IP Library Granted Patent US 10,790,390
Granted Patent B2
US 10,790,390 · App. 16/377,026 · Granted Sep 29, 2020

Method and apparatus for use in improving linearity of MOSFETs using an accumulated charge sink-harmonic wrinkle reduction

Inventors: Christopher N. Brindle (Poway, CA); Jie Deng (South Burlington, VT); Alper Genc (San Diego, CA); Chieh-Kai Yang (Poway, CA)
Assignee: pSemi Corporation
H01L29/7841H01L27/1203H01L28/00H01L29/0649H01L29/0688H01L29/0847H01L29/1087H01L29/1095H01L29/36H01L29/4908H01L29/78615H01L29/78654H01L29/78657H03K17/162
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Quick Facts
Patent No.
US 10,790,390
App. No.
16/377,026
Granted
Sep 29, 2020
Kind
B2
Abstract

A method and apparatus for use in improving linearity sensitivity of MOSFET devices having an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to address degradation in second- and third-order intermodulation harmonic distortion at a desired range of operating voltage in devices employing an accumulated charge sink.

Claims (42)

1. An RF module comprising: at least one integrated circuit chip;

the at least one integrated circuit chip included in the RF module and further including at least one field effect transistor, the at least one field effect transistor including a gate, a drain, a source, and a body;

wherein, during at least a portion of an off state, the body of the at least one field effect transistor is to be electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor;

wherein the body of the at least one field effect transistor is electrically coupled to at least two accumulated charge sinks; and

wherein the at least two accumulated charge sinks are coupled through a path having low impedance.

2. The RF module of claim 1 , wherein the at least one field effect transistor comprises an N-type metal oxide semiconductor (NMOS) field effect transistor.

3. The RF module of claim 1 , wherein the at least one field effect transistor is implemented in a silicon on insulator technology.

4. The RF module of claim 1 , wherein the voltage level substantially more negative than the lowest voltage level is more than one volt more negative than the lowest voltage level.

5. The RF module of claim 1 , wherein, the body of the at least one field effect transistor is electrically coupled to the at least two accumulated charge sinks so as to remove or otherwise control, via the at least two accumulated charge sinks, charge that, without the body being electrically biased, would accumulate in the body of the at least one field effect transistor.

6. The RF module of claim 1 , wherein the at least one field effect transistor during the at least a portion of the off state is to be electrically biased so as to improve the linearity of the at least one field effect transistor relative to the at least one field effect transistor not electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor.

7. The RF module of claim 1 , wherein the at least one field effect transistor during the at least a portion of the off state is to be electrically biased so as to reduce non-linear harmonic and/or intermodulation distortion of RF signals to be propagated by the RF module, reduction via the at least one field effect transistor being relative to the at least one field effect transistor not electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor.

8. The RF module of claim 7 , wherein the power of a third harmonic of the RF signals to be propagated via the RF module is to be lower than −30dBm at an operating power of +35dBm power.

9. The RF module of claim 1 , wherein the at least one field effect transistor is included in a stack of field effect transistors included in an RF switch, the RF switch being included in the at least one integrated circuit chip.

10. The RF module of claim 1 , wherein the at least two accumulated charge sinks comprise more than two accumulated charge sinks and wherein the more than two accumulated charge sinks are coupled through paths having low impedance.

11. A communication device comprising: at least one integrated circuit chip;

the at least one integrated circuit chip included in the communication device and further including an RF switch comprising at least one field effect transistor, the at least one field effect transistor including a gate, a drain, a source, and a body;

wherein, during at least a portion of an off state, the body of the at least one field effect transistor is to be electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor;

wherein the body of the at least one field effect transistor is electrically coupled to at least two accumulated charge sinks; and

wherein the at least two accumulated charge sinks are coupled through a path having low impedance.

12. The communication device of claim 11 , wherein the at least one field effect transistor comprises an N-type metal oxide semiconductor (NMOS) field effect transistor.

13. The communication device of claim 11 , wherein the at least one field effect transistor is implemented in a silicon on insulator technology.

14. The communication device of claim 11 , wherein the voltage level substantially more negative than the lowest voltage level is more than one volt more negative than the lowest voltage level.

15. The communication device of claim 11 , wherein the body of the at least one field effect transistor is electrically coupled to the at least two accumulated charge sinks so as to remove or otherwise control, via the at least two accumulated charge sinks, charge that, without the body being electrically biased, would accumulate in the body of the at least one field effect transistor.

16. The communication device of claim 11 , wherein the at least one field effect transistor during the at least a portion of the off state is to be electrically biased so as to improve the linearity of the at least one field effect transistor relative to the at least one field effect transistor not electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor.

17. The communication device of claim 11 , wherein the at least one field effect transistor during the at least a portion of the off state is to be electrically biased so as to reduce non-linear harmonic and/or intermodulation distortion of RF signals to be propagated by the communication device, reduction via the at least one field effect transistor being relative to the at least one field effect transistor not electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor.

18. The communication device of claim 17 , wherein the power of a third harmonic of the RF signals to be propagated via the RF switch is to be lower than—30dBm at an operating power of +35dBm power.

19. The communication device of claim 11 , wherein the at least one field effect transistor is included in a stack of field effect transistors included in an RF switch, the RF switch being included in the at least one integrated circuit chip.

20. The communication device of claim 11 , wherein the at least two accumulated charge sinks comprise more than two accumulated charge sinks and wherein the more than two accumulated charge sinks are coupled through paths having low impedance.

21. An RF front-end comprising: at least one integrated circuit chip and other RF front-end components;

the at least one integrated circuit chip and other RF front-end components included in the RF front-end, the at least one integrated circuit chip further including at least one field effect transistor, the at least one field effect transistor including a gate, a drain, a source, and a body;

wherein, during at least a portion of an off state, the body of the at least one field effect transistor is to be electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor;

wherein, during the at least a portion of the off state in which the body of the at least one field effect transistor is to be electrically biased, the body of the at least one field effect transistor is further to be electrically coupled to at least two accumulated charge sinks; and

wherein the at least two accumulated charge sinks are coupled through a path having low impedance.

22. The RF front-end of claim 21 , wherein the at least one field effect transistor comprises an N-type metal oxide semiconductor (NMOS) field effect transistor.

23. The RF front-end of claim 21 , wherein the at least one field effect transistor is implemented in a silicon on insulator technology.

24. The RF front-end of claim 21 , wherein the voltage level substantially more negative than the lowest voltage level is more than one volt more negative than the lowest voltage level.

25. The RF front-end of claim 21 , wherein the body of the at least one field effect transistor is electrically coupled to the at least two accumulated charge sinks so as to remove or otherwise control, via the at least two accumulated charge sinks, charge that, without the body being electrically biased, would accumulate in the body of the at least one field effect transistor.

26. The RF front-end of claim 21 , wherein the at least one field effect transistor during the at least a portion of the off state is to be electrically biased so as to improve the linearity of the at least one field effect transistor relative to the at least one field effect transistor not electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor.

27. The RF front-end of claim 21 , wherein the at least one field effect transistor during the at least a portion of the off state is to be electrically biased so as to reduce non-linear harmonic and/or intermodulation distortion of RF signals to be propagated by the communication device, reduction via the at least one field effect transistor being relative to the at least one field effect transistor not electrically biased to have a voltage level substantially more negative than the lowest voltage level of the following: ground, the DC voltage level of the source of the at least one field effect transistor, and the DC voltage level of the drain of the at least one field effect transistor.

28. The RF front-end of claim 27 , wherein the power of a third harmonic of the RF signals to be propagated via the RF front-end is to be lower than −30dBm at an operating power of +35dBm power.

29. The RF front-end of claim 21 , wherein the at least one field effect transistor is included in a stack of field effect transistors included in an RF switch, the RF switch being included in the at least one integrated circuit chip.

30. The RF front-end of claim 21 , wherein the at least two accumulated charge sinks comprise more than two accumulated charge sinks and wherein the more than two accumulated charge sinks are coupled through paths having low impedance.

Assignments (2)
CHANGE OF NAME Recorded Aug 27, 2019
From: PEREGRINE SEMICONDUCTOR CORPORATION
To: PSEMI CORPORATION
Reel/Frame 050182/0691 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 27, 2019
From: BRINDLE, CHRISTOPHER N.; DENG, JIE; GENC, ALPER; YANG, CHIEH-KAI
To: PEREGRINE SEMICONDUCTOR CORPORATION
Reel/Frame 050182/0801 →
Continuity (15)
Continuation 16046974 · Jul 26, 2018
Continuation 15693182 · Aug 31, 2017
Continuation 15354723 · Nov 17, 2016
Continuation 14804198 · Jul 20, 2015
Continuation 14198315 · Mar 5, 2014
Continuation 13277108 · Oct 19, 2011
Continuation In Part 13053211 · Mar 22, 2011
Division 11484370 · Jul 10, 2006
Continuation In Part 13028144 · Feb 15, 2011
Division 11520912 · Sep 14, 2006
Continuation In Part 11484370 · Jul 10, 2006
Provisional Application 61405165 · Oct 20, 2010
Provisional Application 60698523 · Jul 11, 2005
Provisional Application 60718260 · Sep 15, 2005
Related Publication 20190237579A1 · Aug 1, 2019
Cited By (3)
US 12,348,221 US 12,525,934 US 12,580,536