IP Library › Granted Patent US 12,237,189
Granted Patent B2
US 12,237,189 · App. 16/688,238 · Granted Feb 25, 2025

Wafer storage devices configured to measure physical properties of wafers stored therein

Inventor: Nagasubramaniyan Chandrasekaran (Boise, ID)
Assignee: Micron Technology, Inc.
H01L21/67288G01N21/9501H01L21/67253H01L21/6732H01L21/67383H01L21/67386H01L21/6773H01L21/6875H01L22/12
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Quick Facts
Patent No.
US 12,237,189
App. No.
16/688,238
Granted
Feb 25, 2025
Kind
B2
Abstract

A wafer storage device may include one or more mutually aligned rails extending from two opposing side walls, each pair of mutually aligned rails configured to support a wafer between the side walls. The wafer storage device includes one or more sensors coupled to at least some of the one or more rails. The one or more sensors may be configured to detect a physical property of the wafer. The wafer storage device may further include a processor configured to analyze data from the one or more sensors, and a memory device. The memory device may be configured to store data produced by at least the one or more sensors or the processor. The wafer storage device may also include a power storage device configured to receive power from an external source and supply power to the one or more sensors and the processor.

Claims (8)

1. A wafer storage device comprising:

one or more mutually aligned rails having a top surface and a bottom surface, the one or more mutually aligned rails extending in alignment from opposing side walls of the wafer storage device,

the opposing side walls separated by a top wall, a bottom wall, and a back wall together enclosing a chamber having a mouth, wherein the one or more mutually aligned rails are spaced and configured, in combination, to support a wafer within the chamber of the wafer storage device,

the top surface of the one or more mutually aligned rails positioned a first distance from the top wall of the wafer storage device, and

the bottom surface of the one or more mutually aligned rails positioned a second distance, greater than the first distance, from the top wall of the wafer storage device; and

a sensor array positioned along one or both rails of each set of mutually aligned rails in a direction substantially parallel to the side wall, wherein at least one sensor of the sensor array is positioned on a bottom surface of the set of mutually aligned rails;

wherein the sensor array is configured to measure at least one physical property of a wafer supported on each respective set of rails and wherein the at least one sensor positioned on the bottom surface of the set of mutually aligned rails is configured to measure at least one physical property of a second wafer supported on a set of rails positioned beneath the respective set of rails.

2. The wafer storage device of claim 1 , wherein the sensor array is positioned along an inner edge of a respective rail, and further comprising a second sensor array positioned along an outer edge of the respective rail adjacent to the side wall.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2019
From: CHANDRASEKARAN, NAGASUBRAMANIYAN
To: MICRON TECHNOLOGY, INC.
Reel/Frame 051052/0158 →
Continuity (1)
Related Publication 20210151338A1 · May 20, 2021
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