Patent Assignment
Reel/Frame 046151/0332
CORRECTIVE ASSIGNMENT TO CORRECT THE PATENT NUMBER 7037797 PREVIOUSLY RECORDED AT REEL: 045763 FRAME: 0296. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT.
Recorded: 2018-05-14
Received: 2018-05-14
Pages: 28
Assignor
MATTSON THERMAL PRODUCTS GMBH
Executed: 2003-12-31
Assignee
MATTSON TECHNOLOGY, INC.
47131 BAYSIDE PARKWAY, FREMONT, CA, 94538, UNITED STATES
Covered Applications
(30)
Push Pull Data Collection
App. No. 14/834,367
→
ENHANCHED FLOW PROCESSING
App. No. 14/834,424
→
NETWORK MONITORING USING VIRTUAL PACKETS
App. No. 13/902,230
→
APPARATUS FOR THERMALLY TREATING SEMICONDUCTOR SUBSTRATES
App. No. 12/251,916
→
Network Monitoring of Behavior Probability Density
App. No. 12/180,243
→
SYMPTOM DETECTION USING BEHAVIOR PROBABILITY DENSITY, NETWORK MONITORING OF MULTIPLE OBSERVATION VALUE TYPES, AND NETWORK MONITORING USING ORTHOGONAL PROFILING DIMENSIONS
App. No. 12/180,437
→
NETWORK MONITORING USING VIRTUAL PACKETS
App. No. 12/180,193
→
PARALLEL DISTRIBUTED NETWORK MONITORING
App. No. 12/179,703
→
Network Monitoring Using Bounded Memory Data Structures
App. No. 12/180,333
→
PROCESS FOR DETERMINING THE TEMPERATURE OF A SEMICONDUCTOR WAFER IN A RAPID HEATING UNIT
App. No. 10/540,613
→
DEVICE AND METHOD FOR THERMALLY TREATING SEMICONDUCTOR WAFERS
App. No. 10/524,871
→
METHOD AND APPARATUS FOR THERMALLY TREATING DISK-SHAPED SUBSTRATES
App. No. 10/540,614
→
DEFENSES AGAINST SOFTWARE ATTACKS IN DISTRIBUTED COMPUTING ENVIRONMENTS
App. No. 11/153,217
→
METHOD OF PRODUCING A CALIBRATION WAFER
App. No. 10/536,788
→
APPARATUS AND METHOD FOR MEASURING THE TEMPERATURE OF SUBSTRATES
App. No. 11/021,915
→
METHOD AND DEVICE FOR THERMAL TREATMENT OF SUBSTRATES
App. No. 10/478,754
→
METHOD FOR THERMALLY TREATING A SUBSTRATE THAT COMPRISES SEVERAL LAYERS
App. No. 10/487,573
→
Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment
App. No. 10/476,136
→
METHOD FOR MINIMIZING THE VAPOR DEPOSITION OF TUNGSTEN OXIDE DURING THE SELECTIVE SIDE WALL OXIDATION OF TUNGSTEN-SILICON GATES
App. No. 10/694,593
→
DEVICE FOR THERMAL TREATMENT OF SUBSTRATES
App. No. 10/182,594
→
ADJUSTING OF DEFECT PROFILES IN CRYSTAL OR CRYSTALLINE-LIKE STRUCTURES
App. No. 10/276,767
→
METHOD FOR THE REMOVING OF ADSORBED MOLECULES FROM A CHAMBER
App. No. 10/220,001
→
METHOD AND APPARATUS FOR THE THERMAL TREATMENT OF SUBSTRATES
App. No. 10/111,737
→
DYNAMIC DOS FLOODING PROTECTION
App. No. 10/242,380
→
Apparatus and Method for the Thermal Treatment of Substrates
App. No. 09/979,646
→
DEVICE AND METHOD FOR MEASURING THE TEMPERATURE OF SUBSTRATES
App. No. 09/913,269
→
METHOD AND APPARATUS FOR CALIBRATING TEMPERATURE MEASUREMENTS INDEPENDENT OF EMISSIVITY
App. No. 09/744,880
→
METHOD OF MAINTAINING LISTS OF NETWORK CHARACTERISTICS
App. No. 09/805,490
→
METHOD AND APPARATUS FOR LIMITING NETWORK CONNECTION RESOURCES
App. No. 09/789,477
→
Method of measuring electromagnetic radiation
App. No. 09/789,942
→