Semiconductor package structure, product and method for manufacturing the same
A semiconductor package structure includes a substrate, a semiconductor sensor, a lid and an air-permeable film. The semiconductor sensor is disposed on the substrate. The lid covers the semiconductor sensor and defines a through hole. The air-permeable film covers the through hole of the lid and has a first surface. The first surface is hydrophilic.
1. A semiconductor package structure, comprising:
a substrate;
a semiconductor sensor disposed on the substrate;
a lid covering the semiconductor sensor and defining a through hole; and
an air-permeable film covering the through hole of the lid and having a first surface, wherein the first surface is hydrophilic.
2. The semiconductor package structure of claim 1 , wherein the air-permeable film is made of a hydrophobic material, and the first surface of the air-permeable film is hydrophilic-modified.
3. The semiconductor package structure of claim 2 , wherein the air-permeable film is made of polytetrafluoroethene (PTFE), expanded PTFE (ePTFE), polychlorotrifluoroethylene (PCTFE), perfluoroalkoxy (PFA) or tetrafluorethylene-perfluoropropylene (FEP).
4. The semiconductor package structure of claim 1 , further comprising an ink layer covering the air-permeable film.
5. The semiconductor package structure of claim 4 , wherein the ink layer is formed on the first surface of the air-permeable film.
6. The semiconductor package structure of claim 4 , wherein the ink layer defines at least one opening to expose at least one portion of the first surface of the air-permeable film.
7. The semiconductor package structure of claim 6 , wherein the at least one opening of the ink layer includes a first opening corresponding to the through hole of the lid.
8. The semiconductor package structure of claim 6 , wherein the at least one opening of the ink layer includes a second opening having a shape of a symbol.
9. The semiconductor package structure of claim 8 , wherein a size of the symbol is equal to or smaller than about 0.4 mm*0.3 mm.
10. The semiconductor package structure of claim 8 , wherein the symbol includes two segments spaced apart by a gap, and a width of the gap is less than a line width of one of the segments.
11. The semiconductor package structure of claim 4 , wherein the ink layer has a marking area, and a size of the marking area is equal to or smaller than about 0.4 mm*1.6 mm.
12. The semiconductor package structure of claim 4 , wherein the first surface of the air-permeable film has a hydrophilic functional group.
13. The semiconductor package structure of claim 12 , wherein the hydrophilic functional group includes a C═O bond.
14. The semiconductor package structure of claim 13 , wherein the ink layer is formed on the C═O bond.
15. The semiconductor package structure of claim 4 , wherein the ink layer is formed of a UV curable ink.
16. A product, comprising:
an object having a surface and made of a hydrophobic material; and
an ink layer formed on the surface of the object and defining an opening to expose a portion of the surface of the object, wherein the exposed portion of the surface of the object is in a shape of a symbol.
17. The product of claim 16 , wherein the object is made of a hydrophobic fluoropolymer, and the surface of the object is hydrophilic-modified.
18. The product of claim 16 , wherein the surface of the object has a hydrophilic functional group.
19. The product of claim 18 , wherein the hydrophilic functional group includes a C═O bond.
20. The product of claim 19 , wherein the ink layer is formed on the C═O bond.