Optical device structure using GaN substrates and growth structures for laser applications
Optical devices having a structured active region configured for selected wavelengths of light emissions are disclosed.
1. An optical device comprising:
a gallium and nitrogen containing semipolar or nonpolar crystalline surface region;
an n-type gallium and nitrogen containing region overlying the semipolar or nonpolar crystalline surface region;
an n-side SCH layer comprising InGaN overlying the n-type gallium and nitrogen containing region;
an active region overlying the n-side SCH layer, the active region comprising at least one quantum well having InGaN;
a p-side SCH layer comprising InGaN overlying the active region;
a laser stripe region formed overlying the p-side SCH layer, the laser stripe region characterized by a cavity orientation substantially parallel to a first-direction, the laser stripe region having a first end and a second end, the laser stripe region comprising a p-type gallium and nitrogen containing region;
an overlying p-type metal region overlying an upper portion of the laser stripe region;
a first facet provided on the first end of the laser stripe region; and
a second facet provided on the second end of the laser stripe region, wherein the first facet is substantially parallel with the second facet, wherein one of the first facet or the second facet is configured to emit light characterized by a wavelength ranging from between 390 nm to 530 nm.
2. The device of claim 1 wherein the first facet comprises a first mirror surface.
3. The device of claim 2 wherein the second facet comprises a second mirror surface.
4. The device of claim 1 wherein the n-type gallium and nitrogen containing region comprises a silicon entity.
5. The device of claim 1 wherein the p-type gallium and nitrogen containing region comprises a magnesium entity.
6. The device of claim 1 wherein the active region includes one or more barrier layers.
7. The device of claim 1 further comprising an electron blocking layer comprising aluminum disposed between the active region and the p-type gallium and nitrogen containing region.
8. The device of claim 1 further comprising a spontaneously emitted light characterized by a wavelength ranging 390 nm to 420 nm, 420 nm to 440 nm, 440 nm to 470 nm, 470 nm to 490 nm, 490 nm to 510 nm, and 510 nm to 530 nm.
9. The device of claim 1 wherein the laser stripe region is provided by an etching process selected from dry etching or wet etching.
10. The device of claim 1 wherein the laser stripe region comprises an overlying dielectric layer exposing an upper portion of the laser stripe region.
11. The device of claim 1 wherein the p-type metal region comprises gallium nitride comprising magnesium entities.
12. An optical device comprising:
a gallium and nitrogen containing semipolar or nonpolar crystalline surface region;
an n-type gallium and nitrogen containing cladding layer overlying the semipolar or nonpolar crystalline surface region;
an n-side SCH layer overlying the n-type gallium and nitrogen containing cladding layer, the n-side SCH layer comprised of InGaN;
a multiple quantum well active region overlying the n-side SCH layer, the multiple quantum well active region comprised of InGaN quantum wells separated by gallium and nitrogen containing barriers;
a p-side SCH layer overlying the multiple quantum well active region, the p-side SCH layer comprised of InGaN;
an electron blocking layer overlying the p-side SCH layer, the electron blocking layer comprised of AlGaN doped with magnesium;
a p-type gallium and nitrogen containing cladding layer overlying the electronic blocking layer, the p-type gallium and nitrogen containing cladding layer having a magnesium doping;
a p++-type gallium and nitrogen containing contact layer with a magnesium doping;
a laser stripe region having a first end and a second end;
a first facet provided on the first end of the laser stripe region; and
a second facet provided on the second end of the laser stripe region.
13. The device of claim 12 wherein the first facet and the second facet comprise mirror surfaces.
14. The device of claim 12 wherein the n-type gallium and nitrogen containing cladding layer comprises a silicon doping.
15. The device of claim 12 wherein the laser stripe region comprises an overlying dielectric layer exposing an upper portion of the laser stripe region.