IP Library › Granted Patent US 11,011,399
Granted Patent B2
US 11,011,399 · App. 16/480,519 · Granted May 18, 2021

Substrate storing container

Inventor: Chiaki Matsutori (Tokyo, JP)
Assignee: Miraial Co., Ltd.
H01L21/67389G05D7/0186
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Quick Facts
Patent No.
US 11,011,399
App. No.
16/480,519
Granted
May 18, 2021
Kind
B2
Abstract

A substrate storing container includes a container main body, a lid body removably attached to a container main body opening portion and able to close the container main body opening portion, a ventilation passage which enables a substrate storing space and a space outside the container main body to communicate with each other, a gas ejecting nozzle portion having a plurality of opening portions through which a gas flowing into the ventilation passage is supplied into the substrate storing space, and a gas flow rate uniformizing unit which enables the gas to flow out through the plurality of opening portions at a uniform flow rate.

Claims (25)

1. A substrate storing container comprising:

a container main body which includes a tubular wall portion in which one end portion has an opening circumferential portion at which a container main body opening portion is formed and the other end portion is closed, and has a substrate storing space formed by inner faces of the wall portion, the substrate storing space being able to store a plurality of substrates and communicating with the container main body opening portion;

a lid body which is removably attached to the container main body opening portion and is able to close the container main body opening portion;

a ventilation passage which enables the substrate storing space and a space outside the container main body to communicate with each other;

a gas ejecting nozzle portion having a plurality of opening portions through which a gas flowing into the ventilation passage is supplied into the substrate storing space; and

a gas flow rate uniformizing unit which enables the gas to flow out through the plurality of opening portions at a uniform flow rate,

wherein the gas flow rate uniformizing unit is a branch passage formed between the ventilation passage and the opening portions, and is configured by the branch passage which causes a flow of the gas from the ventilation passage to branch, and

the opening portions include a first opening portion which is open in a direction toward the container main body opening portion that is located at one end portion of the container main body and a second opening portion which is open in a direction having a predetermined angle with respect to a direction opposite to the direction toward the container main body opening portion.

2. The substrate storing container according to claim 1 , further comprising the gas flow rate uniformizing unit which enables the gas to flow out through the plurality of opening portions at a uniform flow rate, wherein

the gas ejecting nozzle portion includes a cleaning solution inflow inhibiting portion that inhibits a flow of a cleaning solution from the opening portion toward the ventilation passage side in a vicinity of the opening portion when the container main body is cleaned.

3. The substrate storing container according to claim 2 , wherein

the gas flow rate uniformizing unit is a gas retention chamber formed between the ventilation passage and the opening portions of the gas ejecting nozzle portion, and is configured by the gas retention chamber configuring a gas uniform holding portion in which the gas is temporarily accumulated and pressurized as the ventilation passage and the opening portions of the gas ejecting nozzle portion communicate with each other and thus the gas from the ventilation passage can be uniformly held in a predetermined amount.

4. The substrate storing container according to claim 2 , wherein

the wall portion includes a back wall, an upper wall, a lower wall, and a pair of side walls, the other end portion of the wall portion is closed by the back wall, and the container main body opening portion is formed by one end portion of the upper wall, one end portion of the lower wall, and one end portions of the side walls,

the back wall has a projecting portion projecting toward the container main body opening portion, and

the projecting portion has the opening portions and configures the gas ejecting nozzle portion.

5. The substrate storing container according to claim 1 , wherein

the wall portion includes a back wall, an upper wall, a lower wall, and a pair of side walls, the other end portion of the wall portion is closed by the back wall, and the container main body opening portion is formed by one end portion of the upper wall, one end portion of the lower wall, and one end portions of the side walls,

the gas ejecting nozzle portion is disposed at a center portion of the back wall, and

the opening portions of the gas ejecting nozzle portion are open toward the container main body opening portion.

6. The substrate storing container according to claim 1 , wherein

the first opening portion is formed to be open in a semicircular shape oriented in a direction toward the container main body opening portion, and

the second opening portion is formed to be open in a fan-like shape oriented in a direction at an angle of 45° with respect to a direction opposite to the direction toward the container main body opening portion.

7. The substrate storing container according to claim 6 , wherein

a radius of an opening portion having the fan-like shape of the second opening portion is larger than a radius of an opening portion having the semicircular shape of the first opening portion.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 24, 2019
From: MATSUTORI, CHIAKI
To: MIRAIAL CO., LTD.
Reel/Frame 049851/0732 →
Priority Claims (1)
WO PCT/JP2017/017244 · May 2, 2017 · international
Continuity (1)
Related Publication 20190393063A1 · Dec 26, 2019
Cited By (2)
US 12,374,573 US 12,424,472