CMP polishing pad with lobed protruding structures
View Patent ↗A polishing pad useful in chemical mechanical polishing comprises a base, and a plurality of structures protruding from the base wherein a portion of the plurality of structures are defined by a cross section having a perimeter which defines an area. The perimeter can be defined by parametric equations and can have six or more inflection points or the cross-section can comprise three or more lobes. The cross-section has a Delta parameter in the range of 0.2 to 0.75.
1. A polishing pad useful in chemical mechanical polishing comprising
a base, and
a plurality of structures protruding from the base wherein a portion of the plurality of structures are defined by a cross section having a perimeter that defines an area, where the perimeter is defined by parametric equations on an x-y axis of
x :=( a 1*sin(2* f 1*π* t )+ a 3*sin(2* f 3*π* t )+ a 5*sin(2* f 5*π* t ))/ G 1
y :=( a 2*cos(2* f 2*π* t )+ a 4*cos(2* f 4*π* t )+ a 6*cos(2* f 6*π* t ))/ G 2
where a1, a2, a3, a4, a5, a6 each are independently numbers from −10 12 to 10 12 , and f1, f2, f3, f4, f5, f6 are each numbers from 0 to 10 12 , t is a parametric independent variable that increases in increments, delta t, from 0 to 1 to define the perimeter and delta t is no more than 0.05, and G1 and G2 are scaling parameters that range from greater than 0 to 10 12 , provided a1, a2, a3, a4, a5, a6; f1, f2, f3, f4, f5, f6 are selected such that the perimeter has six or more inflection points where the perimeter switches from concave to convex curve and the perimeter does not intersect with itself except where the perimeter starts and ends; wherein the cross-section is further characterized by a Delta parameter that is equal to a distance of a point inside the perimeter and furthest from the perimeter to a closest point on the perimeter divided by an equivalent radius of a circle having an area equal to the area of the cross section where the Delta parameter is in a range of 0.20 to 0.75.
2. The polishing pad of claim 1 wherein there are six inflection points.
3. The polishing pad of claim 1 wherein the Delta parameter is at least 0.3.
4. The polishing pad of claim 1 wherein the Delta parameter is no more than 0.6.
5. A polishing pad comprising
a base, and
a plurality of structures protruding from the base wherein a portion of the plurality of structures have three or more lobes and the plurality of structures are defined by a cross section having a perimeter that defines an area,
wherein the cross-section is characterized by a Delta parameter that is equal to a distance of a point inside the perimeter and furthest from the perimeter to a closest point on the perimeter divided by an equivalent radius of a circle having an area equal to the area of the cross section where the Delta parameter is in a range of 0.3 to 0.6.
6. The polishing pad of claim 5 having three lobes.
7. The polishing pad of claim 5 wherein the portion is all of the plurality of the structures.
8. The polishing pad of claim 5 wherein a distance from the base to a top surface of the plurality of structures is in the range of 0.1 to 2 mm.
9. The polishing pad of claim 5 wherein the pad is formed from at least one material having one or more of the following properties:
a Young's modulus in the range of 2.5 to 700 MPa,
a Poisson's ratio of 0.08 to 0.5,
a density of 0.4 to 1.5 g/cm 3 .
10. The polishing pad of claim 5 wherein the plurality of structures has a cumulative surface contact area, A cpsa , and the base has an area, A b , wherein the ratio of A cpsa /A b is in the range of 0.1 to 0.75.