Substrate processing apparatus and substrate processing control method

1. A substrate processing apparatus comprising:

a first mounting unit configured to mount thereon a target substrate to be processed that is a plasma processing target;

a second mounting unit disposed to surround the first mounting unit and configured to mount thereon a focus ring; and

an adjusting unit configured to adjust a height of a peripheral portion of the target substrate with respect to a height of a central portion of the target substrate in response to consumption of the focus ring,

wherein the first mounting unit is formed in a disk shape and concentrically divided into a plurality of regions, and

the adjusting unit includes:

a thickness variable layer disposed at least below each of one or more regions, which correspond to a peripheral portion of the first mounting unit, among the plurality of regions, wherein the thickness variable layer has a thickness that varies due to shrinkage occurring depending on a temperature;

a heater disposed to correspond to the thickness variable layer; and

a control unit configured to control the heater to heat the thickness variable layer in response to the consumption of the focus ring.

2. The substrate processing apparatus of claim 1 , wherein at least one of the one or more regions corresponding to the peripheral portion of the first mounting unit among the plurality of regions is further divided into multiple regions in a circumferential direction, and the thickness variable layer and the heater are disposed below each of the circumferentially divided multiple regions.

3. The substrate processing apparatus of claim 2 , wherein the adjusting unit includes:

a support unit disposed to circumferentially extend along an outer periphery of the first mounting unit and configured to support an edge portion of the target substrate;

an elevation unit configured to raise and lower the support unit; and

a control unit configured to control the elevation unit to raise the support unit when the focus ring is newly mounted on the second mounting unit and control the elevation unit to lower the support unit in response to the consumption of the focus ring.

4. The substrate processing apparatus of claim 3 , wherein the support unit is divided into multiple parts in a circumferential direction, and the elevation unit is provided for each of the multiple parts of the support unit.

5. The substrate processing apparatus of claim 1 , wherein the adjusting unit includes:

a support unit disposed to circumferentially extend along an outer periphery of the first mounting unit and configured to support an edge portion of the target substrate;

an elevation unit configured to raise and lower the support unit; and

a control unit configured to control the elevation unit to raise the support unit when the focus ring is newly mounted on the second mounting unit and control the elevation unit to lower the support unit in response to the consumption of the focus ring.

6. The substrate processing apparatus of claim 5 , wherein the support unit is divided into multiple parts in a circumferential direction, and the elevation unit is provided for each of the multiple parts of the support unit.

7. A substrate processing control method comprising:

mounting a target substrate to be processed as a plasma processing target on a first mounting unit, the first mounting unit being formed in a disk shape and concentrically divided into a plurality of regions;

mounting a focus ring on a second mounting unit, wherein the second mounting unit is disposed to surround the first mounting unit; and

adjusting a height of a peripheral portion of the target substrate with respect to a height of a central portion of the target substrate, by controlling a heater to heat a thickness variable layer, in response to consumption of the focus ring,

wherein the thickness variable layer is disposed at least below each of one or more regions, which correspond to a peripheral portion of the first mounting unit, among the plurality of regions, wherein the thickness variable layer has a thickness that varies due to shrinkage occurring depending on a temperature, and the heater is disposed to correspond to the thickness variable layer.