Patent Assignment
Reel/Frame 058950/0398
Change of Name
Recorded: 2022-02-02
Pages: 100
Assignor
TOSHIBA MEMORY CORPORATION
Executed: 2019-10-01
Assignee
KIOXIA CORPORATION
1-21, SHIBAURA 3-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(5)
Method of Manufacturing Semiconductor Device, Method of Forming Pattern Film, and Metal-Containing Organic Film
Pattern Forming Material, Composition for Pattern Formation, Pattern Forming Method and Method of Manufacturing Semiconductor Device
Polymer Material, Composition, and Method of Manufacturing Semiconductor Device
Plasma Processing Apparatus and Plasma Processing Method
Polymer Material, Composition, and Method of Manufacturing Semiconductor Device
Related Assignments
(4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Sep 6, 2019
From: SASAO, NORIKATSU; ASAKAWA, KOJI; SUGIMURA, SHINOBU
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050291/0099 →
Assignment of Assignor's Interest
Sep 6, 2019
From: SASAO, NORIKATSU; ASAKAWA, KOJI; SUGIMURA, SHINOBU
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050291/0389 →
Assignment of Assignor's Interest
Sep 6, 2019
From: ASAKAWA, KOJI; SASAO, NORIKATSU; SUGIMURA, SHINOBU
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050291/0922 →
Merger and Change of Name
Jan 27, 2022
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 059450/0525 →