Device for thermal treatment of substrates
View Patent ↗The aim of the invention is to reduce the formation of scratches in a device for the thermal treatment of substrates, in particular, semiconductor substrates, in a chamber in which the substrate is placed upon support elements. According to the invention, said aim is achieved by means of displaceable support elements.
1. An apparatus for thermally treating substrates in a chamber in which said substrates are placed on support elements, said apparatus comprising support elements that are provided with substrate support tips that are formed by a first cone and a second cone, wherein said first cone has a greater opening angle than does said second cone, and wherein said support elements are movable essentially parallel to a plane of a substrate.
2. An apparatus according to claim 1 , wherein said support elements are movable radially relative to a central axis of said substrate.
3. An apparatus according to claim 1 , wherein said support elements are resiliently suspended.
4. An apparatus according to claim 3 , wherein said support elements are respectively connected with a spring, especially a flat spiral spring.
5. An apparatus according to claim 1 , wherein said support elements are pivotable at right angles to a longitudinal axis thereof.
6. An apparatus according to claim 5 wherein a pivot axis of said support elements is spaced from said longitudinal axis thereof.
7. An apparatus according to claim 1 , wherein said support elements are mounted on free ends of movable carrier arms.
8. An apparatus according to claim 7 , wherein said carrier arms are movable parallel to said plane of said substrate.
9. An apparatus according to claim 1 , wherein said support elements are accommodated in a guide means.
10. An apparatus according to claim 9 , wherein said guide means is a slot.
11. An apparatus according to claim 1 , wherein said support elements are provided with a support flange.
12. An apparatus according to claim 11 , wherein said support flange has a curved support surface.
13. An apparatus according to claim 11 , wherein said support flange is light permeable and is embodied as an optical lens.
14. An apparatus according to claim 1 , wherein a movably, especially tiltably, mounted holding element is provided, and wherein said holding element has at least three carrier arms and said support elements secured thereon.
15. An apparatus according to claim 14 , wherein said support elements are movably, especially pivotably, mounted on said carrier arms.
16. An apparatus according to claim 1 , wherein said support elements have a conically tapering base that is pivotably accommodated in a receiving means.
17. An apparatus according to claim 1 , wherein said first cone has an opening angle of between 50 and 130°, and preferably between 80 and 100°.
18. An apparatus according to claim 17 , wherein said second cone has an opening angle between 5 and 45°, and preferably between 5 and 25°.
19. An apparatus according to claim 1 , wherein at least one of said support elements and holding devices thereof are disposed on a circle having a radius that is from ½ to ⅘, and preferably ⅔, of a radius of said substrate.
20. An apparatus according to claim 1 , wherein at least one of said support elements and holding devices thereof are comprised at least partially of a light-permeable material.
21. An apparatus according to claim 1 , wherein surfaces of at least one of said support elements and holding devices thereof are at least partially polished, especially fire polished.
22. An apparatus according to claim 1 , wherein at least one of said support elements and holding devices thereof are made of one or a combination of the following materials: quartz, magnesium oxide, zirconium oxide, silicon, silicon nitride, silicon carbide, aluminum oxide, aluminum nitride, boron nitride, sapphire, SAPHAL, and ceramics.
23. An apparatus according to claim 1 , wherein said support elements are individually movable essentially parallel to said plane of said support.