Silicon mandrel etch after native oxide punch-through
Apparatus, systems, and methods for conducting a silicon containing material removal process on a workpiece are provided. In one example implementation, the method can include generating species from a process gas in a first chamber using an inductive coupling element. The method can include introducing a fluorine containing gas with the species to create a mixture. The mixture can include exposing a silicon structure of the workpiece to the mixture to remove at least a portion of the silicon structure.
1. A method for removing a silicon structure disposed on a workpiece, the workpiece disposed in a second chamber that is separated from a first chamber by a separation grid, the separation grid comprising a first grid plate disposed adjacent to the first chamber, a second grid plate disposed between the first grid plate and the third grid plate, and a third grid plate disposed adjacent to the second chamber, wherein the first grid plate, the second grid plate, and the third grid plate spaced in parallel relationship to one another, the method comprising:
generating a capacitively coupled plasma using a capacitively coupled plasma source in a second chamber, wherein the capacitively coupled plasma is generated at a power of about 1 W up to about 150 W;
exposing the silicon structure of the workpiece to the capacitively coupled plasma to remove at least a portion of a native oxide layer on top of the silicon structure;
subsequent to exposing the silicon structure of the workpiece to the capacitively coupled plasma, generating species from a process gas using an inductive coupling element in the first chamber;
introducing a fluorine containing gas with the species to create a mixture, wherein the fluorine containing gas is introduced by a gas injection source disposed between the second grid plate and the third grid plate; and
exposing the silicon structure of the workpiece to the mixture to remove at east a portion of the silicon structure.
2. The method of claim 1 , wherein the silicon structure comprises a silicon mandrel or a silicon replacement gate.
3. The method of claim 1 , wherein the process gas comprises hydrogen (H 2 ), helium (He), or argon (Ar).
4. The method of claim 1 , wherein the fluorine containing gas comprises one or more of nitrogen trifluoride (NF 3 ), tetrafluoromethane (CF 4 ), fluoroform (CHF 3 ), difluoromethane (CH 2 F 2 ), or fluoromethane (CH 3 F).
5. The method of claim 1 , wherein the fluorine containing gas is introduced as part of the process gas.
6. The method of claim 1 , wherein the fluorine containing gas is injected via a post-plasma gas injection gas source, the gas injection source located outside of the first chamber and at a downstream flow location from the first chamber to the second chamber.
7. The method of claim 1 , wherein the capacitively coupled plasma source is a bias electrode in the second chamber.
8. The method of claim 7 , wherein the first chamber and the second chamber are part of a processing apparatus.
9. The method of claim 7 , wherein the bias electrode is disposed underneath of the workpiece in the second chamber.
10. The method of claim 1 , wherein the capacitively coupled plasma is generated at a power of from about 10 W to about 50 W.