Methods and apparatus for use in a device manufacturing method
Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.
1. A method for reconstructing a free-form geometry of a substrate, the method comprising:
positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry;
measuring a height map of the deformed substrate; and
reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map, the free-form geometry being that of the substrate prior to being positioned in contact with the substrate holder.
2. The method of claim 1 , wherein the retaining force comprises a clamping force, wherein the method further comprises controlling the clamping force to impart the expected deformation of the substrate based on a characteristic of the substrate, and wherein the measuring a height map of the deformed substrate is performed with the substrate subject to the controlled clamping force.
3. The method of claim 2 , wherein the clamping force is further controlled based on a stiffness property of the substrate holder.
4. The method of claim 2 , wherein the characteristic of the substrate comprises any of: an expected magnitude of the deformation of the deformed substrate, a stiffness property of the substrate, or a context of the substrate.
5. The method of claim 1 , wherein a level sensor within a lithographic apparatus is used to measure the height map and the substrate holder is located within the lithographic apparatus.
6. The method of claim 1 , further comprising measuring a plurality of height maps at a plurality of retaining forces, and wherein the reconstructing the free-form geometry of the substrate is further based on the plurality of measured height maps.
7. The method of claim 1 , further comprising using the reconstructed free-form geometry of the substrate to predict an in-plane deformation of the substrate subject to a clamping force used for processing of the substrate.
8. The method of claim 7 , further comprising updating an alignment model for processing the substrate based on the predicted in-plane deformation of the substrate.
9. The method of claim 7 , further comprising determining a location on the deformed substrate having a higher probability of a defect based on the in-plane deformation of the substrate.
10. The method of claim 1 , further comprising using the reconstructed free-form geometry to classify the substrate.
11. The method of claim 1 , wherein the reconstructing the free-form geometry of the substrate is further based on position information of alignment markers.
12. The method of claim 1 , wherein the reconstructing the geometry of the substrate is further based on context information of the deformed substrate.
13. The method of claim 1 , further comprising controlling a subsequent processing step based on the free-form geometry of the substrate.
14. The method of claim 1 , wherein the reconstructing the free-form geometry of the substrate further comprises subtracting a reference height map associated with a geometry of the substrate holder from the measured height map.
15. The method of claim 1 , wherein the substrate holder comprises one or more ejector pins, and wherein the retaining force comprises a gravitational force of the substrate resting on the one or more ejector pins.
16. A computer program product comprising a non-transitory computer-readable medium having instructions therein, the instructions, when executed by a processor system, configured to cause the processor system to at least:
obtain a height map of a substrate deformed from a free-form geometry of the substrate, wherein the height map was measured while the substrate was positioned on a substrate holder configured to retain the substrate under a retaining force deforming the substrate from its free-form geometry; and
reconstruct the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map, the free-form geometry being that of the substrate prior to being positioned in contact with the substrate holder.
17. The computer program product of claim 16 , wherein the instructions are further configured to use the reconstructed free-form geometry of the substrate to predict an in-plane deformation of the substrate subject to a clamping force used for processing of the substrate.
18. An apparatus configured to reconstruct a free-form geometry of a substrate, the apparatus comprising a processor configured to at least:
obtain a height map of a substrate deformed from a free-form geometry of the substrate, wherein the height map was measured while the substrate was positioned on a substrate holder configured to retain the substrate under a retaining force deforming the substrate from its free-form geometry; and
reconstruct the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map, the free-form geometry being that of the substrate prior to being positioned in contact with the substrate holder.
19. A metrology or inspection apparatus comprising the apparatus of claim 18 .
20. A lithographic apparatus comprising the apparatus of claim 18 .