IP Library Granted Patent US 11,021,572
Granted Patent B2
US 11,021,572 · App. 16/320,889 · Granted Jun 1, 2021

Photosensitive resin composition, cured product of same, interlayer insulating film, surface protective film and electronic component

Inventors: Ayaka Azuma (Hitachi, JP); Satoshi Abe (Hitachi, JP); Kazuya Soejima (Hitachi, JP); Masato Nishimura (Tokyo, JP); Tadamitsu Nakamura (Hitachi, JP)
Assignee: HD MICROSYSTEMS, LTD.
C08G73/10C08G73/1071C08G73/22G03F7/023G03F7/0226G03F7/0233G03F7/0387G03F7/085
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Quick Facts
Patent No.
US 11,021,572
App. No.
16/320,889
Granted
Jun 1, 2021
Kind
B2
Abstract

Provided is a photosensitive resin composition containing; (A) a polymer having an acidic functional group or a substituent derived therefrom; (B) a photoreactive compound; (C) a solvent; and (D) a nitrogen-containing aromatic compound represented by the following general formula (1).

Claims (14)

1. A photosensitive resin composition, comprising:

(A) polybenzoxazole precursor;

(B) a photoreactive compound;

(C) a solvent;

(D) a nitrogen-containing aromatic compound represented by the following general formula (1):

(wherein, R 1 is a hydrogen atom or a hydrocarbon group, R 2 is a hydrogen atom, an amino group, an alkyl group, an alkenyl group, a cyclic aliphatic group having 3 to 10 carbon atoms or a phenyl group, and A, B, and E are each independently N or CR 3 ; R 3 is a hydrogen atom or a monovalent organic group; and when a plurality of R 3 exist, the plurality of R 3 may be identical to or different from each other); and

(F) one or more selected from the group consisting of a melamine, and a melamine in which a site in an N position is substituted by a methylol group or an alkoxymethyl group.

2. The photosensitive resin composition according to claim 1 , wherein the polybenzoxazole precursor has a structural unit represented by the following general formula (2-1) and a structural unit represented by the following general formula (2-2):

(wherein, X and T are each independently a divalent organic group, and X is a group different from T; Y is a tetravalent organic group, and R is each independently a hydrogen atom or a monovalent organic group; and I and m are a mole fraction, and when a sum of I and m is taken as 100 mol %, I is 60 to 100 mol % and m is 0 to 40 mol %).

3. The photosensitive resin composition according to claim 1 , wherein the component (D) is a compound having a triazole skeleton or a tetrazole skeleton.

4. A cured product of the photosensitive resin composition according to claim 1 .

5. An interlayer insulating film or a surface protective film, using the cured product according to claim 4 .

6. An electronic component, comprising the interlayer insulating film according to claim 5 .

7. An electronic component, comprising the surface protective film according to claim 5 .

Assignments (2)
CHANGE OF NAME Recorded Mar 8, 2021
From: HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
To: HD MICROSYSTEMS, LTD.
Reel/Frame 057088/0450 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 1, 2019
From: AZUMA, AYAKA; ABE, SATOSHI; SOEJIMA, KAZUYA; NISHIMURA, MASATO; NAKAMURA, TADAMITSU
To: HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
Reel/Frame 049643/0332 →
Priority Claims (1)
JP JP2016-147805 · Jul 27, 2016 · national
Continuity (1)
Related Publication 20190161580A1 · May 30, 2019