IP Library Granted Patent US 10,763,074
Granted Patent B2
US 10,763,074 · App. 16/576,252 · Granted Sep 1, 2020

Charged particle beam apparatus, observation method using charged particle beam apparatus, and program

Inventors: Hiroyuki Chiba (Tokyo, JP); Yoshinobu Hoshino (Tokyo, JP); Shigeru Kawamata (Tokyo, JP)
Assignee: HITACHI HIGH-TECH CORPORATION
H01J37/244H01J37/20H01J37/22H01J37/24H01J37/28H01J37/29H01J2237/20214H01J2237/221H01J2237/2442H01J2237/2448H01J2237/24475H01J2237/2823
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,763,074
App. No.
16/576,252
Granted
Sep 1, 2020
Kind
B2
Abstract

A charged particle beam apparatus includes: an optical system that irradiates a sample mounted on a sample stage with a charged particle beam; at least one detector that detects a signal generated from the sample; an imaging device that acquires an observation image; a mechanism for changing observation positions in the sample which has at least one of a stage that moves the sample stage and a deflector that changes the charged particle beam's irradiation position; a display unit that displays an operation screen provided with an observation image displaying portion that displays the observation image and an observation position displaying portion that displays an observation position of the observation image; and a controller that controls display processing of the operation screen. The controller superimposes and displays on the observation position displaying portion a plurality of observation position images at different magnifications, based on the observation images' magnifications and coordinates.

Claims (11)

1. A charged particle beam apparatus comprising:

an optical system that irradiates a sample mounted on a sample stage with a charged particle beam;

an imaging device that acquires an image by irradiating the sample with the charged particle beam; and

a controller that controls at least one of a stage that moves the sample stage and a deflector that changes an irradiation position of the charged particle beam to change an area of the image to be captured so as to output the image acquired by the imaging device to a display unit,

wherein the controller outputs:

a first image acquired by the imaging device at a first magnification to a first region of the display unit;

a second image acquired in a past by the imaging device at a second magnification lower than the first magnification to a second region of the display unit; and

the first image at higher resolution than that of the second image by superimposing it on the second image based on the irradiation position, when the first image output to the first region is additionally output to the second region,

wherein the controller displays the first image and the second image, in superimposition with a sample holder figure.

2. The charged particle beam apparatus according to claim 1 , wherein the second region can display a wider area than the first region.

3. The charged particle beam apparatus according to claim 1 , wherein a position corresponding to that of the first region is displayed on the second region.

Assignments (2)
CHANGE OF NAME Recorded May 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052662/0726 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 23, 2019
From: CHIBA, HIROYUKI; HOSHINO, YOSHINOBU; KAWAMATA, SHIGERU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 050460/0697 →
Continuity (2)
Continuation 15773445
Related Publication 20200013583A1 · Jan 9, 2020