Reduced transistor resistance using doped layer
An embodiment includes a transistor comprising: first, second, and third layers each including a group III-V material; a channel included in the second layer, which is between the first and third layers; and a gate having first and second gate portions; wherein (a)(i) the first and third layers are doped, (a)(ii) the channel is between the first and second gate portions and the second gate portion is between the channel and a substrate, (a)(iii) a first axis intersects the first, second, and third layers but not the first gate portion, and (a)(iv) a second axis, parallel to the first axis, intersects the first and second gate portions and the channel. Other embodiments are described herein.
1. A transistor comprising:
first, second, and third layers each including a group III-V material;
a channel included in the second layer, which is between the first and third layers; and
a gate having first and second gate portions;
wherein: (a)(i) the first and third layers are doped, (a)(ii) the channel is between the first and second gate portions and the second gate portion is between the channel and a substrate, (a)(iii) a first axis intersects the first, second, and third layers but not the first gate portion, and (a)(iv) a second axis, parallel to the first axis, intersects the first and second gate portions and the channel.
2. The transistor of claim 1 wherein the second axis does not intersect the first and third layers.
3. The transistor of claim 2 wherein:
the second layer includes a first half and a second half between the first half and the substrate; and
the third layer does not extend to a height that is between any portion of the second half and the substrate.
4. The apparatus of claim 3 comprising a dielectric layer that includes a trench; wherein (b)(i) the trench comprises the first and second layers, and (b)(ii) second and third materials, which are respectively included in the second and third layers, have the same chemical elements irrespective of doping elements included in the third layer.
5. A system comprising:
a memory; and
a processor coupled to the memory,
wherein at least one of the processor or the memory includes a transistor according to claim 1 .
6. An apparatus comprising:
a substrate;
a first layer including a doped first material that includes at least one of a group III-V material, a group IV material, or combinations thereof;
a second layer including a second material that includes at least one of a group III-V material, a group IV material, or combinations thereof;
a third layer including a doped third material that includes at least one of a group III-V material, a group IV material, or combinations thereof; and
a first gate portion;
wherein: (a)(i) a first axis intersects the first, second, and third layers but not the first gate portion, (a)(ii) a second axis, parallel to the first axis, intersects the first gate portion and a channel, which is included in the second layer and which includes the second material, but does not intersect the first and third layers.
7. The apparatus of claim 6 including a second gate portion between the channel and the substrate; wherein the second axis intersects the second gate portion.
8. The apparatus of claim 7 wherein:
the second layer includes a first half and a second half that is between the first half and the substrate;
a third axis, orthogonal to the second axis, intersects the first half and the third material included in the third layer; and
a fourth axis, parallel to the third axis, intersects the second half but does not intersect the third material included in the third layer.
9. The apparatus of claim 8 wherein:
the second and third materials have the same chemical elements irrespective of doping elements included in the third layer; and
the second and third layers are not monolithic with each other.
10. The apparatus of claim 9 wherein one of the first or second materials includes a chemical element that is not present in another of the first or second materials irrespective of doping elements included in the first layer.
11. The apparatus of claim 7 wherein:
the second layer includes a first surface and a second surface between the first surface and the substrate; and
the third layer does not extend to a height that is between the first and second surfaces.
12. The apparatus of claim 8 wherein the second layer is included in a nanowire and the first and second gate portions are included in a gate-all-around (GAA) gate.
13. The apparatus of claim 8 wherein the first layer has a height, defined by the first axis, of at least 1 nm.
14. The apparatus of claim 8 wherein the first layer has a height, defined by the first axis, of no more than 1 nm.
15. The apparatus of claim 8 comprising source and drain nodes included within the third layer and each including the third material.
16. The apparatus of claim 8 wherein:
a fifth axis, parallel to the third axis, separates the first half from the second half; and
the third layer does not extend to a height that is between the fourth and fifth axes.
17. The apparatus of claim 16 comprising a dielectric layer that includes a trench, wherein the first and second layers are included in the trench.
18. The apparatus of claim 17 comprising a fourth layer between the substrate and the first layer and a fifth layer between first and second layers; wherein the first axis intersects the fourth and fifth layers.
19. The apparatus of claim 8 wherein the first layer directly contacts the second layer.
20. A method comprising:
forming a dielectric layer on a substrate;
forming a trench within the dielectric layer;
forming a first layer within the trench, the first layer including a doped first material that includes at least one of a group III-V material, a group IV material, or combinations thereof;
forming a second layer within the trench and on the first layer, the second layer including a second material that includes at least one of a group III-V material, a group IV material, or combinations thereof;
forming a first gate portion on the second layer;
forming a third layer on the second layer, the third layer including a doped third material that includes at least one of a group III-V material, a group IV material, or combinations thereof; and
removing a portion of the first layer to form a void;
wherein: (a)(i) a first axis intersects the first, second, and third layers but not the first gate portion, (a)(ii) a second axis, parallel to the first axis, intersects the first gate portion and a channel, which includes the second material, but does not intersect the first and third layers.
21. The method of claim 20 comprising forming a second gate portion within the void and between the channel and the substrate; wherein the second axis intersects the second gate portion.
22. The method of claim 21 comprising removing a portion of the second layer to form an additional void and forming the third layer within the additional void.
23. The method of claim 22 wherein:
the second layer includes a first half and a second half between the first half and the substrate; and
the third layer does not extend to a height that is between any portion of the second half and the substrate.