Low-VOC cleaning substrates and compositions
A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
1. A cleaning composition consisting of:
i. about 0.05-5% by weight of one or more cationic biocides;
ii. about 0.01-5% by weight of one or more alkyl polyglycoside nonionic surfactants;
iii. about 0.05-10% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof;
iv. about 0.05-10% by weight of a second solvent selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;
v. at least about 90% by weight of water; and
vi. optionally, one or more adjuncts selected from the group consisting of: buffers, fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, dyes, colorants, additional solvents and preservatives.
2. The cleaning composition as defined in claim 1 , wherein the composition includes a buffer.
3. The cleaning composition as defined in claim 1 , wherein the composition includes a fragrance.
4. The cleaning composition as defined in claim 1 , wherein said cationic biocide includes a quaternary ammonium compound.
5. The cleaning composition as defined in claim 1 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol.
6. The cleaning composition as defined in claim 1 , wherein the second solvent includes an alcohol.
7. A cleaning composition consisting of:
i. about 0.05-5% by weight of one or more quaternary ammonium compounds;
ii. about 0.01-5% by weight of an alkyl polyglycoside surfactant;
iii. about 0.05-10% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof;
iv. about 0.05-10% by weight of a second solvent selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;
v. about 0.001-1% by weight of a buffer;
vi. at least about 90% by weight of water; and
vii. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, additional solvents and preservatives.
8. The cleaning composition as defined in claim 7 , wherein the buffer is monoethanolamine.
9. The cleaning composition as defined in claim 7 , wherein the composition includes a fragrance.
10. The cleaning composition as defined in claim 7 , wherein said one or more quaternary ammonium compounds comprises at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride.
11. The cleaning composition as defined in claim 7 , wherein said one or more quaternary ammonium compounds is present in the cleaning composition in an amount from about 0.05-2% by weight.
12. The cleaning composition as defined in claim 7 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol.
13. The cleaning composition as defined in claim 7 , wherein the second solvent includes an alcohol.
14. The cleaning composition as defined in claim 7 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol and wherein the second solvent includes an alcohol.
15. A cleaning composition consisting of:
i. about 0.05-5% by weight of one or more quaternary ammonium compounds,
ii. about 0.01-5% by weight of an alkyl polyglycoside surfactant;
iii. about 0.05-5% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof,
iv. about 0.05-10% by weight of a second solvent that is one or more alcohols;
v. one or more buffers;
vi. one or more fragrances;
vii. at least 90% by weight of water; and
vi. optionally, one or more adjuncts selected from the group consisting of: hydrotropes, defoamers, enzymes, bleaching agents, dyes, colorants, additional solvents and preservatives.
16. The cleaning composition as defined in claim 15 , wherein said buffer is monoethanolamine.
17. The cleaning composition as defined in claim 15 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol.
18. The cleaning composition as defined in claim 15 , wherein said one or more quaternary ammonium compounds includes at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride.
19. The cleaning composition as defined in claim 15 , wherein said second solvent is ethanol.