IP Library Granted Patent US 11,056,202
Granted Patent B2
US 11,056,202 · App. 16/591,819 · Granted Jul 6, 2021

Semiconductor memory device capable of shortening erase time

Inventor: Noboru Shibata (Kawasaki, JP)
Assignee: Toshiba Memory Corporation
G11C16/3445G11C16/10G11C16/14G11C16/26
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Quick Facts
Patent No.
US 11,056,202
App. No.
16/591,819
Granted
Jul 6, 2021
Kind
B2
Abstract

In a memory cell array, a plurality of memory cells connected to a plurality of word lines and a plurality of bit lines are arranged in a matrix. A control circuit controls the potentials of said plurality of word lines and said plurality of bit lines. In an erase operation, the control circuit erases an n number of memory cells (n is a natural number equal to or larger than 2) of said plurality of memory cells at the same time using a first erase voltage, carries out a verify operation using a first verify level, finds the number of cells k(k≤n) exceeding the first verify level, determines a second erase voltage according to the number k, and carries out an erase operation again using the second erase voltage.

Claims (18)

1. A semiconductor memory device comprising:

a memory cell array in which a plurality of memory cells are connected to a plurality of word lines and a plurality of bit lines; and

a control circuit which controls the potentials of the plurality of word lines and the plurality of bit lines,

wherein, in an erase operation, the control circuit erases the plurality of memory cells connected to n word lines of the plurality of word lines simultaneously, and carries out a verify operation for m memory cells in the n word lines using a first verify level and a counting operation to determine whether the threshold voltage of k(k≤m) number of memory cells has reached a threshold level in the erase operation.

2. The semiconductor memory device according to claim 1 , wherein, in the verify operation, a first voltage is applied to a specific word line of the n word lines, and a second voltage is applied to another word line adjacent to the specific word line, the second voltage being lower than a voltage to be applied to the another word line when a read operation is performed on the memory cells connected to the specific word line.

3. The semiconductor memory device according to claim 1 , wherein the n word lines comprise one or a plurality of word lines.

4. The semiconductor memory device according to claim 1 , wherein the n word lines are at least three word lines arranged in order.

5. A semiconductor memory device comprising:

a memory cell array in which a plurality of memory cells are connected to a plurality of word lines and a plurality of bit lines; and

a control circuit which controls the potentials of the plurality of word lines and the plurality of bit lines,

wherein, in an erase operation, the control circuit erases the plurality of memory cells connected to n word lines of the plurality of word lines simultaneously and then performs a write operation on the plurality of memory cells connected to the n word lines simultaneously, and carries out a verify operation for m memory cells in the n word lines using a first verify level and a counting operation to determine whether the threshold voltage of k(k≤m) number of memory cells has reached a threshold level in the erase operation.

6. The semiconductor memory device according to claim 5 , wherein, in verify operation, a first voltage is applied to a specific word line of the n word lines, and a second voltage is applied to another word line adjacent to the specific word line, the second voltage being lower than a voltage to be applied to the another word line when a read operation is performed on the memory cells connected to the specific word line.

7. The semiconductor memory device according to claim 5 , wherein the n word lines comprise one or a plurality of word lines.

8. The semiconductor memory device according to claim 5 , wherein the n word lines are at least three word lines arranged in order.

9. The semiconductor memory device according to claim 1 , wherein when the threshold voltages of all the k number of memory cells have not reached the threshold level, an erase voltage is increased and the erase operation is repeated.

10. The semiconductor memory device according to claim 5 , wherein when the threshold voltages of all the k number of memory cells have not reached the threshold level, an erase voltage is increased and the erase operation is repeated.

11. The semiconductor memory device according to claim 1 , wherein the erase operation further includes a soft program operation and a second verify operation using a second verify level, and when the threshold voltages of all the k number of memory cells have not reached the threshold level in the second verify operation, the second verify level is increased and the soft program operation is repeated.

12. The semiconductor memory device according to claim 5 , wherein the erase operation further includes a soft program operation and a second verify operation using a second verify level, and when the threshold voltages of all the k number of memory cells have not reached the threshold level in the second verify operation, the second verify level is increased and the soft program operation is repeated.

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Sep 7, 2021
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 057426/0778 →
CHANGE OF NAME Recorded Sep 7, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 057426/0836 →
Priority Claims (2)
JP 2007-322415 · Dec 13, 2007 · national
JP 2007-338363 · Dec 27, 2007 · national
Continuity (7)
Continuation 16023103 · Jun 29, 2018
Continuation 15422640 · Feb 2, 2017
Continuation 14597787 · Jan 15, 2015
Continuation 13660044 · Oct 25, 2012
Continuation 13162051 · Jun 16, 2011
Continuation 12332681 · Dec 11, 2008
Related Publication 20200035311A1 · Jan 30, 2020