Techniques for MRAM MTJ top electrode connection

1. A method for manufacturing a memory device comprising:

forming a first masking layer disposed over a dielectric layer, wherein the first masking layer exhibits sidewalls defining an opening disposed above a magnetoresistive random-access memory (MRAM) cell located in an embedded memory region;

forming a first via opening within the dielectric layer above the MRAM cell;

forming a top electrode via layer over the MRAM cell and the dielectric layer, wherein a top surface of the top electrode via layer defines a recess above the MRAM cell; and

performing a first planarization process on the top electrode via layer to remove part of the top electrode via layer and define a top electrode via having a substantially flat top surface.

2. The method of claim 1 , wherein the recess is V-shaped.

3. The method of claim 2 , wherein a bottom most point of the recess is above a top surface of the dielectric layer.

4. The method of claim 1 , wherein performing the first planarization process causes the top surface of the top electrode via and a top surface of the dielectric layer to extend along a horizontal plane.

5. The method of claim 1 , wherein the MRAM cell comprises:

a bottom electrode;

a magnetic tunnel junction (MTJ), wherein a bottom surface of the MTJ is in direct contact with a top surface of the bottom electrode; and

a top electrode, wherein a bottom surface of the top electrode is in direct contact with a top surface of the MTJ, wherein a top surface of the top electrode is in direct contact with a bottom surface of the top electrode via.

6. The method of claim 5 , wherein the bottom surface of the MTJ is wider than the top surface of the top electrode via.

7. The method of claim 1 , further comprising:

forming an interlayer dielectric over the top electrode via and the dielectric layer;

forming a conductive via over the top electrode via within the interlayer dielectric; and

forming a conductive wire above the conductive via within the interlayer dielectric.

8. The method of claim 1 , further comprising:

forming the dielectric layer over an interconnect wire within a logic region;

removing the dielectric layer in the logic region;

forming an interlayer dielectric over the logic and memory array regions;

removing the interlayer dielectric over the memory array region, wherein a protrusion comprising a remnant of the interlayer dielectric remains between the logic and memory array regions; and

performing a second planarization process to remove the protrusion.

9. The method of claim 8 , further comprising:

forming a first conductive via over the interconnect wire within the interlayer dielectric in the logic region;

forming a first conductive wire within the interlayer dielectric above the first conductive via;

performing a third planarization process on the interlayer dielectric and the first conductive wire;

forming a second interlayer dielectric over the logic and memory array regions;

forming a second conductive via within the second interlayer dielectric over the first conductive wire while forming a third conductive via within the second interlayer dielectric over the top electrode via; and

forming a second conductive wire within the second interlayer dielectric over the second conductive via, while forming a third conductive wire within the second interlayer dielectric over the third conductive via.

10. The method of claim 9 , wherein after performing the third planarization process, a top surface of the interlayer dielectric, a top surface of the first conductive wire, the top surface of the top electrode via and a top surface of the dielectric layer are aligned and meet at a substantially level horizontal line.

11. A method for manufacturing a memory device comprising:

forming a first interlayer dielectric (ILD) layer above a magnetoresistive random-access memory (MRAM) cell located in an embedded memory region and above an upper dielectric layer located in a logic region, wherein the embedded memory region is adjacent to the logic region;

selectively etching the first ILD layer to form sidewalls defining an aperture in the first ILD layer over the MRAM cell, the aperture exposing an upper surface of the MRAM cell;

forming a top electrode via layer within the aperture and over the first ILD layer, wherein a top surface of the top electrode via layer defines a recess above the MRAM cell;

performing a first planarization process on the top electrode via layer to remove part of the top electrode via layer defining the recess;

replacing the first ILD layer within the logic region with a second ILD layer that is different than the first ILD layer; and

forming an interconnect wire and via within the second ILD layer at locations laterally offset from the MRAM cell.

12. The method of claim 11 , wherein a bottom most point of the recess is above a top surface of the first ILD layer.

13. The method of claim 11 , wherein the top surface of the top electrode via and a top surface of the first ILD layer are level.

14. The method of claim 11 , further comprising:

forming a hardmask layer over the first ILD layer within the logic region and the embedded memory region; and

selectively etching the first ILD layer according to the hardmask layer, wherein the hardmask layer is comprised of positive photoresist.

15. The method of claim 11 , further comprising:

forming a third ILD layer over the top electrode via and the first ILD layer;

forming a conductive via over the top electrode via within the third ILD layer; and

forming a conductive wire above the conductive via within the third ILD layer.

16. The method of claim 11 , wherein forming the interconnect wire and the via within the second ILD layer comprises:

forming the first ILD layer over a first conductive wire within the logic region;

forming the second ILD layer over the logic and embedded memory regions;

forming a second masking layer over the second ILD layer within the logic region;

removing the second ILD layer over the embedded memory region, wherein a protrusion comprising a remnant of the second ILD layer remains between the logic and embedded memory regions; and

performing a second planarization process to remove the protrusion.

17. The method of claim 16 , further comprising:

forming a second conductive via over the first conductive wire while forming a third conductive via over the top electrode via layer, wherein a width of a bottom surface of the third conductive via is less than a width of the top surface of the top electrode via layer; and

forming a second conductive wire over the second conductive via while forming a third conductive wire over the third conductive via.

18. An integrated circuit, comprising:

a magnetoresistive random-access memory (MRAM) cell disposed on a semiconductor substrate, wherein the MRAM cell comprises a top electrode, a bottom electrode, and a magnetic tunnel junction (MTJ) disposed between the top electrode and the bottom electrode;

a dielectric layer disposed over the MRAM cell;

a top electrode via within the dielectric layer disposed over the MRAM cell, wherein a top surface of the top electrode via is flat, wherein a maximum width of the top electrode via is less than a maximum width of the top electrode;

an interlayer dielectric layer disposed over the MRAM cell and the dielectric layer;

a conductive via within the interlayer dielectric layer disposed over the top electrode via, wherein a maximum width of the conductive via is greater than the maximum width of the top electrode via; and

a conductive wire disposed over the conductive via.

19. The integrated circuit of claim 18 , wherein a width of the top electrode via continuously decreases from the top surface of the top electrode via in a first direction towards the semiconductor substrate, and wherein a width of the MRAM cell continuously increases from a top surface of the MRAM cell in the first direction.

20. The integrated circuit of claim 18 , wherein a width of the top surface of the top electrode via is larger than a width of a bottom surface of the conductive via.