Patent Assignment
Reel/Frame 055950/0452
Release of Security Interest
Recorded: 2021-04-15
Pages: 19
Assignor
EAST WEST BANK
Executed: 2021-04-15
Assignee
MATTSON TECHNOLOGY, INC.
47131 BAYSIDE PKWY, FREMONT, CALIFORNIA, 94538
Covered Properties
(226)
Optical Radiation Measurement Apparatus
Method of Measuring Electromagnetic Radiation
Patent:
6,191,392 →
Application:
09/208,955 →
Gas Driven Rotating Susceptor for Rapid Thermal Processing (Rtp) System
Heating Device for Heating Semiconductor Wafers in Thermal Processing Chambers
Process for Forming Thin Dielectric Layers in Semiconductor Devices
Patent:
6,281,141 →
Application:
09/246,821 →
Spatially Resolved Temperature Measurement and Irradiance Control
Patent:
6,303,411 →
Application:
09/303,512 →
Heating Device for Heating Semiconductor Wafers in Thermal Processing Chambers
Patent:
6,717,158 →
Application:
09/478,247 →
High Intensity Electromagnetic Radiation Apparatus and Method
Patent:
6,621,199 →
Application:
09/492,917 →
Systems and Methods for Epitaxial Processing of a Semiconductor Substrate
Patent:
6,436,796 →
Application:
09/495,402 →
Localized Heating and Cooling of Substrates
Patent:
7,037,797 →
Application:
09/527,873 →
Pulse Precursor Deposition Process for Forming Layers in Semiconductor Devices
Patent:
6,808,758 →
Application:
09/590,464 →
Systems and Methods for Low Contamination, High Throughput Handling of Workpieces for Vacuum Processing
Patent:
6,647,665 →
Application:
09/651,453 →
Method of Producing a Semiconductor Surface Covered with Fluorine
Patent:
6,566,271 →
Application:
09/671,827 →
Method and Apparatus Device for the Heat Treatment of Substrates
Patent:
6,752,625 →
Application:
09/700,577 →
Heat-Treating Methods and Systems
Method and Apparatus for Calibrating Temperature Measurements Independent of Emissivity
Patent:
6,561,694 →
Application:
09/744,880 →
Heating Configuration for Use in Thermal Processing Chambers
Windows Used in Thermal Processing Chambers
Method and System for Rotating a Semiconductor Wafer in Processing Chambers
High temperature short time curing of low dielectric constant materials using rapid thermal processing techniques
Patent:
6,303,524 →
Application:
09/789,062 →
Method of measuring electromagnetic radiation
Rapid Thermal Processing System for Integrated Circuits
Spatially Resolved Temperature Measurement and Irradiance Control
Device and Method for Measuring the Temperature of Substrates
Patent:
6,847,012 →
Application:
09/913,269 →
Apparatus and Method for the Thermal Treatment of Substrates
Patent:
6,614,005 →
Application:
09/979,646 →
Systems and Methods for Enhancing Plasma Processing of a Semiconductor Substrate
Apparatuses and Methods for Resistively Heating a Thermal Processing System
Heat-Treating Methods and Systems
System and Process for Heating Semiconductor Wafers by Optimizing Absorption of Electromagnetic Energy
Method and Apparatus for the Thermal Treatment of Substrates
Patent:
7,041,610 →
Application:
10/111,737 →
Systems and Methods for Epitaxially Depositing Films on a Semiconductor Substrate
System and Process for Calibrating Pyrometers in Thermal Processing Chambers
Device for Thermal Treatment of Substrates
Pulsed Processing Semiconductor Heating Methods Using Combinations of Heating Sources
Method for the Removing of Adsorbed Molecules from a Chamber
Adjusting of Defect Profiles in Crystal or Crystalline-Like Structures
Apparatus and Method for Reducing Stray Light in Substrate Processing Chambers
Method of Forming and/or Modifying a Dielectric Film on a Semiconductor Surface
Torsionally Flexible Coupling, a Mold, and a Method of Producing Same
Miniature Vertically Polarized Multiple Frequency Band Antenna and Method of Providing an Antenna for a Wireless Device
Heat-Treating Methods and Systems
Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment
Method and Device for Thermal Treatment of Substrates
Method for Thermally Treating a Substrate That Comprises Several Layers
Temperature Measurement and Heat-Treating Methods and System
Device and Method for Thermally Treating Semiconductor Wafers
Method of Producing a Calibration Wafer
Process for Determining the Temperature of a Semiconductor Wafer in a Rapid Heating Unit
Method and Apparatus for Thermally Treating Disk-Shaped Substrates
Selective Reflectivity Process Chamber with Customized Wavelength Response and Method
Method for Rapidly Heating and Cooling Semiconductor Wafers
Method for Minimizing the Vapor Deposition of Tungsten Oxide During the Selective Side Wall Oxidation of Tungsten-Silicon Gates
Shadow-Free Shutter Arrangement and Method
Methods and systems for supporting a workpiece and for heat-treating the workpiece
Pulsed Processing Semiconductor Heating Methods Using Combinations of Heating Sources
Apparatus and Methods for Producing Electromagnetic Radiation
Endeffectors for Handling Semiconductor Wafers
Slotted Electrostatic Shield Modification for Improved Etch and Cvd Process Uniformity
Multi-Workpiece Processing Chamber
Heating Device for Heating Semiconductor Wafers in Thermal Processing Chambers
Low cost high throughput processing platform
System and Method for Removal of Photoresist in Transistor Fabrication for Integrated Circuit Manufacturing
Apparatuses and Methods for Suppressing Thermally-Induced Motion of a Workpiece
Apparatus and Method for Reducing Stray Light in Substrate Processing Chambers
Apparatus and Method for Measuring the Temperature of Substrates
System and Method for Removal of Photoresist and Residues Following Contact Etch with a Stop Layer Present
Advanced Low Cost High Throughput Processing Platform
Rapid Thermal Processing Using Energy Transfer Layers
Fast Heating and Cooling Apparatus for Semiconductor Wafers
Heating Configuration for Use in Thermal Processing Chambers
Pulsed Processing Semiconductor Heating Methods Using Combinations of Heating Sources
Enhanced Rapid Thermal Processing Apparatus and Method
Patent:
7,184,657 →
Application:
11/228,964 →
Temperature Measurement and Heat-Treating Methods and Systems
System and Process for Heating Semiconductor Wafers by Optimizing Absorption of Electromagnetic Energy
Heating Device for Heating Semiconductor Wafers in Thermal Processing Chambers
Optimizing the Thermal Budget During a Pulsed Heating Process
Method and Apparatus for Thermally Treating Substrates
Methods for Determining Wafer Temperature
Method and System for Determining Optical Properties of Semiconductor Wafers
Apparatus and Method for Reducing Stray Light in Substrate Processing Chambers
Selective Reflectivity Process Chamber with Customized Wavelength Response and Method
Repeatable heat-treating methods and apparatus
Slotted Electrostatic Shield Modification for Improved Etch and CVD Process Uniformity
Determining the Position of a Semiconductor Substrate on a Rotation Device
Low Cost High Throughput Processing Platform
Enhanced Rapid Thermal Processing Apparatus and Method
Method for the Thermal Treatment of Disk-Shaped Substrates
Post Ion Implant Photoresist Strip Using a Pattern Fill and Method
Advanced Processing Technique and System for Preserving Tungsten in a Device Structure
Method and System for Thermally Processing a Plurality of Wafer-Shaped Objects
Advanced Multi-Workpiece Processing Chamber
Multi-Workpiece Processing Chamber
Inductive Plasma Source with High Coupling Efficiency
Heating Configuration for Use in Thermal Processing Chambers
Plasma reactor with inductie excitation of plasma and efficient removal of heat from the excitation coil
System and Process for Heating Semiconductor Wafers by Optimizing Absorption of Electromagnetic Energy
Workpiece Support with Fluid Zones for Temperature Control
Systems and Methods for Supporting a Workpiece During Heat-Treating
Pulsed Processing Semiconductor Heating Methods and Associated System Using Combinations of Heating Sources
Determining the Temperature of Silicon at High Temperatures
Irradiance Pulse Heat-Treating Methods and Apparatus
Monitoring Witness Structures for Temperature Control in Rtp Systems
Calibration Substrate and Method of Calibration Therefor
Apparatus for Thermally Treating Semiconductor Substrates
System and Process for Heating Semiconductor Wafers by Optimizing Absorption of Electromagnetic Energy
Method and Apparatus for Growing Thin Oxide Films on Silicon While Minimizing Impact on Existing Structures
Method and Apparatus for Determining Measurement Values
Apparatus for the Heat Treatment of Disc Shaped Substrates
Inductive Plasma Source with High Coupling Efficiency
Methods for Determining Wafer Temperature
Heating Device for Heating Semiconductor Wafers in Thermal Processing Chambers
Rapid Thermal Processing Using Energy Transfer Layers
Endeffectors for Handling Semiconductor Wafers
Electrostatic Chuck System and Process for Radially Tuning the Temperature Profile Across the Surface of a Substrate
Selective Reflectivity Process Chamber with Customized Wavelength Response and Method
System and Process for Calibrating Pyrometers in Thermal Processing Chambers
High-Intensity Electromagnetic Radiation Apparatus and Methods
Workpiece Breakage Prevention Method and Apparatus
System and Process for Calibrating Pyrometers in Thermal Processing Chambers
Pulsed Processing Semiconductor Heating Methods Using Combinations of Heating Sources
Irradiance Pulse Heat-Treating Methods and Apparatus
Inductively Coupled Plasma Source for Plasma Processing
Endeffectors for Handling Semiconductor Wafers
Methods and Systems for Supporting a Workpiece and for Heat-Treating the Workpiece
Rapid Thermal Processing Using Energy Transfer Layers
Method and System for Determining Optical Properties of Semiconductor Wafers
Methods for Determining Wafer Temperature
System and Process For Heating Semiconductor Wafers by Optimizing Absorption of Electromagnetic Energy
System and Process for Calibrating Pyrometers in Thermal Processing Chambers
Methods, Apparatus and Media for Determining a Shape of an Irradiance Pulse to Which a Workpiece Is to Be Exposed
Methods for Forming Microlenses
Low Cost High Throughput Processing Platform
High Efficiency Plasma Source
Apparatus and Methods for Generating Electromagnetic Radiation
Method for High Aspect Ratio Photoresist Removal in Pure Reducing Plasma
Novel Mask Removal Process Strategy for Vertical NAND Device
System and Process for Calibrating Pyrometers in Thermal Processing Chambers
Inductive Plasma Source with High Coupling Efficiency
Plasma Reactor with Inductive Excitation of Plasma and Efficient Removal of Heat from the Excitation Coil
System and Method for Protection of Vacuum Seals in Plasma Processing Systems
Controlling Azimuthal Uniformity of Etch Process in Plasma Processing Chamber
Substrate Breakage Detection in a Thermal Processing System
Preheat Processes for Millisecond Anneal System
Fluid Leakage Detection for a Millisecond Anneal System
Substrate Support in a Millisecond Anneal System
Features for Improving Process Uniformity in a Millisecond Anneal System
Nitrogen Injection for Arc Lamps
Chamber Wall Heating for a Millisecond Anneal System
Electrode Tip for ARC Lamp
Application:
15/380,221 →
Publication:
US 2017/0194133
Gas Flow Control for Millisecond Anneal System
Variable Pattern Separation Grid for Plasma Chamber
Application:
15/403,455 →
Publication:
US 2017/0207077
Pre-Heat Processes for Millisecond Anneal System
Implanted Photoresist Stripping Process
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
Inductively Coupled Plasma Source for Plasma Processing
Application:
15/589,127 →
Publication:
US 2017/0243721
Separation Grid for Plasma Chamber
Application:
15/591,163 →
Publication:
US 2018/0053628
Strip Process for High Aspect Ratio Structure
Inductive Plasma Source
Application:
15/650,164 →
Publication:
US 2017/0372870
Systems and Methods for Workpiece Processing
Surface Treatment Of Substrates Using Passivation Layers
Patent:
10,217,626 →
Application:
15/843,043 →
Plasma Processing Apparatus With Post Plasma Gas Injection
Plasma Strip Tool With Uniformity Control
Plasma Processing Apparatus
Application:
15/888,283 →
Publication:
US 2018/0358206
Plasma Strip Tool With Multiple Gas Injection Zones
Application:
15/892,723 →
Publication:
US 2018/0358204
Temperature Control Using Temperature Control Element Coupled to Faraday Shield
Substrate Breakage Detection in a Thermal Processing System
Pedestal Assembly for Plasma Processing Apparatus
Material Deposition Prevention on a Workpiece in a Process Chamber
Thermal Imaging Of Heat Sources In Thermal Processing Systems
Surface Treatment of Silicon or Silicon Germanium Surfaces Using Organic Radicals
Surface Treatment of Carbon Containing Films Using Organic Radicals
Surface Treatment of Silicon and Carbon Containing Films by Remote Plasma with Organic Precursors
Method for Processing a Workpiece Using a Multi-Cycle Thermal Treatment Process
Systems And Methods For Workpiece Processing Using Neutral Atom Beams
Thermal Processing of Closed Shape Workpieces
Cooled Focus Ring for Plasma Processing Apparatus
Application:
16/103,100 →
Publication:
US 2019/0088512
Inductively Coupled Plasma Wafer Bevel Strip Apparatus
Application:
16/162,741 →
Publication:
US 2019/0131112
Processing of Semiconductors Using Vaporized Solvents
Plasma Processing Apparatus and Methods
Application:
16/218,931 →
Publication:
US 2019/0198301
Multi-Function Fixture for a Lavatory System
Electrostatic Shield for Inductive Plasma Sources
Application:
16/245,973 →
Publication:
US 2020/0227239
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
Surface Treatment of Substrates Using Passivation Layers
Support Plate for Localized Heating in Thermal Processing Systems
Surface Treatment of Carbon Containing Films Using Organic Radicals
Pre-Heat Processes for Millisecond Anneal System
Low Thermal Budget Annealing
Processing Of Workpieces With Reactive Species Generated Using Alkyl Halide
Controlling Azimuthal Uniformity of Etch Process in Plasma Processing Chamber
Application:
16/386,557 →
Publication:
US 2019/0244825
Methods and Apparatus for Post Exposure Bake Processing of a Workpiece
Post Etch Defluorination Process
Generation of Hydrogen Reactive Species For Processing of Workpieces
Surface Treatment of Silicon or Silicon Germanium Surfaces Using Organic Radicals
Systems And Methods For Thermal Processing And Temperature Measurement Of A Workpiece At Low Temperatures
Integration Of Materials Removal And Surface Treatment In Semiconductor Device Fabrication
Oxide Removal From Titanium Nitride Surfaces
Application:
16/534,149 →
Publication:
US 2020/0075313
Silicon Oxide Selective Dry Etch Process
Patent:
10,692,730 →
Application:
16/557,346 →
Method for High Aspect Ratio Photoresist Removal in Pure Reducing Plasma
Ozone for Selective Hydrophilic Surface Treatment
Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask
Application:
16/598,423 →
Publication:
US 2020/0135554
Carbon Containing Hardmask Removal Process Using Sulfur Containing Process Gas
Silicon Mandrel Etch After Native Oxide Punch-Through
Surface Smoothing of Workpieces
Post Plasma Gas Injection In A Separation Grid
Application:
16/744,244 →
Publication:
US 2020/0243305
Ozone Treatment for Selective Silicon Nitride Etch Over Silicon
Method for Processing a Workpiece Using a Multi-Cycle Thermal Treatment Process
Thermal Processing System With Temperature Non-Uniformity Control
Strip Process for High Aspect Ratio Structure
Pre-Heat Processes for Millisecond Anneal System
Thermal Processing of Closed Shape Workpieces
Application:
62/546,269 →
Cooled Focus Ring for Plasma Processing Apparatus
Application:
62/559,778 →
Surface Treatment of Silicon and Carbon Containing Films by Remote Plasma with Organic Precursors
Application:
62/567,295 →
Inductively Coupled Plasma Wafer Bevel Strip Apparatus
Application:
62/578,725 →
Surface Treatment Of Semiconductors Using Vaporized Solvents
Application:
62/599,105 →
Plasma Processing Apparatus and Methods
Application:
62/610,573 →
Plasma Strip Tool With Multiple Gas Injection Zones
Application:
62/610,582 →
Plasma Strip Tool With Uniformity Control
Application:
62/610,588 →
Plasma Processing Apparatus With Plasma Source Tunability
Application:
62/610,601 →
Support Plate for Localized Heating in Thermal Processing Systems
Application:
62/645,476 →
Low Thermal Budget Annealing
Application:
62/656,428 →
Processing Of Workpieces With Reactive Species Generated Using Alkyl Halide
Application:
62/657,114 →
Processing Of Workpieces With Reactive Species Generated Using Alkyl Halide
Application:
62/658,117 →
Generation of Hydrogen Reactive Species For Processing of Workpieces
Application:
62/683,246 →
Method for Processing a Workpiece Using a Multi-Cycle Thermal Treatment Process
Application:
62/685,564 →
Methods and Apparatus for Post Exposure Bake Processing of a Workpiece
Application:
62/685,608 →
Post Etch Defluorination Process
Application:
62/689,475 →
Related Assignments
(22)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Dec 31, 2012
From: STEAG C.V.D. SYSTEMS, LTD.
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 029546/0203 →
Assignment of Assignor's Interest
Jan 9, 2013
From: MATTSON TECHNOLOGY CANADA, INC.
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 029597/0054 →
Change of Name
Feb 22, 2018
From: STEAG RTP SYSTEMS, INC.
To: MATTSON THERMAL PRODUCTS, INC.
Reel/Frame 045405/0110 →
Certificate of Dissolution
Feb 22, 2018
From: MATTSON THERMAL PRODUCTS, INC.
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 045405/0116 →
Assignment of Assignor's Interest
Mar 29, 2018
From: MATTSON THERMAL PRODUCTS GMBH
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 045763/0296 →
Change of Name
Mar 29, 2018
From: STEAG RTP SYSTEMS GMBH
To: MATTSON THERMAL PRODUCTS GMBH
Reel/Frame 045781/0177 →
Contract
Mar 29, 2018
From: INFINEON TECHNOLOGIES AG
To: STEAG RTP SYSTEMS GMBH
Reel/Frame 045770/0975 →
Change of Name
Mar 29, 2018
From: STEAG AST ELEKTRONIK GMBH
To: STEAG RTP SYSTEMS GMBH
Reel/Frame 045767/0218 →
Change of Name
May 14, 2018
From: STEAG RTP SYSTEMS, INC.
To: MATTSON THERMAL PRODUCTS, INC.
Reel/Frame 046150/0974 →
Certificate of Dissolution
May 14, 2018
From: MATTSON THERMAL PRODUCTS, INC.
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 046151/0262 →
Corrective Assignment to Correct the Patent Number 7037797 Previously Recorded at Reel: 045763 Frame: 0296. Assignor(S) Hereby Confirms the Assignment.
May 14, 2018
From: MATTSON THERMAL PRODUCTS GMBH
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 046151/0332 →
Corrective Assignment to Correct the Patent Number 7037797 Previously Recorded at Reel: 045781 Frame: 0177. Assignor(S) Hereby Confirms the Change of Name.
May 14, 2018
From: STEAG RTP SYSTEMS GMBH
To: MATTSON THERMAL PRODUCTS GMBH
Reel/Frame 046151/0462 →
Corrective Assignment to Correct the Patent Number 7,037,797 Previously Recorded at Reel: 045781 Frame: 0177. Assignor(S) Hereby Confirms the Change of Name.
May 14, 2018
From: STEAG RTP SYSTEMS GMBH
To: MATTSON THERMAL PRODUCTS GMBH
Reel/Frame 046719/0574 →
Assignment of Assignor's Interest
Jun 26, 2018
From: GAT, ARNON; O'CARROLL, CONOR PATRICK; TIMANS, PAUL JANIS; CHOY, SHUEN CHUN
To: STEAG RTP SYSTEMS, INC.
Reel/Frame 046202/0100 →
Certificate of Dissolution
Jun 28, 2018
From: MATTSON THERMAL PRODUCTS, INC.
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 046454/0906 →
Assignment of Assignor's Interest
Jun 28, 2018
From: GAT, ARNON; BOGART, BOB
To: STEAG RTP SYSTEMS, INC.
Reel/Frame 046230/0939 →
Change of Name
Jun 28, 2018
From: STEAG RTP SYSTEMS, INC.
To: MATTSON THERMAL PRODUCTS, INC.
Reel/Frame 046453/0575 →
Security Interest
Aug 27, 2018
From: MATTSON TECHNOLOGY, INC.
To: EAST WEST BANK
Reel/Frame 046956/0348 →
Assignment of Assignor's Interest
Sep 30, 2019
From: MATTSON TECHNOLOGY, INC.
To: MATTSON TECHNOLOGY, INC.; BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
Reel/Frame 050582/0796 →
Assignment of Assignor's Interest
Jan 29, 2021
From: WRIDE, LOIS; KOREN, ZION; MA, YORKMAN; TOMAS CARDEMA, RUDY SANTO
To: MATTSON TECHNOLOGIES, INC.
Reel/Frame 055071/0840 →
Assignment of Assignor's Interest
Feb 23, 2021
From: MATTSON THERMAL PRODUCTS, GMBH
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 055368/0987 →
Assignment of Assignor's Interest
Feb 23, 2021
From: MATTSON TECHNOLOGY, INC.
To: MATTSON TECHNOLOGY, INC.; BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD
Reel/Frame 055370/0755 →