Patent Assignment
Reel/Frame 055368/0987
Assignment of Assignor's Interest
Recorded: 2021-02-23
Received: 2021-02-23
Pages: 5
Assignor
MATTSON THERMAL PRODUCTS, GMBH
Executed: 2021-02-19
Assignee
MATTSON TECHNOLOGY, INC.
47131 BAYSIDE PARKWAY, FREMONT, CA, 94538, UNITED STATES
Covered Properties
(33)
Centerless Rotational Support for Thermal Processing
Application:
63/130,982 →
Workpiece Processing Apparatus with Thermal Processing Systems
Application:
63/130,969 →
Workpiece Processing Apparatus with Vacuum Anneal Reflector Control
Application:
63/129,108 →
Workpiece Processing Apparatus with Gas Showerhead Assembly
Application:
63/129,079 →
Workpiece Processing Apparatus with Thermal Processing Systems
Application:
63/124,962 →
Arc Lamp With Forming Gas For Thermal Processing Systems
Application:
63/117,597 →
Control System For Adaptive Control Of A Thermal Processing System
Application:
17/084,228 →
Rapid Thermal Processing System with Cooling System
Application:
63/066,854 →
Rapid Thermal Processing System with Cooling System
Application:
63/066,856 →
Systems And Methods For Transportation Of Replaceable Parts In a Vacuum Processing Apparatus
Application:
15/930,943 →
End Effectors for Moving Workpieces and Replaceable Parts Within a System for Processing Workpieces Under Vacuum
Application:
15/930,924 →
Focus Ring Adjustment Assembly of a System for Processing Workpieces Under Vacuum
Application:
15/930,910 →
Plasma Processing Apparatus Having a Focus Ring Adjustment Assembly
Application:
15/930,874 →
Support Structure for Thermal Processing Systems
Application:
62/983,032 →
Transmission-Based Temperature Measurement of a Workpiece in a Thermal Processing System
Application:
62/983,064 →
Apparatus for Thermally Treating Semiconductor Substrates
Application:
12/251,916 →
Determining the Position of a Semiconductor Substrate on a Rotation Device
Application:
11/597,178 →
Method and Apparatus for Thermally Treating Substrates
Application:
11/446,675 →
Process for Determining the Temperature of a Semiconductor Wafer in a Rapid Heating Unit
Application:
10/540,613 →
Method and Apparatus for Thermally Treating Disk-Shaped Substrates
Application:
10/540,614 →
Method of Producing a Calibration Wafer
Application:
10/536,788 →
Apparatus and Method for Measuring the Temperature of Substrates
Application:
11/021,915 →
Method and Device for Thermal Treatment of Substrates
Application:
10/478,754 →
Method for Thermally Treating a Substrate That Comprises Several Layers
Application:
10/487,573 →
Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment
Application:
10/476,136 →
Device for Thermal Treatment of Substrates
Application:
10/182,594 →
Adjusting of Defect Profiles in Crystal or Crystalline-Like Structures
Application:
10/276,767 →
Method for the Removing of Adsorbed Molecules from a Chamber
Application:
10/220,001 →
Method and Apparatus for the Thermal Treatment of Substrates
Application:
10/111,737 →
Apparatus and Method for the Thermal Treatment of Substrates
Application:
09/979,646 →
Device and Method for Measuring the Temperature of Substrates
Application:
09/913,269 →
Method and Apparatus for Calibrating Temperature Measurements Independent of Emissivity
Application:
09/744,880 →
Method of measuring electromagnetic radiation
Application:
09/789,942 →