Low-voc cleaning substrates and compositions comprising a cationic biocide/alkylpolyglycoside mixture
A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
1. A cleaning substrate comprising:
a. an absorbent substrate:
b. a cleaning composition, loaded onto said absorbent substrate, consisting of:
i. about 0.05-5% by weight of one or more cationic biocide;
ii. about 0.01-5% by weight of one or more alkyl polyglycoside nonionic surfactants;
iii. about 0.01-3% by weight of a first solvent solvent selected form the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof;
iv. about 0.01-2% by weight of a second solvent selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;
v. at least about 90% by weight of water; and
vi. optionally, one or more adjuncts selected from the group consisting of: buffers, fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, dyes, coloroants and preservatives.
2. The cleaning substrate as defined in claim 1 , wherein the composition further comprises a buffer.
3. The cleaning substrate as defined in claim 1 , wherein the composition further comprises a fragrance.
4. The cleaning substrate as defined in claim 1 , wherein said cationic biocide includes a quaternary ammonium compound.
5. The cleaning substrate as defined in claim 1 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol.
6. The cleaning substrate as defined in claim 1 , wherein said first solvent includes a C3-24 alkylene glycol ether.
7. The cleaning substrate as defined in claim 1 , wherein the first solvent is a propylene glycol.
8. The cleaning substrate as defined in claim 1 , wherein the second solvent is an alcohol.
9. A cleaning substrate comprising:
a. an absorbent substrate:
b. a cleaning composition, loaded onto said absorbent substrate, consisting of:
i. about 0.001-1% by weight of one or more quaternary ammonium compounds;
ii. about 0.001-1% by weight of a weight of an alkyl polyglycoside surfactant;
iii. about 0.01-3% by weight of a first solvent solvent selected form the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof;
iv. about 0.01-2% by weight of a second solvent selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;
v. about 0.001-1% by weight of a buffer;
vi. at least about 90% by weight of water; and
vii. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, and preservatives.
10. The cleaning substrate as defined in claim 9 , wherein the buffer is monoethanolamine.
11. The cleaning substrate as defined in claim 9 , wherein the composition further comprises a fragrance.
12. The cleaning substrate as defined in claim 9 , wherein said one or more quaternary ammonium compound comprises: n-alkyldimethylbenzylammonium chloride, n-alkyldimethylethylbenzylammonium chloride and combinations or mixtures thereof.
13. The cleaning composition as defined in claim 9 , wherein the first solvent is a propylene glycol.
14. The cleaning composition as defined in claim 9 , wherein the second solvent is an alcohol.
15. A cleaning substrate comprising:
a. an absorbent substrate:
b. a cleaning composition, loaded onto said absorbent substrate, consisting of:
i. about 0.05-5% by weight of one or more quaternary ammonium compound,
ii. about 0.01-5% by weight of an alkyl polyglycoside surfactant;
iii. about 0.001-3% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof,
iv. about 0.01-2% by weight of a second solvent selected from the group consisting of: alcohols;
v. one or more buffer;
vi. one or more fragrance;
vii. at least 90% by weight of water; and
vi. optionally, one or more adjuncts selected from the group consisting of: coloroants, hydrotropes, defoamers, enzymes, bleaching agents, dyes, coloroants and preservatives.
16. The cleaning substrate as defined in claim 15 , wherein said buffer is monoethanolamine.
17. The cleaning substrate as defined in claim 15 , said the first solvent is a propylene glycol.
18. The cleaning substrate as defined in claim 15 , wherein said one or more quaternary ammonium compounds is present in the cleaning composition in an amount of 1% or less by weight.
19. The cleaning substrate as defined in claim 15 , wherein said one or more quaternary ammonium compound comprises: n-alkyldimethylbenzylammonium chloride, n-alkyldimethylethylbenzylammonium chloride and combinations or mixtures thereof.
20. The cleaning substrate as defined in claim 15 , wherein said second solvent is ethanol.