Method for the in situ production of Majorana material superconductor hybrid networks and to a hybrid structure which is produced using the method

1. A method for producing a hybrid structure, the hybrid structure including at least one structured Majorana material and at least one structured superconductive material arranged thereon, the method comprising:

producing, on a substrate, a first mask for structured application of the Majorana material and a further mask for structured growth of the at least one superconductive material, the first mask and the further mask being aligned relative to one another; and

applying the Majorana material to the substrate, wherein the first mask defines the structure of the Majorana material; and

applying the at least one structured superconductive material to the structured Majorana material with the aid of the further mask,

wherein the applying the Majorana material and the applying the at least one structured superconductive material is performed without interruption in an inert atmosphere.

2. The method according to claim 1 , wherein the first mask and the further mask are produced according to the following steps:

I.A applying a first additional layer to the substrate,

I.B applying a second additional layer to the first additional layer, wherein the first additional layer is etchable selectively with respect to the second additional layer and the substrate,

I.C structuring a surface of the second additional layer in such a way that at least one subregion of the second additional layer is exposed,

I.D removing at least one exposed region of the first additional layer beneath the at least one exposed subregion of the second additional layer to the substrate, whereby an undercut occurs,

II.E depositing a third additional layer such that the at least one exposed region of the first additional layer and the at least one exposed region of the second additional layer are completely filled and the third additional layer covers the second additional layer,

II.F applying a fourth additional layer to the third additional layer, wherein the third additional layer is etchable selectively with respect to the fourth additional layer, the second additional layer and the substrate,

II.G. structuring and exposing a surface of the fourth additional layer in such a way that a junction remains between at least two areas, and

II.H removing regions of the third additional layer beneath exposed areas of the fourth additional layer, apart from the substrate, whereby a second undercut occurs,

wherein the applying the Majorana material to the substrate comprises subsequently depositing the Majorana material on the substrate in a structured manner such that it is arranged within the at least one exposed region of the first additional layer and the at least one exposed region of the second additional layer.

3. The method according to claim 2 , further comprising applying a functional layer to the structured Majorana material and at least partially to the exposed surface of the fourth additional layer.

4. The method according to claim 2 , wherein, in step II.G., the surface of the fourth additional layer is structured and exposed in such a way that at least one trench having a length between 100 nm and 100 μm and a width between 10 nm and 10 μm is produced.

5. The method according to claim 2 , wherein the first additional layer is applied with an overall layer thickness of between 1 nm and 20 nm.

6. The method according to claim 2 , wherein the second additional layer is applied with an overall layer thickness of between 5 and 250 nm.

7. The method according to claim 2 , wherein the first additional layer and the second additional layer are deposited with an overall layer thickness of between 15 and 50 nm.

8. The method according to claim 2 , wherein the third additional layer is applied with an overall layer thickness of between 5 and 500 nm, preferably in the range of 10 to 150 nm.

9. The method according to claim 1 , wherein the structured Majorana material includes Dirac materials.

10. The method according to claim 9 , wherein the structured Majorana material includes Bi x Sb 1-x ) 2 (Te y Se 1-y ) 3 , where 0≤x≤1 and 0≤y≤1.

11. The method according to claim 1 , further comprising applying a material capable of forming a native oxidation layer to the structured Majorana material in a surface-covering manner with a layer thickness of between 1 and 3 nm, the structured Majorana material forming at least part of a first functional layer and the material capable of forming a native oxidation layer forming at least part of a second functional layer, and

wherein a third functional layer comprising superconductive material is applied to subregions of the second functional layer without substrate rotation.

12. The method according to claim 11 , wherein the second functional layer includes Al x O y , Nb x O y , Ti x O y , where 0≤x, y≤1.

13. The method according to claim 11 , wherein a further superconductive material is applied as the second functional layer.

14. The method according to claim 1 , wherein the structured Majorana material forms at least part of a first functional layer, the method further comprising applying a second functional layer comprising a further superconductive material to subregions of the structured Majorana material without substrate rotation, and

applying a third functional layer comprising an electrically insulating material to the second functional layer and a free surface of the first functional layer in a surface-covering manner.

15. The method according to claim 14 , in the third functional layer includes at least an additional superconductive material.