Lens contamination prevention device and method
View Patent ↗A lens anti-contamination device is disclosed, including a first device ( 300 ) and a second device ( 400 ) connected to the first device ( 300 ), the first device ( 300 ) being closer to a lens ( 100 ) relative to the second device ( 400 ), wherein the first device ( 300 ) is used to output protective layer gas, and the protective layer gas is enabled to uniformly flow in close contact with the lower surface of the lens ( 100 ) through a nozzle ( 330 ), such that the contaminated lens ( 100 ) can be cleaned and a protective layer is funned to prevent the lens from being contaminated again; the second device ( 400 ) is used to take away gas close to a contamination source, and the contamination gas enters an annular cavity ( 420 ) through small holes ( 410 ) and is exhausted into a distant environment through the suction and exhaust power of an exhaust passage ( 200 ). A lens anti-contamination method is also disclosed. Before exposure, the first device ( 300 ) is turned on and then the second device ( 400 ) is turned on; and after 12 hours after exposure, the second device ( 400 ) may be turned off. This device and method can better solve the problem that organic matters in photoresist are volatilized and contaminate the lens, it is simple to mount, the service life is long, the cost is low, the reliability is high, and it guarantees that contaminants are fully removed without entering the object lens.
1. An anti-contamination device for a lens, comprising a first device and a second device connected to the first device, the first device being closer to the lens relative to the second device, wherein
the first device is configured to output a protective layer gas to form a gas curtain protective layer on a surface of the lens;
the second device is configured to suck and exhaust the protective layer gas and/or a contamination gas;
the second device comprises an annular cavity; and
a lower surface of the annular cavity is provided with a plurality of holes.
2. The anti-contamination device for a lens according to claim 1 , further comprising an exhaust passage, wherein the first device and the second device are each connected to the exhaust passage.
3. The anti-contamination device for a lens according to claim 2 , wherein the exhaust passage is connected with a suction and exhaust power.
4. The anti-contamination device for a lens according to claim 1 , wherein the protective layer gas is a gas with a purity up to or higher than 99.999%.
5. The anti-contamination device for a lens according to claim 1 , wherein the first device comprises a closed container.
6. The anti-contamination device for a lens according to claim 5 , wherein the closed container is provided with a gas inlet and a nozzle, and wherein the protective layer gas enters the closed container through the gas inlet and is output through the nozzle.
7. The anti-contamination device for a lens according to claim 1 , wherein distances between the plurality of small holes are equal.
8. An anti-contamination method for a lens, using the anti-contamination device for a lens according to claim 1 , comprising:
step 1: outputting, by a first device, a protective layer gas from a position close to a lower surface of the lens, such that a gas curtain protective layer is formed on a surface of the lens; and
step 2: sucking, by a second device, the protective layer gas and/or a contamination gas from a position close to a contamination source, and exhausting the protective layer gas and/or the contamination gas into an environment away from the lens.
9. The anti-contamination method for a lens according to claim 8 , wherein the lens is a lens of a lithography machine, and in step 1, the output of the protective layer gas is continuously performed before and after exposure of the lithography machine.
10. The anti-contamination method for a lens according to claim 8 , wherein the lens is a lens of a lithography machine, and in step 2, the suction and exhaust of the protective layer gas and/or the contamination gas are continuously performed during and after exposure of the lithography machine.