Ceramic-metal substrate with low amorphous phase
A ceramic-metal substrate in which the ceramic substrate has a low content of an amorphous phase. The ceramic-metal substrate includes a ceramic substrate and on at least one side of the ceramic substrate a metallization. The ceramic-metal substrate has at least one scribing line, at least one cutting edge, or both at least one scribing line and at least one cutting edge. Amorphous phases extend parallel to the scribing line and/or the cutting edge in a width of at most 100 μm or of at least 0.50 μm.
1. A ceramic-metal substrate comprising:
a ceramic substrate having sides and at least one scribing line and/or cutting edge;
a metallization on at least one side of the ceramic substrate; and
amorphous phases that extend parallel to the scribing line and/or the cutting edge in the ceramic substrate only, and not in the metallization, and have a width in a range of at least 20 μm and at most 100 μm.
2. The ceramic-metal substrate according to claim 1 , wherein the ceramic substrate has at least one scribing line with an edge and the amorphous phases extend, starting from the scribing line and running parallel to the scribing line, and the width, calculated from the edge of the scribing line, is at least 20 μm and at most 50 μm.
3. The ceramic-metal substrate according to claim 1 , wherein the ceramic substrate has at least one scribing line with a center line and the amorphous phases extend, starting from the scribing line and running parallel to the scribing line, and the width, calculated from the center line of the scribing line, is at least 20 μm and at most 100 μm.
4. The ceramic-metal substrate according to claim 1 , wherein the ceramic substrate has at least one cutting edge with an inner edge and the amorphous phases extend, starting from the inner edge of the cutting edge and running parallel to the cutting edge, and the width, calculated from the inner edge of the cutting edge, is at least 20 μm and at most 50 μm.
5. The ceramic-metal substrate according to claim 1 , wherein the ceramic substrate has at least one cutting edge with an outer edge and the amorphous phases extend, starting from the outer edge of the cutting edge and running parallel to the cutting edge, and the width, calculated from the outer edge of the cutting edge, is at least 20 μm and at most 100 μm.
6. The ceramic-metal substrate according to claim 1 , wherein the scribing line and/or cutting edge is obtained by laser ablation.
7. The ceramic-metal substrate according to claim 6 , wherein formation of the amorphous phases is controlled by the laser speed and/or power of the laser ablation.
8. The ceramic-metal substrate according to claim 1 , wherein the ceramic substrate has a layer thickness and a depth of the scribing line is 5 to 50% of the layer thickness of the ceramic substrate.
9. The ceramic-metal substrate according to claim 8 , wherein the depth of the scribing line is 8 to 45% of the layer thickness of the ceramic substrate.
10. The ceramic-metal substrate according to claim 9 , wherein the depth of the scribing line is 10 to 40% of the layer thickness of the ceramic substrate.
11. The ceramic-metal substrate according to claim 10 , wherein the depth of the scribing line is 20 to 40% of the layer thickness of the ceramic substrate.
12. The ceramic-metal substrate according to claim 1 , wherein the ceramic substrate has a planar surface and a depth of the scribing line is at least 20 μm perpendicular to the planar surface of the ceramic substrate.
13. The ceramic-metal substrate according to claim 12 , wherein the depth of the scribing line is at least 30 μm perpendicular to the planar surface of the ceramic substrate.
14. The ceramic-metal substrate according to claim 13 , wherein the depth of the scribing line is at least 50 μm perpendicular to the planar surface of the ceramic substrate.
15. A method of using the ceramic-metal substrate according to claim 1 as a circuit carrier for power electronics applications.