Semiconductor packages and method of forming the same

1. A semiconductor package, comprising:

a first die;

a second die bonded to the first die;

a through via, disposed aside the second die and electrically connected to the first die, the through via comprising a first portion having a first width and a second portion having a second width different from the first width, the second portion disposed between the first portion and the first die, wherein the first portion comprises a first seed layer and a first conductive layer, the second portion comprises a second seed layer and a second conductive layer, the first seed layer is disposed aside an interface between the first conductive layer and the second conductive layer, and the second seed layer is disposed between the second conductive layer and the dielectric encapsulation and between the second conductive layer and the first die; and

a dielectric encapsulation, encapsulating the second die and the through via.

2. The semiconductor package of claim 1 , wherein the first seed layer is physically separated from the second seed layer.

3. The semiconductor package of claim 1 , wherein the first seed layer is integrally formed with the second seed layer.

4. The semiconductor package of claim 1 , further comprises a plurality of first vias and a plurality of second vias aside the through via in the dielectric encapsulation, wherein the first vias and the second vias are alternately disposed and have top surfaces substantially coplanar with a top surface of the through via, and the first vias are electrically isolated from the second vias.

5. The semiconductor package of claim 4 , wherein the first vias are electrically connected to each other, and the second vias are electrically connected to each other.

6. The semiconductor package of claim 1 , wherein the dielectric encapsulation is in direct contact with the second die and the second portion of the through via.

7. The semiconductor package of claim 1 , further comprising a dielectric layer different from the dielectric encapsulation, wherein the dielectric layer is disposed between the dielectric encapsulation and the first portion of the through via.

8. A semiconductor package, comprising:

a first die;

a plurality of second dies bonded to the first die;

a through via, disposed between the second dies and electrically connected to the first die, wherein the through via comprises a first portion and a second portion between the first portion and the first die;

a first dielectric layer, encapsulating the first portion; and

a second dielectric layer different from the first dielectric layer, encapsulating the second dies, the second portion of the through via and the first dielectric layer.

9. The semiconductor package of claim 8 , wherein the second dielectric layer is disposed between the second die and the first dielectric layer and between the second die and the first portion.

10. The semiconductor package of claim 8 , wherein a bottom surface of the first dielectric layer is substantially levelled with an interface between the first portion and the second portion.

11. The semiconductor package of claim 8 , wherein top surfaces of the second dies, the first dielectric layer, the through via and the second dielectric layer are substantially coplanar.

12. The semiconductor package of claim 8 , wherein a width of the first portion is different from a width of the second portion.

13. The semiconductor package of claim 8 , wherein the first portion comprises a first conductive layer and a first seed layer beneath a bottom of the first conductive layer, and the second portion comprises a second conductive layer and a second seed layer surrounding a sidewall and a bottom of the second conductive layer.

14. A method of forming a semiconductor package, comprising:

providing a first die and a plurality of second dies bonded to the first die;

forming a first dielectric layer over the first die to cover the plurality of second dies;

forming a first opening in the first dielectric layer between the second dies;

forming a through via partially in the first opening and partially protruding from the first opening, wherein a first portion of the through via protruding from the first opening has a first width, and a second portion of the through via in the first opening has a second width different from the first width; and

forming a second dielectric layer between the through via and the first dielectric layer on a sidewall of the second die.

15. The method of claim 14 , wherein the first dielectric layer is conformally formed with top surfaces and sidewalls of the second dies and a top surface of the first die between the second dies.

16. The method of claim 14 , wherein the first dielectric layer is formed between and in contact with the second dielectric layer and the second die.

17. The method of claim 14 , wherein forming the through via comprises:

forming a seed layer over the first dielectric layer having the first opening;

forming a mask over the seed layer, the mask having a second opening larger than the first opening and exposing a portion of the seed layer in the first opening;

forming a conductive layer in the first opening and the second opening;

removing the mask, wherein a spacing is formed between the first dielectric layer and the conductive layer; and

removing the seed layer not covered by the conductive layer.

18. The method of claim 17 , wherein forming the second dielectric layer comprises:

forming the second dielectric layer to cover the first dielectric layer and the conductive layer and fill the spacing; and

planarizing top surfaces of the first dielectric layer, the second dielectric layer, the conductive layer and the second die.

19. The method of claim 14 , wherein forming the through via comprises:

filling a first conductive layer and a first seed layer surrounding the first conductive layer into the first opening;

forming a second seed layer over the first dielectric layer, the first conductive layer and the first seed layer;

forming a mask over the second seed layer, the mask having a second opening smaller than the first opening;

forming a second conductive layer in the second opening;

removing the mask, wherein a spacing is formed between the first dielectric layer and the second conductive layer; and

removing the second seed layer not covered by the second conductive layer.

20. The method of claim 19 , wherein forming the second dielectric layer comprises:

forming the second dielectric layer to cover the first dielectric layer and the second conductive layer and fill the spacing; and

planarizing top surfaces of the first dielectric layer, the second dielectric layer, the second conductive layer and the second die.