Wafer storage container
View Patent ↗The present invention relates to a wafer storage container capable of removing fumes on a wafer or removing moisture therefrom by supplying purge gas to the wafer stored in a storage chamber. More particularly, the present invention relates to a wafer storage container, in which uniform purge gas injection is achieved and thus formation of dead regions is minimized, formation of turbulence in a storage chamber is prevented and thus wafer purging efficiency is improved, and a size reduction of an injection member injecting purge gas into the storage chamber is achieved and thus a size reduction of the entire wafer storage container is achieved.
1. A wafer storage container, comprising:
a storage chamber in which a wafer received through a front opening is stored; and
an injection member disposed on at least a portion of a circumferential surface of the storage chamber and injecting purge gas into the storage chamber,
wherein the injection member includes:
an inflow hole through which the purge gas flows into the injection member;
multiple injection holes arranged on the portion of the circumferential surface of the storage chamber such that the purge gas is injected into the storage chamber through the injection holes;
a branch passage portion having at least one branch section such that the purge gas having flowed through the inflow hole is allowed to flow to the multiple injection holes, the branch passage portion being provided on a surface parallel to the portion of the circumferential surface of the storage chamber;
an injection plate having the multiple injection holes and the branch passage portion; and
an inflow plate coupled to the injection plate and having the inflow hole,
wherein the multiple injection holes are formed on a first surface of the injection plate, and the branch passage portion is formed on a second surface of the injection plate.
2. The wafer storage container of claim 1 , wherein the branch passage portion includes:
a main passage communicating with the inflow hole and formed in a vertical direction of the surface parallel to the portion of the circumferential surface of the storage chamber; and
multiple branch passages allowing the main passage and each of the multiple injection holes to communicate with each other, and configured such that the branch passages are branched symmetrically with each other with respect to the main passage to form the branch section, the branch passages being formed in horizontal directions of the surface parallel to the portion of the circumferential surface of the storage chamber.
3. The wafer storage container of claim 2 , wherein the inflow hole is formed to be positioned at a center of a vertical length of the main passage.
4. The wafer storage container of claim 1 , wherein the purge gas having flowed from the inflow hole to each of the multiple injection holes through the branch passage portion has the same flow distance.
5. The wafer storage container of claim 4 , wherein the branch section of the branch passage portion is formed such that two branch passages are branched in opposite directions.
6. The wafer storage container of claim 1 , wherein the injection member is disposed between the injection plate and the inflow plate and further includes:
an additional passage plate having an additional passage allowing the inflow hole and the branch passage portion to communicate with each other.