Wafer bonded piezoresistive and piezoelectric force sensor and related methods of manufacture
Described herein is a ruggedized microelectromechanical (“MEMS”) force sensor. The sensor employs piezoresistive or piezoelectric sensing elements for force sensing where the force is converted to strain and converted to electrical signal. In one aspect, both the piezoresistive and the piezoelectric sensing elements are formed on one substrate and later bonded to another substrate on which the integrated circuitry is formed. In another aspect, the piezoelectric sensing element is formed on one substrate and later bonded to another substrate on which both the piezoresistive sensing element and the integrated circuitry are formed.
1. A microelectromechanical (“MEMS”) force sensor, comprising:
a sensor die configured to receive an applied force, wherein the sensor die comprises a plurality of substrates bonded together,
a piezoresistive sensing element arranged on a first substrate of the sensor die, wherein the piezoresistive sensing element is configured to convert a strain to a first analog electrical signal that is proportional to the strain,
a piezoelectric sensing element arranged on the first substrate of the sensor die, wherein the piezoelectric sensing element is configured to convert a change in strain to a second analog electrical signal that is proportional to the change in strain, and
digital circuitry arranged on a second substrate of the sensor die, wherein the digital circuitry is configured to convert the first and second analog electrical signals to respective digital electrical output signals.
2. The MEMS force sensor of claim 1 , wherein the piezoresistive sensing element at least partially overlaps with a solder ball.
3. The MEMS force sensor of claim 1 , wherein the piezoelectric sensing element at least partially overlaps with a solder ball.
4. The MEMS force sensor of claim 1 , wherein the piezoresistive sensing element is formed by diffusion or implantation.
5. The MEMS force sensor of claim 1 , wherein the piezoresistive sensing element is p-type formed on an n-type substrate.
6. The MEMS force sensor of claim 1 , wherein the piezoresistive sensing element is p-type formed in an n-type well on a p-type substrate.
7. The MEMS force sensor of claim 1 , wherein the piezoresistive sensing element is n-type formed on a p-type substrate.
8. The MEMS force sensor of claim 1 , wherein the piezoresistive sensing element is n-type formed in a p-type well on an n-type substrate.
9. The MEMS force sensor of claim 1 , wherein the piezoelectric sensing element comprises at least one of aluminum nitride (AlN), zinc oxide (ZnO), lead zirconate titanate (PZT), lithium niobate (LiNbO3), barium titanate (BaTiO3), sodium potassium niobate (KNN), or polyvinylidene fluoride (PVDF).
10. A microelectromechanical (“MEMS”) force sensor, comprising:
a sensor die configured to receive an applied force, wherein the sensor die comprises a plurality of substrates bonded together,
a piezoresistive sensing element arranged on a first substrate of the sensor die, wherein the piezoresistive sensing element is configured to convert a strain to a first analog electrical signal that is proportional to the strain,
a piezoelectric sensing element arranged on a second substrate of the sensor die, wherein the piezoelectric sensing element is configured to convert a change in strain to a second analog electrical signal that is proportional to the change in strain, and
digital circuitry arranged on the first substrate of the sensor die, wherein the digital circuitry is configured to convert the first and second analog electrical signals to respective digital electrical output signals.
11. The MEMS force sensor of claim 10 , wherein the piezoresistive sensing element at least partially overlaps with a solder ball.
12. The MEMS force sensor of claim 10 , wherein the piezoelectric sensing element at least partially overlaps with a solder ball.
13. The MEMS force sensor of claim 10 , wherein the piezoresistive sensing element is formed by diffusion or implantation.
14. The MEMS force sensor of claim 10 , wherein the piezoresistive sensing element is p-type formed on an n-type substrate.
15. The MEMS force sensor of claim 10 , wherein the piezoresistive sensing element is p-type formed in an n-type well on a p-type substrate.
16. The MEMS force sensor of claim 10 , wherein the piezoresistive sensing element is n-type formed on a p-type substrate.
17. The MEMS force sensor of claim 10 , wherein the piezoresistive sensing element is n-type formed in a p-type well on an n-type substrate.
18. The MEMS force sensor of claim 10 , wherein the piezoelectric sensing element comprises at least one of aluminum nitride (AlN), zinc oxide (ZnO), lead zirconate titanate (PZT), lithium niobate (LiNbO3), barium titanate (BaTiO3), or sodium potassium niobate (KNN).