Apparatus and method for processing particulate matter
An apparatus and method for processing particulate matter by exposing the particulate matter to successive surface reactions of at least a first and a second gaseous precursor according to the principles of atomic layer deposition. The apparatus includes a vacuum chamber, a reaction chamber for particulate matter, wherein the reaction chamber is provided inside the vacuum chamber, a vibration mechanism for vibrating particulate matter inside the reaction chamber; and a precursor system arranged to supply the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors. The method includes the steps of supplying the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors, and vibrating particulate matter inside the reaction chamber.
1. An apparatus for processing particulate matter by exposing the particulate matter to successive surface reactions of at least a first and a second gaseous precursor according to the principles of atomic layer deposition, the apparatus comprising:
a vacuum chamber;
a reaction chamber for particulate matter, the reaction chamber provided inside the vacuum chamber;
a vibration mechanism for vibrating particulate matter inside the reaction chamber; and
a precursor system arranged to supply the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors, the precursor system comprises an inlet and said precursor system is arranged outside the vacuum chamber such that the inlet is arranged to go through the vacuum chamber and to the reaction chamber, wherein the reaction chamber is arranged inside the vacuum chamber such that the reaction chamber and the vacuum chamber are mechanically separated from each other, and such that vibration of the vacuum chamber is prevented.
2. The apparatus according to claim 1 , wherein the vibration mechanism is operatively connected to the apparatus and arranged to vibrate at least a part of the apparatus for vibrating particulate matter inside the reaction chamber.
3. The apparatus according to claim 1 , wherein the vibration mechanism is operatively connected to the reaction chamber for vibrating the reaction chamber.
4. The apparatus according to claim 1 , wherein the reaction chamber is connected to the vibration mechanism arranged outside of the vacuum chamber.
5. The apparatus according to claim 1 , wherein the reaction chamber and the vacuum chamber are connected together through at least one damping element that is arranged to prevent vibrations transferring to the vacuum chamber.
6. The apparatus according to claim 1 , wherein the vacuum chamber comprises at least one heater arranged between the inner walls of the vacuum chamber and the outer walls of the reaction chamber for indirect heating of the particulate matter inside the reaction chamber.
7. The apparatus according to claim 1 , wherein the vacuum chamber comprises at least one heater arranged on an inner ceiling of the vacuum chamber for indirect heating of the reaction chamber.
8. The apparatus according to claim 1 , wherein the apparatus further comprises a pressure device arranged to provide at least one of a first pressure in the vacuum chamber or a second pressure in the reaction chamber, wherein the first pressure is higher than the second pressure.
9. The apparatus according to claim 1 , wherein the precursor system comprises an inlet arranged to supply the gaseous precursors to the reaction chamber and an outlet arranged to discharge the gaseous precursors from the reaction chamber.