the beam path of the illumination light onto the at least one micromirror array is configured in such a way
that the illumination light upon a first micromirror impingement is reflected with a first reflectivity range by micromirrors of the micromirror array,
that the illumination light upon a second micromirror impingement is reflected with at least one second reflectivity range by micromirrors of the micromirror array,
wherein the first reflectivity range differs from the second reflectivity range.
8. The illumination optical unit according to claim 7 , wherein at least one of the reflectivity ranges covers a reflectivity in the range of between 30% and 60%.
9. The illumination optical unit of claim 1 in which the illumination light passes through a filter stop after the illumination light is directed away from the at least one region of the micromirror array, but before the illumination light is subsequently redirected toward the at least one region of the micromirror array.
10. The illumination optical unit of claim 9 in which the filter stop is configured to select a zero order of diffraction of the illumination light.
11. The illumination optical unit of claim 1 in which the illumination light impinges on a first region of the micromirror array at the first time and impinges on a second region of the micromirror array at the at least the second time, and the first region overlaps the second region.
12. The illumination optical unit of claim 1 in which the illumination light impinges on a first region of the micromirror array at the first time and impinges on a second region of the micromirror array at the at least the second time, and the first region does not overlap the second region.
13. An illumination optical unit for illuminating objects to be examined by a metrology system with illumination light, comprising:
an optical pupil influencing assembly for influencing an intensity distribution of the illumination light over a pupil of the illumination optical unit,
wherein the pupil influencing assembly comprises at least one micromirror array,
wherein the at least one micromirror array for pupil influencing comprises a diffraction-reflection grating for the illumination light,
wherein the at least one micromirror array is configured to be driven in such a way that it is operated in the at least second used order of diffraction for the illumination light, and a downstream spatial filter stop arranged in a beam path downstream of the at least one micromirror array is arranged in a direction that corresponds to a diffraction direction of the second or higher used order of diffraction.
14. The illumination optical unit of claim 13 in which the at least one micromirror array for pupil shaping comprises a diffraction-reflection grating for the illumination light.
15. The illumination optical unit of claim 13 in which the micromirror array comprises micromirrors that are configured to be adjustable continuously within a tilting angle range.
16. An illumination optical unit for illuminating objects to be examined by a metrology system with illumination light, comprising:
an optical pupil influencing assembly for influencing an intensity distribution of the illumination light over a pupil of the illumination optical unit,
wherein the pupil influencing assembly comprises at least one micromirror array,
wherein illumination light impinges on a first used region of the at least one micromirror array, is reflect from the first used region of the at least one micromirror array, and the light reflected from the first used region is subsequently redirected toward at least a second used region of the at least one micromirror array, and the first used region and the at least the second used region are arranged in a manner spatially separated from one another,
wherein at least one micromirror array region on which illumination light does not impinge is arranged between two neighboring used micromirror array regions from among the used micromirror array regions arranged in a manner spatially separated from one another.
17. The illumination optical unit according to claim 16 , wherein the at least one micromirror array region on which illumination light does not impinge comprises an exchange micromirror array region, wherein the beam path of the illumination light is configured such that it is displaceable relative to the at least one micromirror array to enable a change of an illumination light impingement between at least one used micromirror array region and at least one assigned exchange micromirror array region to be carried out.
18. The illumination optical unit of claim 16 in which the illumination light passes through a filter stop after the illumination light is directed away from the first used region of the at least one micromirror array, but before the illumination light is redirected toward the at least the second used region of the at least one micromirror array.
19. The illumination optical unit of claim 18 in which the filter stop is configured to select a zero order of diffraction of the illumination light.
20. The illumination optical unit of claim 16 in which the beam path of the illumination light onto the at least one micromirror array are configured in such a way
that the illumination light upon a first micromirror impingement is reflected by micromirrors of the first used region of the micromirror array whose tilting angle driving is effected in a first tilting angle operating point range,
that the illumination light upon a second micromirror impingement is reflected by micromirrors of the at least the second used region of the micromirror array whose tilting angle driving is effected in a second tilting angle operating point range, wherein the first tilting angle operating point range differs from the second tilting angle operating point range.