IP Library Granted Patent US 10,825,694
Granted Patent B2
US 10,825,694 · App. 16/482,857 · Granted Nov 3, 2020

Method for manufacturing electronic component, resin composition for temporary protection, and resin film for temporary protection

Inventors: Yushi Yamaguchi (Tokyo, JP); Ryoji Furutani (Tokyo, JP); Takuji Ikeya (Tokyo, JP); Shogo Sobue (Tokyo, JP); Yasuyuki Ooyama (Tokyo, JP)
Assignee: HITACHI CHEMICAL COMPANY, LTD.
H01L21/56C08J5/18H01L21/7806H01L21/82H01L23/552
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Quick Facts
Patent No.
US 10,825,694
App. No.
16/482,857
Granted
Nov 3, 2020
Kind
B2
Abstract

The present invention relates to a method for manufacturing an electronic component having an electromagnetic shield, comprising: a bonding step of bonding a temporary protective material on a workpiece with unevenness on the surface thereof; a photocuring step of curing the temporary protective material by light irradiation; a icing step of singulating the workpiece and the temporary protective material; a shielding step of forming a metal film on the portion of the singulated workpiece, the portion having no temporary protective material bonded thereon; and a peeling step of peeling the temporary protective material from the workpiece having the metal film formed, wherein the temporary protective material is formed from a resin composition for temporary protection with an elastic modulus at 25° C. of 3 MPa or less and an elastic modulus at 25° C. of 40 MPa or more after light irradiation with an exposure dose of 500 mJ/cm 2 or more.

Claims (32)

1. A method for manufacturing an electronic component having an electromagnetic shield, the method comprising:

a bonding step of bonding a temporary protective material on a workpiece with unevenness on the surface thereof;

a photocuring step of curing the temporary protective material by light irradiation;

a dicing step of singulating the workpiece and the temporary protective material;

a shielding step of forming a metal film on a portion of the singulated workpiece, the portion having no temporary protective material bonded thereon; and

a peeling step of peeling the temporary protective material from the workpiece having the metal film formed,

wherein the temporary protective material is formed from a resin composition for temporary protection with an elastic modulus at 25° C. of 3 MPa or less and an elastic modulus at 25° C. of 40 MPa or more after light irradiation with an exposure dose of 500 mJ/cm 2 or more.

2. The method according to claim 1 , wherein the resin composition has a tack force of 1 to 5 N as measured at 25° C. by a probe tack test after light irradiation with an exposure dose of 500 mJ/cm 2 or more.

3. The method according to claim 1 , wherein the resin composition comprises a (meth)acrylic copolymer (A), and the (meth)acrylic copolymer comprises a (meth)acrylic monomer (α1) and a (meth)acrylic monomer (α2) as copolymer components, a homopolymer of the (meth)acrylic monomer (α1) having a glass transition temperature of 50° C. or more and a homopolymer of the (meth)acrylic monomer (α2) having a glass transition temperature of 0° C. or less.

4. The method according to claim 3 , wherein a weight average molecular weight of the (meth)acrylic copolymer (A) is 100000 to 1000000.

5. The method according to claim 1 , wherein the resin composition further comprises a (meth)acrylic monomer (B).

6. The method according to claim 1 , wherein the resin composition further comprises a photoradical polymerization initiator (C).

7. The method according to claim 1 , wherein the resin composition further comprises a silicone compound (D).

8. The method according to claim 1 , wherein the resin composition further comprises a thermally curable component (E), and the component (E) is liquid at room temperature.

9. The method according to claim 1 , further comprising a thermally curing step of further curing the temporary protective material by heating after the dicing step.

10. The method according to claim 1 , wherein the temporary protective material is in the form of a film.

11. A resin composition for temporary protection, the resin composition being for forming the temporary protective material and used for a method for manufacturing an electronic component having an electromagnetic shield, the method comprising:

a bonding step of bonding a temporary protective material on a workpiece with unevenness on the surface thereof;

a photocuring step of curing the temporary protective material by light irradiation;

a dicing step of singulating the workpiece and the temporary protective material;

a shielding step of forming a metal film on a portion of the singulated workpiece, the portion having no temporary protective material bonded thereon; and

the peeling step of peeling the temporary protective material from the workpiece having the metal film formed,

wherein the resin composition has an elastic modulus at 25° C. of 3 MPa or less and an elastic modulus at 25° C. of 40 MPa or more after light irradiation with an exposure dose of 500 mJ/cm 2 or more.

12. The resin composition for temporary protection according to claim 11 , wherein the resin composition has a tack force of 1 to 5 N as measured at 25° C. by a probe tack test after light irradiation with an exposure dose of 500 mJ/cm 2 or more.

13. The resin composition for temporary protection according to claim 11 , wherein the resin composition comprises a (meth)acrylic copolymer (A), and the (meth)acrylic copolymer comprises a (meth)acrylic monomer (α1) and a (meth)acrylic monomer (α2) as copolymer components, a homopolymer of the (meth)acrylic monomer (α1) having a glass transition temperature of 50° C. or more and a homopolymer of the (meth)acrylic monomer (α2) having a glass transition temperature of 0° C. or less.

14. The resin composition for temporary protection according to claim 13 , wherein a weight average molecular weight of the (meth)acrylic copolymer (A) is 100000 to 1000000.

15. The resin composition for temporary protection according to claim 11 , further comprising a (meth)acrylic monomer (B).

16. The resin composition for temporary protection according to claim 11 , further comprising a photoradical polymerization initiator (C).

17. The resin composition for temporary protection according to claim 11 , further comprising a silicone compound (D).

18. The resin composition for temporary protection according to claim 11 , further comprising a thermally curable component (E), wherein the component (E) is liquid at room temperature.

19. The resin composition for temporary protection according to claim 11 , wherein the method further comprises a thermally curing step of further curing the temporary protective material by heating after the dicing step.

20. A resin film for temporary protection, obtained by forming the resin composition according to claim 11 into a film.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
CHANGE OF NAME Recorded Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 30, 2019
From: YAMAGUCHI, YUSHI; FURUTANI, RYOJI; IKEYA, TAKUJI; SOBUE, SHOGO; OOYAMA, YASUYUKI
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 050220/0465 →