IP Library Granted Patent US 10,673,008
Granted Patent B2
US 10,673,008 · App. 16/459,060 · Granted Jun 2, 2020

Display device and method of manufacturing the same

Inventors: Jaybum Kim (Seoul, KR); Eoksu Kim (Seoul, KR); Kyoungseok Son (Seoul, KR); Junhyung Lim (Seoul, KR); Jihun Lim (Hwaseong-si, KR)
Assignee: SAMSUNG DISPLAY CO., LTD.
H01L51/5203G09G3/32G09G3/3233H01L27/1108H01L27/3262H01L51/0096G09G2300/0426G09G2300/0814G09G2300/0842G09G2300/0861G09G2300/0866G09G2310/0245G09G2310/0262H01L27/3265H01L51/0023H01L51/5296H01L2227/323
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Quick Facts
Patent No.
US 10,673,008
App. No.
16/459,060
Granted
Jun 2, 2020
Kind
B2
Abstract

A display device includes a base substrate, a first transistor, a second transistor, an organic light emitting diode, and a capacitor electrically connected to the first thin film transistor. The first transistor includes a first semiconductor pattern below a first interlayer insulation layer and a first control electrode above the first interlayer insulation layer and below a second interlayer insulation layer. The second transistor includes a second control electrode above the first interlayer insulation layer and below the second interlayer insulation layer. A second semiconductor pattern is above the second interlayer insulation layer.

Claims (75)

1. A display device comprising:

a base substrate;

a first transistor above the base substrate and comprising a first source, a first drain, a first semiconductor pattern below a first insulation layer, and a first gate above the first insulation layer and below a second insulation layer;

a second transistor above the base substrate and comprising a second source, a second drain, a second gate above the first insulation layer and below the second insulation layer, and a second semiconductor pattern above the second insulation layer;

at least one third insulation layer above the second insulation layer;

a light emitting diode above the at least one third insulation layer and above the second gate; and

a capacitor electrically connected to at least one of the first transistor or the second transistor,

wherein the capacitor comprises:

a first electrode disposed on a same layer as the first gate; and

a second electrode disposed below the first electrode,

wherein the second insulation layer is disposed between the first electrode and the second electrode.

2. The display device of claim 1 , wherein the first semiconductor pattern comprises polysilicon semiconductor and the second semiconductor pattern comprises an oxide semiconductor.

3. The display device of claim 2 , wherein the oxide semiconductor comprises vertical crystals.

4. The display device of claim 1 , wherein each of the second source and the second drain comprises:

a lower electrode portion in direct contact with the second semiconductor pattern; and

an upper electrode portion disposed on the at least one third insulation layer and connected to the lower electrode portion via a first contact hole penetrating the at least one third insulation layer.

5. The display device of claim 4 , wherein each of the first source and the first drain is disposed on the at least one third insulation layer and is connected to the first semiconductor pattern via a second contact hole penetrating the first insulation layer, the second insulation layer, and the at least one third insulation layer.

6. The display device of claim 4 , wherein the lower electrode portion of the second source and the lower electrode portion of the second drain are spaced apart from each other in a first direction on the second semiconductor pattern, and the lower portion of the second source and the lower electrode portion of the second drain are in direct contact with upper and side surfaces of the second semiconductor pattern.

7. The display device of claim 4 , wherein a first outer surface of the lower electrode portion of the second source is substantially aligned with a first outer surface of the second semiconductor pattern;

a second outer surface of the lower electrode portion of the second drain is substantially aligned with a second outer surface of the second semiconductor pattern.

8. The display device of claim 4 , further comprising a conductive pattern overlapping the first gate and disposed on the second insulation layer.

9. The display device of claim 8 , wherein the conductive pattern is connected to one of the first and second electrodes of the capacitor.

10. The display device of claim 8 , further comprising a dummy semiconductor pattern disposed between the conductive pattern and the second insulation layer.

11. The display device of claim 10 , wherein the dummy semiconductor pattern and the second semiconductor pattern include a same semiconductor material.

12. The display device of claim 10 , wherein a portion of the second semiconductor pattern overlapping the lower electrode portion is doped with a dopant and the dummy semiconductor pattern is doped with a same dopant as the portion of the second semiconductor pattern.

13. The display device of claim 1 , further comprising a dummy semiconductor pattern disposed between the second electrode and the second insulation layer.

14. The display device of claim 13 , wherein the dummy semiconductor pattern and the second semiconductor pattern include a same semiconductor material.

15. A display device comprising:

a base substrate;

a first transistor above the base substrate and comprising a first source, a first drain, a first semiconductor pattern below a first insulation layer, and a first gate above the first insulation layer and below a second insulation layer;

a second transistor above the base substrate and comprising a second source, a second drain, a second gate above the first insulation layer and below the second insulation layer, and a second semiconductor pattern above the second insulation layer;

at least one third insulation layer above the second insulation layer;

a light emitting diode above the at least one third insulation layer and above the second gate; and

a capacitor electrically connected to at least one of the first transistor or the second transistor,

wherein the second thin film transistor further comprises a third gate disposed on the at least one third insulation layer, and wherein the third gate is electrically connected to the second gate.

16. A display device comprising:

a base substrate;

a first semiconductor pattern above the base substrate;

a first insulation layer disposed on the first semiconductor pattern;

a first gate disposed on the first insulation layer;

a second gate disposed on the first insulation layer, wherein the second gate is positioned closer to the base substrate than the first gate;

a second insulation layer substantially covering the first gate and the second gate;

a conductive pattern disposed on the second insulation layer and overlapping the first gate;

a second semiconductor pattern disposed above the second gate on the second insulation layer;

a third insulation layer substantially covering the conductive pattern and the second semiconductor pattern; and

an organic light emitting diode disposed on the third insulation layer.

17. The display device of claim 16 , wherein a first outer surface of the second semiconductor pattern is substantially aligned with a first outer surface of a source disposed on the second semiconductor pattern, and wherein a second outer surface of the second semiconductor pattern is substantially aligned with a second outer surface of a drain disposed on the second semiconductor pattern.

18. The display device of claim 16 , further comprising a buffer layer disposed on the base substrate.

19. The display device of claim 16 , further comprising a dummy semiconductor pattern disposed between the conductive pattern and the second insulation layer.

20. The display device of claim 19 , wherein the dummy semiconductor pattern and the second semiconductor pattern include a same semiconductor material.

21. A display device comprising:

a base substrate;

a first transistor above the base substrate and comprising a first source, a first drain, a first semiconductor pattern below a first insulation layer, and a first gate above the first insulation layer and below a second insulation layer;

a second transistor above the base substrate and comprising a second source, a second drain, a second gate above the first insulation layer and below the second insulation layer, and a second semiconductor pattern above the second insulation layer;

at least one third insulation layer above the second insulation layer;

a light emitting diode above the at least one third insulation layer and above the second gate; and

a capacitor electrically connected to at least one of the first transistor or the second transistor,

wherein each of the second source and the second drain comprises:

a lower portion in direct contact with the second semiconductor pattern; and

an upper portion disposed on the at least one third insulation layer and connected to the lower portion via a first contact hole penetrating the at least one third insulation layer, and

wherein the first semiconductor pattern comprises polysilicon semiconductor and the second semiconductor pattern comprises an oxide semiconductor.

22. The display device of claim 21 , wherein each of the first source and the first drain is disposed on the at least one third insulation layer and is connected to the first semiconductor pattern via a second contact hole penetrating the first insulation layer, the second insulation layer, and the at least one third insulation layer.

23. The display device of claim 21 , wherein the capacitor comprises:

a first electrode disposed on a same layer as the first gate; and

a second electrode disposed on a same layer as the lower portion,

wherein the second insulation layer is disposed between the first electrode and the second electrode.

24. The display device of claim 23 , further comprising a dummy semiconductor pattern disposed between the second electrode and the second insulation layer.

25. The display device of claim 24 , wherein the dummy semiconductor pattern and the second semiconductor pattern include a same semiconductor material.

26. The display device of claim 21 , wherein the lower portion of the second source and the lower portion of the second drain are spaced apart from each other in a first direction on the second semiconductor pattern, and the lower portion of the second source and the lower portion of the second drain are in direct contact with upper and side surfaces of the second semiconductor pattern.

27. The display device of claim 21 , wherein a first outer surface of the lower portion of the second source is substantially aligned with a first outer surface of the second semiconductor pattern;

a second outer surface of the lower portion of the second drain is substantially aligned with a second outer surface of the second semiconductor pattern.

28. The display device of claim 21 , further comprising a conductive pattern overlapping the first gate and disposed on the second insulation layer.

29. The display device of claim 28 , further comprising a dummy semiconductor pattern disposed between the conductive pattern and the second insulation layer.

30. The display device of claim 29 , wherein the dummy semiconductor pattern and the second semiconductor pattern include a same semiconductor material.

31. The display device of claim 29 , wherein a portion of the second semiconductor pattern overlapping the lower portion is doped with a dopant and the dummy semiconductor pattern is doped with a same dopant as the portion of the second semiconductor pattern.

Priority Claims (1)
KR 10-2016-0113445 · Sep 2, 2016 · national
Continuity (2)
Continuation 15657369 · Jul 24, 2017
Related Publication 20190326543A1 · Oct 24, 2019
Cited By (2)
US 12,256,593 US 12,307,964