Substrate processing apparatus and substrate processing method
A substrate processing apparatus includes: a processing unit including a holder that holds a substrate and rotates the substrate, a nozzle that ejects a processing liquid, and a conductive piping unit that supplies the processing liquid to the nozzle; a controller that causes the processing unit to execute a liquid processing in which the substrate is processed by supplying the processing liquid from the nozzle to the substrate that is held and rotated by the holder, and a measuring unit that measures a flowing current generated by the processing liquid flowing through the piping unit. The controller monitors the liquid processing based on a measurement result by the measuring unit.
1. A substrate processing apparatus comprising:
a processing chamber including a holder configured to hold a substrate and a motor configured to rotate the substrate, a nozzle configured to eject a processing liquid, and a conductive pipe that supplies the processing liquid to the nozzle;
a first wiring connected to the conductive pipe and including a gauge configured to measure a flowing current generated by the processing liquid flowing through the conductive pipe;
a second wiring connected to a housing of the motor; and
a controller configured to control an overall operation of the substrate processing apparatus,
wherein the controller is configured to:
supply the processing liquid from the nozzle to the substrate that is held by the holder and rotated by the motor,
measure a flowing current generated by the processing liquid flowing through the pipe via a conduction path formed between the first wiring and the second wiring using the gauge, and
monitor a liquid processing based on a measurement result obtained by the gauge.
2. The substrate processing apparatus according to claim 1 , further comprising:
a storage that stores flowing current information in which a processing condition of the liquid processing is associated with a value of the flowing current,
wherein the controller detects an abnormality of the liquid processing based on the measurement result obtained by the gauge and the flowing current information.
3. The substrate processing apparatus according to claim 2 , wherein the controller detects at least one of rupture of the pipe, breakage of the substrate, and insulation of the holder as an abnormality of the liquid processing.
4. The substrate processing apparatus according to claim 3 , wherein the flowing current information includes a type of the processing liquid as the processing condition of the liquid processing, and
the controller detects a concentration abnormality of the liquid processing based on the measurement result obtained by the gauge and the flowing current information.
5. The substrate processing apparatus according to claim 4 , wherein the flowing current information includes a temperature of the processing liquid as the processing condition of the liquid processing, and
the controller detects a temperature abnormality of the liquid processing based on the measurement result obtained by the gauge and the flowing current information.
6. The substrate processing apparatus according to claim 5 , wherein the controller detects an occurrence of discharge during the liquid processing based on the measurement result obtained by the gauge.
7. The substrate processing apparatus according to claim 6 , wherein the controller detects a timing at which the processing liquid on the substrate is replaced from a first processing liquid to a second processing liquid based on the measurement result obtained by the gauge.
8. The substrate processing apparatus according to claim 7 , further comprising:
a mover that moves the nozzle along a diametrical direction of the substrate,
wherein the controller supplies the processing liquid from nozzle to the substrate that is held by the holder and rotated by the motor while moving the nozzle using the mover along the diametrical direction of the substrate, and
estimates a distribution of a charge amount in the diametrical direction of the substrate based on the measurement result obtained by the gauge.
9. The substrate processing apparatus according to claim 8 , comprising:
a current supply that supplies a current in a direction opposite to the flowing current to a conduction path of the flowing current,
wherein the controller controls an output of the current supply based on a measurement result obtained by the gauge.
10. The substrate processing apparatus according to claim 2 , wherein the flowing current information includes a type of the processing liquid as the processing condition of the liquid processing, and
the controller detects a concentration abnormality of the liquid processing based on the measurement result obtained by the gauge and the flowing current information.
11. The substrate processing apparatus according to claim 2 , wherein the flowing current information includes a temperature of the processing liquid as the processing condition of the liquid processing, and
the controller detects a temperature abnormality of the liquid processing based on the measurement result obtained by the gauge and the flowing current information.
12. The substrate processing apparatus according to claim 1 , wherein the controller detects an occurrence of discharge during the liquid processing based on the measurement result obtained by the gauge.
13. The substrate processing apparatus according to claim 1 , wherein the controller detects a timing at which the processing liquid on the substrate is replaced from a first processing liquid to a second processing liquid based on the measurement result obtained by the gauge.
14. The substrate processing apparatus according to claim 1 , further comprising:
a mover that moves the nozzle along a diametrical direction of the substrate,
wherein the controller supplies the processing liquid from nozzle to the substrate that is held by the holder and rotated by the motor while moving the nozzle using the mover along the diametrical direction of the substrate, and estimates a distribution of a charge amount in the diametrical direction of the substrate based on the measurement result obtained by the gauge.
15. The substrate processing apparatus according to claim 1 , further comprising:
a current supply that supplies a current in a direction opposite to the flowing current to a conduction path of the flowing current,
wherein the controller controls an output of the current supply based on a measurement result obtained by the gauge.
16. A substrate processing method comprising:
providing a processing chamber including a holder configured to hold a substrate and a motor configured to rotate the substrate, a nozzle configured to eject a processing liquid, and a conductive pipe that supplies the processing liquid to the nozzle;
holding the substrate with the holder and rotating the substrate with the motor;
supplying the processing liquid from the nozzle to the substrate while the substrate is being rotated;
measuring a flowing current generated by the processing liquid flowing through the pipe via a conduction path formed between a first wiring connected to the conductive pipe and a second wiring connected to a housing of the motor; and
monitoring a liquid processing based on a measurement result obtained in the measuring.