IP Library Granted Patent US 10,700,095
Granted Patent B2
US 10,700,095 · App. 16/228,319 · Granted Jun 30, 2020

Semiconductor integrated circuit device

Inventors: Toshio Hino (Yokohama, JP); Junji Iwahori (Yokohama, JP)
Assignee: SOCIONEXT INC.
H01L27/11807B82Y10/00H01L21/823821H01L21/823828H01L27/0207H01L27/0924H01L29/0673H01L29/0696H01L29/0847H01L29/1079H01L29/4238H01L29/42392H01L29/775H01L29/78696H01L2027/11864H01L2027/11874
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Quick Facts
Patent No.
US 10,700,095
App. No.
16/228,319
Granted
Jun 30, 2020
Kind
B2
Abstract

A semiconductor integrated circuit device including standard cells including fin transistors includes, at a cell row end, a cell-row-terminating cell that does not contribute to a logical function of a circuit block. The cell-row-terminating cell includes a plurality of fins extending in an X direction. Ends of the plurality of fins on the inner side of the circuit block are near a gate structure placed at a cell end and do not overlap with the gate structure in a plan view, and ends of the plurality of fins on an outer side of the circuit block overlap with any one of a gate structure in a plan view.

Claims (49)

1. A semiconductor integrated circuit device comprising

a circuit block having a plurality of cell rows each having a plurality of cells arranged in a first direction, the cell rows being arranged in a second direction perpendicular to the first direction, wherein

in the circuit block, at least one of the cell rows includes, at at least one end thereof, a cell-row-terminating cell that does not contribute to a logical function of the circuit block,

the cell-row-terminating cell includes:

a plurality of fins extending in the first direction; and

a plurality of gate structures extending in the second direction and including a first gate structure placed at a cell end on an inner side of the circuit block, and

ends of the plurality of fins on the inner side of the circuit block do not overlap with the first gate structure in a plan view, and

ends of the plurality of fins on an outer side of the circuit block overlap with any one of the gate structures other than the first gate structure in a plan view.

2. The semiconductor integrated circuit device of claim 1 , wherein

a first cell adjacent to the cell-row-terminating cell on the inner side of the circuit block includes a plurality of first fins extending in the first direction, and

the first fins face the respective fins of the cell-row-terminating cell, and distances between the first fins and the fins facing the first fins are equal.

3. The semiconductor integrated circuit device of claim 1 , wherein

the cell rows each include the cell-row-terminating cells at both ends thereof.

4. The semiconductor integrated circuit device of claim 1 , wherein

the plurality of gate structures include a second gate structure placed at a cell end on the outer side of the circuit block, and

ends of the plurality of fins on the outer side of the circuit block overlap with the second gate structure in a plan view.

5. The semiconductor integrated circuit device of claim 1 , wherein

the circuit block includes a rectangular area including a plurality of cell rows each having a first end and a second end, the first ends of the cell rows in the first direction being aligned, the second ends of the cell rows in the first direction being aligned,

the cell-row-terminating cell includes a plurality of cell-row-terminating cells, and

the cell-row-terminating cells each arranged at one end of an associated one of the cell rows in the rectangular area include a plurality of kinds of cells having different cell widths, the cell widths corresponding to a cell dimension in the first direction.

6. The semiconductor integrated circuit device of claim 5 , wherein

the plurality of kinds of cells include first cell-row-terminating cells, and second cell-row-terminating cells having a cell width that is different from that of the first cell-row-terminating cells, and

the second cell-row-terminating cells are arranged at every certain number of cell rows.

7. The semiconductor integrated circuit device of claim 5 , wherein

a first cell adjacent to the cell-row-terminating cell on the inner side of the circuit block includes a plurality of first fins extending in the first direction, and

the first fins face the respective fins of the cell-row-terminating cell, and distances between the first fins and the fins facing the first fins are equal.

8. The semiconductor integrated circuit device of claim 5 , wherein

the cell rows included in the rectangular area each include the cell-row-terminating cells at both ends thereof.

9. The semiconductor integrated circuit device of claim 5 , wherein

the plurality of gate structures include a second gate structure placed at a cell end on the outer side of the circuit block, and

ends of the plurality of fins on the outer side of the circuit block overlap with the second gate structure in a plan view.

10. A semiconductor integrated circuit device comprising

a circuit block having a plurality of cell rows each having a plurality of cells arranged in a first direction, the cell rows being arranged in a second direction perpendicular to the first direction, wherein

the circuit block includes a rectangular area including a plurality of cell rows each having a first end and a second end, the first ends of the cell rows in the first direction being aligned, the second ends of the cell rows in the first direction being aligned,

a plurality of cell-row-terminating cells that do not contribute to a logical function of the circuit block are each disposed in one end of an associated one of the cell rows included in the rectangular area,

the cell-row-terminating cells each include:

a plurality of nanowires extending in the first direction;

a plurality of pads connected to the nanowires; and

a plurality of gate structures extending in the second direction and including a first gate structure placed at a cell end on an inner side of the circuit block, and

ends of the plurality of pads on the inner side of the circuit block do not overlap with the first gate structure in a plan view, and

the cell-row-terminating cells include a plurality of kinds of cells having different cell widths, the cell widths corresponding to a cell dimension in the first direction.

11. The semiconductor integrated circuit device of claim 10 , wherein

a first cell adjacent to the cell-row-terminating cell on the inner side of the circuit block includes a plurality of first nanowires extending in the first direction and a plurality of first pads connected to the first nanowires, and

the first pads face the respective pads of the cell-row-terminating cell, and distances between the first pads and the pads facing the first pads are equal.

12. The semiconductor integrated circuit device of claim 10 , wherein

the cell rows each include the cell-row-terminating cells at both ends thereof.

13. The semiconductor integrated circuit device of claim 10 , wherein

the plurality of kinds of cells include first cell-row-terminating cells, and second cell-row-terminating cells having a cell width that is different from that of the first cell-row-terminating cells, and

the second cell-row-terminating cells are arranged at every certain number of cell rows.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 20, 2018
From: HINO, TOSHIO; IWAHORI, JUNJI
To: SOCIONEXT INC.
Reel/Frame 047836/0148 →
Priority Claims (1)
JP 2016-131372 · Jul 1, 2016 · national
Continuity (2)
Continuation PCTJP2017022878 · Jun 21, 2017
Related Publication 20190123063A1 · Apr 25, 2019
Cited By (1)
US 12,205,953