IP Library Granted Patent US 11,017,988
Granted Patent B2
US 11,017,988 · App. 16/572,183 · Granted May 25, 2021

Charged particle beam apparatus

Inventors: Hiroshi Oba (Tokyo, JP); Yasuhiko Sugiyama (Tokyo, JP); Yasutaka Otsuka (Tokyo, JP)
Assignee: HITACH HIGH-TECH SCIENCE CORPORATION
H01J37/32935H01J37/3244H01J37/32082H01J37/32422H01J2237/24564
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Quick Facts
Patent No.
US 11,017,988
App. No.
16/572,183
Granted
May 25, 2021
Kind
B2
Abstract

An charged particle beam apparatus includes: a gas introduction chamber to which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber; a coil wound around an outer circumference of the plasma generation chamber and receiving a high-frequency power; an extraction electrode applying an extraction voltage to plasma discharged from a plasma aperture at an outlet of the plasma generation chamber; an ampere meter measuring a magnitude of a plasma current caused by the plasma moved out of the plasma aperture; an extraction voltage calculator calculating, based on variation in the magnitude of the plasma current measured by the ampere meter with respect to variation in the extraction voltage, an extraction voltage set value; and a controller controlling the extraction voltage based on the extraction voltage set value calculated by the extraction voltage calculator.

Claims (28)

1. A charged particle beam apparatus comprising:

a gas introduction chamber to which raw gas is introduced;

a plasma generation chamber connected to the gas introduction chamber;

a coil wound around an outer circumference of the plasma generation chamber and receiving high-frequency power;

an extraction electrode applying an extraction voltage to plasma discharged from a plasma aperture at an outlet of the plasma generation chamber;

an ampere meter measuring a magnitude of an accelerating current caused by the plasma flowing from the plasma aperture toward an accelerating electrode and/or a current introduced to the extraction electrode caused by the plasma flowing from the plasma aperture to the extraction electrode among a plasma current caused by the plasma moved out of the plasma aperture;

an extraction voltage calculator calculating, based on variation in the magnitude of the plasma current measured by the ampere meter with respect to variation in the extraction voltage, an extraction voltage set value which is a set value of the extraction voltage; and

a controller controlling the extraction voltage based on the extraction voltage set value calculated by the extraction voltage calculator,

the extraction voltage calculator calculates, as the extraction voltage set value, the extraction voltage at a point of inflection at which the accelerating current reaches saturation with respect to the variation in the extraction voltage.

2. A charged particle beam apparatus comprising:

a gas introduction chamber to which raw gas is introduced;

a plasma generation chamber connected to the gas introduction chamber;

a coil wound around an outer circumference of the plasma generation chamber and receiving high-frequency power;

an extraction electrode applying an extraction voltage to plasma discharged from a plasma aperture at an outlet of the plasma generation chamber;

an ampere meter measuring a magnitude of an accelerating current caused by the plasma flowing from the plasma aperture toward an accelerating electrode and/or a current introduced to the extraction electrode caused by the plasma flowing from the plasma aperture to the extraction electrode among a plasma current caused by the plasma moved out of the plasma aperture;

an extraction voltage calculator calculating, based on variation in the magnitude of the plasma current measured by the ampere meter with respect to variation in the extraction voltage, an extraction voltage set value which is a set value of the extraction voltage; and

a controller controlling the extraction voltage based on the extraction voltage set value calculated by the extraction voltage calculator,

wherein the extraction voltage calculator calculates, as the extraction voltage set value, the extraction voltage at a point of inflection at which the current introduced to the extraction electrode reaches saturation with respect to the variation in the extraction voltage.

3. The charged particle beam apparatus of claim 1 , wherein the extraction voltage calculator calculates the extraction voltage set value from a point of inflection that is determined based on an increased amount of the plasma current with respect to the variation in the extraction voltage.

4. The charged particle beam apparatus of claim 2 , wherein the extraction voltage calculator calculates the extraction voltage set value from a point of inflection that is determined based on an increased amount of the plasma current with respect to the variation in the extraction voltage.

5. The charged particle beam apparatus of claim 1 , wherein the extraction voltage set value is calculated for each plasma generation condition, and

the controller controls the extraction voltage, based on the extraction voltage set value that is associated with the plasma generation condition.

6. The charged particle beam apparatus of claim 2 , wherein the extraction voltage set value is calculated for each plasma generation condition, and

the controller controls the extraction voltage, based on the extraction voltage set value that is associated with the plasma generation condition.

7. The charged particle beam apparatus of claim 3 , wherein the extraction voltage set value is calculated for each plasma generation condition, and

the controller controls the extraction voltage, based on the extraction voltage set value that is associated with the plasma generation condition.

8. The charged particle beam apparatus of claim 4 , wherein the extraction voltage set value is calculated for each plasma generation condition, and

the controller controls the extraction voltage, based on the extraction voltage set value that is associated with the plasma generation condition.

Assignments (3)
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072905/0225 →
CHNAGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0725 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 18, 2019
From: OBA, HIROSHI; SUGIYAMA, YASUHIKO; OTSUKA, YASUTAKA
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 050410/0339 →
Priority Claims (1)
JP JP2018-202662 · Oct 29, 2018 · national
Continuity (1)
Related Publication 20200135437A1 · Apr 30, 2020