IP Library Granted Patent US 11,192,972
Granted Patent B2
US 11,192,972 · App. 16/562,786 · Granted Dec 7, 2021

Polymer material, composition, and method of manufacturing semiconductor device

Inventors: Koji Asakawa (Kawasaki Kanagawa, JP); Norikatsu Sasao (Kawasaki Kanagawa, JP); Shinobu Sugimura (Yokohama Kanagawa, JP)
Assignee: TOSHIBA MEMORY CORPORATION
C08F220/14C08L33/10G03F7/038G03F7/039H01L21/0273H01L21/31116H01L21/31144C08L2203/20G03F7/162G03F7/168G03F7/2006H01L27/11556H01L27/11582
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Quick Facts
Patent No.
US 11,192,972
App. No.
16/562,786
Granted
Dec 7, 2021
Kind
B2
Abstract

According to one embodiment, a polymer material is disclosed. The polymer material contains a polymer. The polymer contains a first monomer unit having a lone pair and an aromatic ring at a side chain, and a second monomer unit including a crosslinking group at a terminal of the side chain, with its molar ratio of 0.5 mol % to 10 mol % to all monomer units in the polymer. The polymer material can be used for manufacturing a composite film as a mask pattern for processing a target film on a substrate. The composite film can be formed by a process including, forming an organic film on the target film with the polymer material, patterning the organic film, and forming the composite film by impregnating a metal compound into the patterned organic film.

Claims (23)

1. A composition comprising:

a polymer material including a polymer containing a first monomer unit having a lone pair and an aromatic ring at a side chain, and a second monomer unit including a crosslinking group at a terminal of the side chain, with its molar ratio of 0.5 mol % to 10 mol % to all monomer units in the polymer, the polymer material to be impregnated with 10 atom % or more of a metal, and

a solvent.

2. The composition according to claim 1 , wherein

a molar ratio of the first monomer unit to all monomer units in the polymer is 30 mol % to 99.5 mol %.

3. The composition according to claim 1 , wherein

a main component monomer of the polymer is a (meth)acrylate, and

a component monomer of the first monomer unit is an aromatic compound derivative of a (meth)acrylic acid.

4. The composition according to claim 1 , wherein

the first monomer unit has two or more lone pair at a side chain.

5. The composition according to claim 1 , wherein

the crosslinking group includes a glycidyl group.

6. The composition according to claim 1 , wherein

the second monomer unit has the molar ratio of 1 mol % to 7 mol % to all monomer units in the polymer.

7. The composition according to claim 1 , wherein

the second monomer unit has the molar ratio of 2 mol % to 5 mol % to all monomer units in the polymer.

8. The composition according to claim 1 , wherein

the first monomer unit has the lone pair contained in a ester bond (—COO—), a cyano group (—C≡N), a pyridine skeleton, and an amino group (—NH2).

9. The composition according to claim 1 , wherein

the polymer contains a third monomer unit including a group formable a carboxyl group due to heating or light irradiation at the terminal of the side chain.

10. The composition according to claim 9 , wherein

a molar ratio of the third monomer unit to all monomer units in the polymer is 0.2 mol % to 50 mol %, and

a molar ratio of the first monomer unit to all monomer units in the polymer is 49.5 mol % to 99.3 mol %.

Assignments (2)
CHANGE OF NAME Recorded Feb 2, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 058950/0398 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 6, 2019
From: ASAKAWA, KOJI; SASAO, NORIKATSU; SUGIMURA, SHINOBU
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050291/0922 →
Priority Claims (1)
JP JP2019-044104 · Mar 11, 2019 · national
Continuity (1)
Related Publication 20200291156A1 · Sep 17, 2020