IP Library › Granted Patent US 12,374,573
Granted Patent B2
US 12,374,573 · App. 18/573,927 · Granted Jul 29, 2025

Substrate storing container

Inventor: Chiaki Matsutori (Tokyo, JP)
Assignee: MIRAIAL CO., LTD.
H01L21/67389
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Quick Facts
Patent No.
US 12,374,573
App. No.
18/573,927
Granted
Jul 29, 2025
Kind
B2
Abstract

A substrate storing container includes: a gas ejection nozzle unit having a plurality of apertures for supplying to the substrate storing space a gas that has flowed into the ventilation paths; and a gas flow rate equalizer capable of causing the gas to flow out from the plurality of apertures at an equalized flow rate. The gas flow rate equalizer includes a gas detention chamber, a pre-outflow gas retention chamber, and inter-chamber partitions defining an inter-chamber flow path that blocks straight-line communication between the gas detention chamber and the pre-outflow gas retention chamber but allows for communication between the gas detention chamber and the pre-outflow gas retention chamber.

Claims (28)

1. A substrate storing container comprising:

a container body having an opening peripheral edge defining a container body opening at one end thereof, and a wall with a closed tubular shape at an other end thereof, and including a substrate storing space formed therein, the substrate storing space being defined by an inner surface of the wall, being capable of storing a substrate, and communicating with the container body opening;

a lid detachably attachable to the container body opening and capable of closing the container body opening;

a ventilation path allowing for communication between the substrate storing space and a space outside the container body;

a gas ejection nozzle unit having a plurality of apertures for supplying to the substrate storing space a gas that has flowed into the ventilation path; and

a gas flow rate equalizer capable of causing the gas to flow out from the plurality of apertures at an equalized flow rate,

the gas flow rate equalizer comprising a gas detention chamber, a pre-outflow gas retention chamber, and an inter-chamber partition, the inter-chamber partition defining an inter-chamber flow path that blocks straight-line communication between the gas detention chamber and the pre-outflow gas retention chamber but allows for communication between the gas detention chamber and the pre-outflow gas retention chamber, wherein

in the pre-outflow gas retention chamber, the inter-chamber flow path opens in a direction opposite to a direction toward the plurality of apertures.

2. The substrate storing container according to claim 1 , wherein

the gas flow rate equalizer further includes a partition wall that partitions the pre-outflow gas retention chamber into a plurality of pre-outflow gas retention sub-chambers.

3. The substrate storing container according to claim 2 , wherein

the plurality of pre-outflow gas retention sub-chambers have an equal capacity.

4. The substrate storing container according to claim 3 , wherein

the gas detention chamber is partitioned into a plurality of gas detention sub-chambers by an inter-sub-chamber partition.

5. The substrate storing container according to claim 4 , wherein

a gas supply flow path communicating with all the gas detention sub-chambers is formed.

6. The substrate storing container according to claim 2 , wherein

the gas ejection nozzle unit includes a nozzle chamber that is in communication with the apertures, and

the nozzle chamber communicates with the pre-outflow gas retention chamber via a hydrophobic film.

7. The substrate storing container according to claim 6 , wherein

the nozzle chamber communicates with all the apertures and all the gas pre-outflow gas retention sub-chambers.

8. The substrate storing container according to claim 1 , wherein

the gas ejection nozzle unit has a flow-directing part that causes the gas to flow out from the aperture in a predetermined direction.

9. The substrate storing container according to claim 1 , wherein

the apertures are formed to correspond to a plurality of substrates stored in the substrate storing space on a one-to-one basis.

10. The substrate storing container according to claim 1 , comprising:

a protrusion part having a columnar shape and including the gas ejection nozzle unit and the gas flow rate equalizer, wherein

a base of the protrusion part is fitted into a hole formed in the wall of the container body, constituting the ventilation path, and provided with a sealing member, and an end portion of the protrusion part is fastened to the wall of the container body, whereby the protrusion part is fastened to the container body.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 23, 2024
From: MATSUTORI, CHIAKI
To: MIRAIAL CO., LTD.
Reel/Frame 066210/0684 →
Continuity (1)
Related Publication 20240145284A1 · May 2, 2024
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Cited By (1)
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